A resist composition containing a compound represented by the general formula (bd1-1), (bd1-2) or (bd1-3); in the formula, Rx.sup.1 to Rx.sup.4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure; Ry.sup.1 to Ry.sup.2 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Rz.sup.1 to Rz.sup.4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rx.sup.1 to Rx.sup.4, Ry.sup.1 to Ry.sup.2 and Rz.sup.1 to Rz.sup.4 has an anion group, M.sub.1.sup.m+ represents a sulfonium cation having a sulfonyl group, R.sup.001 to R.sup.003 each independently represent a monovalent organic group; provided that at least one of R.sup.001 to R.sup.003 is an organic group having an acid dissociable group; and M.sub.3.sup.m+ represents an m-valent organic cation having an electron-withdrawing group.

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Polymerizable compositions comprise at least one free-radically or cationically polymerizable compound; and a photoinitiator system, wherein the photoinitiator system comprises a compound represented by the formula: (I) wherein: each R.sup.1 independently represents an alkyl group having from 1 to 6 carbon atoms, and each R.sup.2 independently represents H, an alkyl group having from 1 to 4 carbon atoms, an alkoxy group having from 1 to 4 carbon atoms, F, Cl, or Br. Polymerized reaction products are also disclosed. ##STR00001##

Polymerizable compositions comprise at least one free-radically or cationically polymerizable compound; and a photoinitiator system, wherein the photoinitiator system comprises a compound represented by the formula: (I) wherein: each R.sup.1 independently represents an alkyl group having from 1 to 6 carbon atoms, and each R.sup.2 independently represents H, an alkyl group having from 1 to 4 carbon atoms, an alkoxy group having from 1 to 4 carbon atoms, F, Cl, or Br. Polymerized reaction products are also disclosed. ##STR00001##

It is a subject of the present invention to provide an acid- and radical-generating agent which has high sensitivity to an active energy ray having a wavelength of around 300 to 450 nm, and can exert both high acid-generating performance and high radical-generating performance, and has heat resistance; and a method for generating an acid and a radical. The present invention relates to a compound represented by the general formula (A); an acid- and radical-generating agent comprising the compound; and a method for generating an acid and a radical: ##STR00001##
wherein n pieces of R.sup.1 each independently represent an alkyl group, which may have a specific functional group in the chain, or in which a hydrogen atom may be substituted by a halogen atom; an alkoxy group, in which a hydrogen atom may be substituted by a halogen atom; an aryl group or an aryloxy group, in which a hydrogen atom may be substituted by a halogen atom, an alkyl group or a haloalkyl group; or an arylalkyl group or an arylalkyloxy group, in which a hydrogen atom may be substituted by a halogen atom, an alkyl group or a haloalkyl group; n pieces of R.sup.2 and R.sup.3 each independently represent a hydrogen atom, an alkyl group or an alkoxycarbonyl group; R.sup.4 to R.sup.7 each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkenyl group, an aryl group, an alkoxycarbonyl group, a dialkylamino group or a nitro group; Y represents an oxygen atom, a sulfur atom, or a carbonyl group; n pieces of Z each independently represent a sulfonyl group or an alkoxyphosphoryl group; n represents 1 or 2.

It is a subject of the present invention to provide an acid- and radical-generating agent which has high sensitivity to an active energy ray having a wavelength of around 300 to 450 nm, and can exert both high acid-generating performance and high radical-generating performance, and has heat resistance; and a method for generating an acid and a radical. The present invention relates to a compound represented by the general formula (A); an acid- and radical-generating agent comprising the compound; and a method for generating an acid and a radical: ##STR00001##
wherein n pieces of R.sup.1 each independently represent an alkyl group, which may have a specific functional group in the chain, or in which a hydrogen atom may be substituted by a halogen atom; an alkoxy group, in which a hydrogen atom may be substituted by a halogen atom; an aryl group or an aryloxy group, in which a hydrogen atom may be substituted by a halogen atom, an alkyl group or a haloalkyl group; or an arylalkyl group or an arylalkyloxy group, in which a hydrogen atom may be substituted by a halogen atom, an alkyl group or a haloalkyl group; n pieces of R.sup.2 and R.sup.3 each independently represent a hydrogen atom, an alkyl group or an alkoxycarbonyl group; R.sup.4 to R.sup.7 each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkenyl group, an aryl group, an alkoxycarbonyl group, a dialkylamino group or a nitro group; Y represents an oxygen atom, a sulfur atom, or a carbonyl group; n pieces of Z each independently represent a sulfonyl group or an alkoxyphosphoryl group; n represents 1 or 2.

This invention relates to a thioxanthone derivative photoinitiator, a radiation curable composition comprising the same and the use thereof. In particular, the invention relates to thioxanthone derivative photoinitiator suitable to be in one drop filling process for manufacturing liquid crystal display device without the concern of liquid crystal contamination.

This invention relates to a thioxanthone derivative photoinitiator, a radiation curable composition comprising the same and the use thereof. In particular, the invention relates to thioxanthone derivative photoinitiator suitable to be in one drop filling process for manufacturing liquid crystal display device without the concern of liquid crystal contamination.

A sulfonium salt is formed of a sulfonium cation selected from a group indicated by general formulas (1), (2), and (3) and a gallate anion represented by formula (a). A photoacid generator is characterized in that said sulfonium salt is contained therein. An energy-ray curable composition contains the acid generator and a cationic polymerizable compound. A cured product is formed by curing these substances.

##STR00001##

A sulfonium salt is formed of a sulfonium cation selected from a group indicated by general formulas (1), (2), and (3) and a gallate anion represented by formula (a). A photoacid generator is characterized in that said sulfonium salt is contained therein. An energy-ray curable composition contains the acid generator and a cationic polymerizable compound. A cured product is formed by curing these substances.

##STR00001##

The sulfonium salt does not contain a toxic metal and exhibits higher cationic polymerization performance and crosslinking performance than a tetrakis(pentafluorophenyl)borate salt. The heat- or photo-acid generator contains the sulfonium salt. The sulfonium salt is formed of a sulfonium cation selected from a group represented by general formulas (1), (9), (10) and (11) described below and a gallate anion represented by formula (a). The heat- or photo-acid generator contains the sulfonium salt. The heat- or energy ray-curable composition contains the acid generator and a cationically polymerizable compound. A cured product can be obtained by curing the same.

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