C07F9/067

Resist composition and patterning process

A resist composition comprising a base polymer and a phosphazene salt compound offers a high dissolution contrast, minimal LWR, and dimensional stability on PPD.

RESIST COMPOSITION AND PATTERNING PROCESS
20170184964 · 2017-06-29 · ·

A resist composition comprising a base polymer and a phosphazene salt compound offers a high dissolution contrast, minimal LWR, and dimensional stability on PPD.

METHOD FOR ISOCYANATE MODIFICATION USING CATALYSTS WITH AN NPN SEQUENCE
20170008996 · 2017-01-12 ·

The invention relates to a method for modifying isocyanates, wherein at least one organic monomer isocyanate having an NCO functionality >1 is oligomerised in the presence of at least one catalyst, said method being characterised in that the catalyst comprises at least one specific compound having an NPN sequence selected from compounds of formula I (formula I), and/or from compounds of formula II (formula II) where HX represents an acid with a pKa value 2, X.sup. represents the anion of an acid with a pKa value 2, and n represents an integer or fractional number between 0 and 20, wherein Y represents R.sub.12(R.sub.13)N and/or one or more substituents of the structure of formula III (formula III) and wherein R.sub.1 to R.sub.19 independently represent identical or different substituents selected from C.sub.1-C.sub.20 alkyl-, C.sub.1-C.sub.20 cycloalkyl- and C.sub.6-C.sub.20 aryl groups, or wherein R.sub.1 and R.sub.2, R.sub.3 and R.sub.4, R.sub.5 and R.sub.6, R.sub.7 and R.sub.8, R.sub.9 and R.sub.10, R.sub.12 and R.sub.13, R.sub.14 and R.sub.15, R.sub.16 and R.sub.17, R.sub.18 and R.sub.19 independently represent identical or different substituents selected from C.sub.1-C.sub.20 alkylene-, C.sub.1-C.sub.20 cycloalkylene-, C.sub.6-C.sub.20 arylene groups, and can form a 3- to 12-membered ring with the N atom joined to the P atom. The invention also relates to the use of a catalyst of this type.