The invention relates to a method for the plasma-assisted synthesis of organohalosilanes in which organohalosilanes of the general empirical formula R.sup.1.sub.mR.sup.2.sub.oSiX.sub.4-p (X=F, Cl, Br or I; p=1-4; p=m+o; m=1-4; o=0-3; R.sup.1, R.sup.2=alkyl, alkenyl, alkinyl, aryl) and/or carbosilanes of the general empirical formula R.sup.3.sub.qSiX.sub.3-qCH.sub.2SiR.sup.4.sub.rX.sub.3-r (X=F, Cl, Br or I; q=0-3; r=0-3; R.sup.3, R.sup.4=alkyl, alkenyl, alkinyl, aryl) are formed by activating a plasma in a mixture of one or more volatile organic compounds from the group of alkanes, alkenes, alkines and aromates with SiX.sub.4 and/or organohalosilanes R.sub.nSiX.sub.4-n (X=F, Cl, Br oder I; n=1-4; R=alkyl, alkenyl, alkinyl, aryl).

A method for producing an organohalosilane, the method comprising: reacting an organic compound comprising a halogen-substituted or unsubstituted aromatic compound with a hydridohalosilane mixture comprising at least two different hydridohalosilanes of formula (I) R.sub.nSiH.sub.mX.sub.4-m-n, where each R is independently C.sub.1-C.sub.14 hydrocarbyl or C.sub.1-C.sub.14 hologen-substituted hydrocarbyl, X is fluoro, chloro, bromo, or iodo, n is 0, 1, or 2, m is 1, 2, or 3 and m+n is 1, 2, or 3, in the presence of a catalyst comprising one or more of the elements Sc, Y, Ti, Zr, Hf, Nb, B, Al, Ga, In, C, Si, Ge, Sn, or Pb, at a temperature greater than 100 C., and at a pressure of at least 690 kPa, to produce a crude reaction product comprising the organohalosilane, provided that when the at least two different hydridohalosilane comprise a hydridohalosilane of formula (I) where n=0 and m=1 and a hydridohalosilane of formula (I) where n=0 and m=2, the catalyst is a heterogeneous catalyst comprising an oxide of one or more of the elements Sc, Y, Ti, Zr, Hf, B, Al, Ga, In, C, Si, Ge, Sn, or Pb.

There is provided herein a process for the synthesis of sulfonyl silanes. There is also provided herein various sulfenylated and sulfonylated silicon-containing compounds made by the process.

The disclosure provides a reactive perpendicular aligned organosilicon material and a manufacture method of a liquid crystal display panel, a general structural formula of the reactive perpendicular aligned organosilicon material is A-R, A is SiCl.sub.3; R represents a linear chained or a branched chained alkyl group with 520 C atoms, a CH.sub.2 group in the alkyl group is substituted by a phenyl group, a naphthenic base, CONH, COO, OCO, S, CO or CHCH, or a F atom or a Cl atom substitutes for a H atom in the alkyl group. A Cl atom in the reactive perpendicular aligned organosilicon material and OH on a surface of the substrate without a PI film can form a hydrogen bond, leading to vertical arrangement of liquid crystal molecules.

A process for the preparation of 3-methacryloxypropyldimethylchlorosilane by reaction of allylmethacrylate with dimethylchlorosilane in the presence of a hydrosilylation catalyst, characterized in that the reaction is carried out in the absence of a peroxide is provided. The process includes providing a first stream containing allylmethacrylate. A a second stream containing dimethylchlorosilane is provided. The streams contact in a continuous flow reactor in the presence of the hydrosilylation catalyst, thereby producing 3-methacryloxypropyldimethylchlorosilane. A product stream is continuously removed from the continuous flow reactor.

A method for preparing a reaction product includes: steps (1) and (2). Step (1) is contacting, at a temperature from 200 C. to 1400 C., a first ingredient including a silane of formula H.sub.aR.sub.bSiX.sub.(4-a-b), where subscript a is an integer from 0 to 4, subscript b is 0 or 1, a quantity (a+b)<4, each R is independently a monovalent organic group, and each X is independently a halogen atom, with the proviso that when the quantity (a+b)<4, then the ingredient further includes H2; with a spinel catalyst including copper; thereby forming a reactant. Step (2) is contacting the reactant with a second ingredient including an organohalide at a temperature from 100 C. to 600 C.; thereby forming the reaction product and a spent reactant. The reaction product is distinct from the silane used in step (1). The method may be used to prepare diorganodihalosilanes from silicon tetrahalides.

Pre-texturing agents, etchants, and photoresist stripping agents may be formulated to include one or more surfactants, from one or more surfactant classes, such as siloxane derivatives of amino acids that have surface-active properties.

A method of preparing catalyst particles (the preparation method) is disclosed. The preparation method comprises combining a Ru(0) complex and a carrier fluid to form a mixture and heating the mixture at an elevated temperature to nucleate the Ru(0) complex and give the catalyst particles in the carrier fluid. The preparation method optionally comprises isolating the catalyst particles from the carrier fluid. A method of preparing an organosilicon compound via dehydrogenative silylation with the catalyst particles (the synthesis method) is also disclosed. The synthesis method comprises reacting (A) an organohydridochlorosilane compound and (B) an alkene compound in the presence of (C) a catalyst, thereby preparing the organosilicon compound. The catalyst (C) of the synthesis method comprises the catalyst particles prepared by the preparation method.

The disclosures herein relate to methods of synthesising a compound of formula (1):

##STR00001##

wherein PG, R.sup.2 and R.sup.3 are as defined herein, and the use of said methods in the manufacture of conjugates that bind to PSMA.