C08F12/24

Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates

There is provided a copolymer having the general structure below, wherein a, b, and d are molar ratios varying between about 0.01 and about 0.90 and c is a molar ratio varying between about 0.01 and about 0.90; A1 represents monomer units comprising a cyano-containing pendant group in which the cyano is not directly attached to the backbone of the copolymer; A2 represents monomer units comprising two or more hydrogen bonding sites; A3 represents monomer units that increase solubility in organic solvents; and A4 represents monomer units that increase solubility in aqueous alkaline solutions. There is also provided a near-infrared radiation-sensitive coating composition comprising this copolymer as well as a positive-working thermal lithographic printing plate comprising a near-infrared radiation-sensitive coating comprising this copolymer, a method of producing such a printing plate, and finally a method of printing using such a printing plate. Formula (I).

Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates

There is provided a copolymer having the general structure below, wherein a, b, and d are molar ratios varying between about 0.01 and about 0.90 and c is a molar ratio varying between about 0.01 and about 0.90; A1 represents monomer units comprising a cyano-containing pendant group in which the cyano is not directly attached to the backbone of the copolymer; A2 represents monomer units comprising two or more hydrogen bonding sites; A3 represents monomer units that increase solubility in organic solvents; and A4 represents monomer units that increase solubility in aqueous alkaline solutions. There is also provided a near-infrared radiation-sensitive coating composition comprising this copolymer as well as a positive-working thermal lithographic printing plate comprising a near-infrared radiation-sensitive coating comprising this copolymer, a method of producing such a printing plate, and finally a method of printing using such a printing plate. Formula (I).

COPOLYMER CONTAINING RESIDUES OF VINYLBENZYL HALIDE AND VINYLBENZYL ALCOHOL AND SYNTHESIS THEREOF, POROUS STRUCTURE COMPRISING THE COPOLYMER AND PRODUCTION THEREOF, AND POROUS CARBON SPHERE

A copolymer, a method for producing the copolymer, a porous structure formed by the copolymer, a method for producing the porous structure, and a porous carbon sphere formed by carbonizing the porous structure are shown. The copolymer has a chemical structure of formula (1) or (2):

##STR00001##

wherein the molecular weight of the copolymer structure is 120,000 or less g/mole, m and t are both greater than 0, 8%≦p≦80%, y≧0, z≧0, and X is selected from —Cl, —Br and —I.

MONOFUNCTIONAL PHENOLIC COMPOUND, ACTIVE ESTER RESIN AND METHOD FOR PRODUCING THE SAME, AND THERMOSETTING RESIN COMPOSITION AND CURED PRODUCT THEREOF
20220033333 · 2022-02-03 · ·

Provided are a monofunctional phenolic compound used for producing an active ester resin capable of forming a cured product having excellent dielectric properties and excellent heat resistance, an active ester resin and a method for producing the active ester resin, and a thermosetting resin composition and a cured product of the thermosetting resin composition. Specifically, provided are a monofunctional phenolic compound including one or more vinylbenzyl groups and an active ester resin including a vinylbenzyl structure attached to a terminal group of the molecular chain and derived from the monofunctional phenolic compound. The vinylbenzyl structure preferably includes a vinylbenzyl-modified aryloxycarbonyl group.

Resin composition and pattern forming method using the same

A resin composition of the present invention includes a polymer compound (A) containing a repeating unit (Q) represented by the following general formula (1): ##STR00001## wherein R.sub.1 represents a hydrogen atom, a methyl group, or a halogen atom; R.sub.2 and R.sub.3 represent a hydrogen atom, an alkyl group, or a cycloalkyl group; L represents a divalent linking group or a single bond; Y represents a substituent excluding a methylol group; Z represents a hydrogen atom or a substituent; m represents an integer of 0 to 4; n represents an integer of 1 to 5; and m+n is 5 or less.

Resin composition and pattern forming method using the same

A resin composition of the present invention includes a polymer compound (A) containing a repeating unit (Q) represented by the following general formula (1): ##STR00001## wherein R.sub.1 represents a hydrogen atom, a methyl group, or a halogen atom; R.sub.2 and R.sub.3 represent a hydrogen atom, an alkyl group, or a cycloalkyl group; L represents a divalent linking group or a single bond; Y represents a substituent excluding a methylol group; Z represents a hydrogen atom or a substituent; m represents an integer of 0 to 4; n represents an integer of 1 to 5; and m+n is 5 or less.

Resin composition and pattern forming method using the same

A resin composition of the present invention includes a polymer compound (A) containing a repeating unit (Q) represented by the following general formula (1): ##STR00001## wherein R.sub.1 represents a hydrogen atom, a methyl group, or a halogen atom; R.sub.2 and R.sub.3 represent a hydrogen atom, an alkyl group, or a cycloalkyl group; L represents a divalent linking group or a single bond; Y represents a substituent excluding a methylol group; Z represents a hydrogen atom or a substituent; m represents an integer of 0 to 4; n represents an integer of 1 to 5; and m+n is 5 or less.

A HIGH EXCHANGE-CAPACITY ANION EXCHANGE RESIN WITH DUAL FUNCTIONAL-GROUPS AND METHOD OF SYNTHESIS THEREOF
20170259255 · 2017-09-14 ·

The present disclosed are a high exchange-capacity anion exchange resin with dual functional-groups and method of synthesis thereof. The invention relates to the field of environmental function material synthesis and application. The resin is based on chloromethylated polystyrene-divinylbenzene polymer as matrix, and by primary amination and quaternization, yields an anion exchange resin with dual functional-groups having both a weak base anionic group and a strong base anionic group. The anion exchange resin not only has high adsorption capacity for water-born nitrate ions, but also can effectively squelch natural organic acids such as phytic acid in water, thus simultaneously removing nitrate ions and phytic acid organic matter from water. Therefore, the resin has a broad application potential in the fields of drinking water treatment, groundwater remediation, and advanced urban sewage treatment.

Polymer compound for conductive polymer and method for producing same

A polymer compound having a weight average molecular weight in the range of 1,000 to 500,000, and contains one or more repeating units represented by formula (1) and one or more repeating units represented by formula (2): ##STR00001## R.sup.1 represents a hydrogen atom or a methyl group; Rf.sub.1 represents a linear or branched alkyl group having 1 to 4 carbon atoms or a phenyl group, and has at least one fluorine atom or a trifluoromethyl group in Rf.sub.1; Z.sub.1 represents a single bond, an arylene group having 6 to 12 carbon atoms or —C(═O)—O—R.sup.2—; R.sup.2 represents a linear, branched or cyclic alkylene group having 1 to 12 carbon atoms, an arylene group having 6 to 10 carbon atoms or an alkenylene group having 2 to 10 carbon atoms, and may have an ether group, a carbonyl group or an ester group in R.sup.2; and “a” is 0<a≤1.0, and ##STR00002## “b” is 0<b<1.0.

Polymer compound for conductive polymer and method for producing same

A polymer compound having a weight average molecular weight in the range of 1,000 to 500,000, and contains one or more repeating units represented by formula (1) and one or more repeating units represented by formula (2): ##STR00001## R.sup.1 represents a hydrogen atom or a methyl group; Rf.sub.1 represents a linear or branched alkyl group having 1 to 4 carbon atoms or a phenyl group, and has at least one fluorine atom or a trifluoromethyl group in Rf.sub.1; Z.sub.1 represents a single bond, an arylene group having 6 to 12 carbon atoms or —C(═O)—O—R.sup.2—; R.sup.2 represents a linear, branched or cyclic alkylene group having 1 to 12 carbon atoms, an arylene group having 6 to 10 carbon atoms or an alkenylene group having 2 to 10 carbon atoms, and may have an ether group, a carbonyl group or an ester group in R.sup.2; and “a” is 0<a≤1.0, and ##STR00002## “b” is 0<b<1.0.