Patent classifications
C08F220/281
Composition for organic light emitting diode encapsulation and organic light emitting diode display manufactured therefrom
Provided are: a composition for an organic light emitting diode comprising an indole-based photocurable monomer, a non-indole-based photocurable monomer, and an initiator, and an organic light emitting display manufactured therefrom.
POLYMER COMPOUND AND COATING COMPOSITION
A polymer compound in which a polymer chain containing a structure contributing to the inclusion of intermediate water is bound as at least a part of the organic component R group of a silsesquioxane.
POLYMER COMPOUND AND COATING COMPOSITION
A polymer compound in which a polymer chain containing a structure contributing to the inclusion of intermediate water is bound as at least a part of the organic component R group of a silsesquioxane.
ACRYLIC RUBBER EXCELLENT IN WATER RESISTANCE
An acrylic rubber including: a polymer composition of: 70 to 99.9% by weight of a bonding unit derived from at least one (meth) acrylic acid ester selected from (meth) acrylic acid alkyl ester and (meth) acrylic acid alkoxyalkyl ester; 0.1 to 10% by weight of a bonding unit derived from a monomer containing a reactive group; and 0 to 20% by weight of a bonding unit derived from other monomer, wherein ash content is 0.15% by weight or less, total amount of sodium and sulfur in the ash is 60% by weight or more, a ratio of sodium to sulfur by weight ratio is in the range of 0.5 to 2.5, ratio of Z-average molecular weight to weight average molecular weight is 1.3 or more, and weight average molecular weight is in the range of 1,000,000 to 5,000,000.
ACRYLIC RUBBER EXCELLENT IN WATER RESISTANCE
An acrylic rubber including: a polymer composition of: 70 to 99.9% by weight of a bonding unit derived from at least one (meth) acrylic acid ester selected from (meth) acrylic acid alkyl ester and (meth) acrylic acid alkoxyalkyl ester; 0.1 to 10% by weight of a bonding unit derived from a monomer containing a reactive group; and 0 to 20% by weight of a bonding unit derived from other monomer, wherein ash content is 0.15% by weight or less, total amount of sodium and sulfur in the ash is 60% by weight or more, a ratio of sodium to sulfur by weight ratio is in the range of 0.5 to 2.5, ratio of Z-average molecular weight to weight average molecular weight is 1.3 or more, and weight average molecular weight is in the range of 1,000,000 to 5,000,000.
Vat photopolymerization additive manufacturing of multi-material parts
The present disclosure provides a method of making an article, including: providing a composition comprising two or more types of polymerizable monomers and two or more types of polymerization initiators; exposing the build region to one or more polymerization stimuli; polymerizing the two or more polymerizable monomers at the build region to provide a polymer layer; and advancing the polymer layer away from the build region to provide a three-dimensional article containing two or more integrally mixed polymers.
ACRYLIC RUBBER, ACRYLIC RUBBER COMPOSITION, AND CROSSLINKED RUBBER
An acrylic rubber includes 20 to 35% by weight of ethyl methacrylate units (a), 0 to 20% by weight of ethyl acrylate units (b), 50 to 75% by weight of n-butyl acrylate units (c), and 0.5 to 4% by weight of carboxyl group-containing monomer units (d).
ACRYLIC RUBBER, ACRYLIC RUBBER COMPOSITION, AND CROSSLINKED RUBBER
An acrylic rubber includes 20 to 35% by weight of ethyl methacrylate units (a), 0 to 20% by weight of ethyl acrylate units (b), 50 to 75% by weight of n-butyl acrylate units (c), and 0.5 to 4% by weight of carboxyl group-containing monomer units (d).
RESIST COMPOSITION AND PATTERNING PROCESS
A resist composition comprising a base polymer and a sulfonium or iodonium salt of a fluorinated sulfonic acid having a phenylene group which is substituted with an iodized phenyl-containing group and a nitro group is provided. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.
RESIST COMPOSITION AND PATTERNING PROCESS
A resist composition comprising a base polymer and a sulfonium or iodonium salt of a fluorinated sulfonic acid having a phenylene group which is substituted with an iodized phenyl-containing group and a nitro group is provided. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.