C08F12/20

Monomer and block copolymer

The present application relates to monomers, methods for preparing block copolymers, block copolymers and their applications. The monomers may form a block copolymer which has an excellent self assembling property and phase separation and to which various required functions can be freely applied as necessary.

Monomer and block copolymer

The present application relates to monomers, methods for preparing block copolymers, block copolymers and their applications. The monomers may form a block copolymer which has an excellent self assembling property and phase separation and to which various required functions can be freely applied as necessary.

Block copolymer and method of manufacturing integrated circuit device using the same

A block copolymer includes a first polymer block and a second polymer block having different structures, and one of the first polymer block and the second polymer block has a halogen-substituted structure.

Block copolymer and method of manufacturing integrated circuit device using the same

A block copolymer includes a first polymer block and a second polymer block having different structures, and one of the first polymer block and the second polymer block has a halogen-substituted structure.

Multilayer optical compensation film having reversed wavelength dispersion

Disclosed is a multilayer optical compensation film comprising a first layer comprising a positive C-plate material and a second layer comprising a polyimide, as well as polymer compositions and resins and solutions containing said polymer compositions. The optical compensation film has a reversed wavelength dispersion that is capable of providing an achromatic (or broadband) retardation compensation. The optical film can be used in optical devices such as liquid crystal displays (LCD) or organic light emitting diode (OLED) displays.

Multilayer optical compensation film having reversed wavelength dispersion

Disclosed is a multilayer optical compensation film comprising a first layer comprising a positive C-plate material and a second layer comprising a polyimide, as well as polymer compositions and resins and solutions containing said polymer compositions. The optical compensation film has a reversed wavelength dispersion that is capable of providing an achromatic (or broadband) retardation compensation. The optical film can be used in optical devices such as liquid crystal displays (LCD) or organic light emitting diode (OLED) displays.

Multilayer optical compensation film having reversed wavelength dispersion

Disclosed is a multilayer optical compensation film comprising a first layer comprising a positive C-plate material and a second layer comprising a polyimide, as well as polymer compositions and resins and solutions containing said polymer compositions. The optical compensation film has a reversed wavelength dispersion that is capable of providing an achromatic (or broadband) retardation compensation. The optical film can be used in optical devices such as liquid crystal displays (LCD) or organic light emitting diode (OLED) displays.

Polymer compound for a conductive polymer and method for producing same

The present invention provides a polymer compound for a conductive polymer comprising one or more repeating units a shown by the formula (1), and having a weight-average molecular weight in the range of 1,000 to 500,000. There can be provided a polymer compound for a conductive polymer having a specific superacidic sulfo group which is soluble in an organic solvent, and suitably used for a fuel cell or a dopant for a conductive material. ##STR00001##
wherein R.sup.1 represents a hydrogen atom or a methyl group; R.sup.2 represents any of a single bond, an ester group, and a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms, the hydrocarbon group optionally containing an ether group, an ester group, or both; Z represents any of a single bond, a phenylene group, a naphthylene group, an ether group, and an ester group; and a is a number satisfying 0<a1.0.

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

The pattern forming method includes (1) a step of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition, (2) a step of exposing the film with actinic rays or radiation, and (3) a step of developing the exposed film using a developer containing an organic solvent, in which the actinic ray-sensitive or radiation-sensitive resin composition contains an acid-decomposable resin (1) having a repeating unit (a) having an aromatic ring and a repeating unit (b) represented by a specific general formula, and the content of the repeating unit (a) is 55% by mole or more with respect to all the repeating units of the acid-decomposable resin (1). The method for manufacturing an electronic device includes the pattern forming method.

Film and method for producing same

The present invention aims to provide a film having excellent mechanical strength and abrasion resistance. The film of the present invention contains an aromatic polyether ketone resin (I) and a fluororesin (II). The aromatic polyether ketone resin (I) has a crystallinity of 10% or higher.