C08F220/282

POLY(ETHYLENE GLYCOL) METHACRYLATE MICROGELS, PREPARATION METHOD AND USES

The invention relates to poly(oligo(ethylene glycol) methacrylate) microgels, to the process for preparing same and the uses thereof in various fields of application such as optics, electronics, pharmacy and cosmetics.

These microgels have the advantage of being monodisperse, pH-responsive and temperature-responsive. They can carry magnetic nanoparticles or biologically active molecules. These microgels may also form transparent films, which have novel optical and electromechanical properties.

RESIN COMPOSITION, COATING MATERIAL, ELECTRONIC COMPONENT, MOLDED TRANSFORMER, MOTOR COIL AND CABLE

A resin produced by a conventional technique has a weak nature in terms of hydrolysis resistance. For example, in a case where the resin produced by a conventional technique is used in an area with a highly humid climate such as Japan for a long period of time, deterioration of the resin due to hydrolysis becomes a concern. A resin composition is described that is optimized in the molecular structure design of the resin and in the catalyst in order to improve the hydrolysis resistance. Specifically, the resin composition contains (1) a copolymer of a vinyl compound having two or more epoxy groups, a carboxylic acid anhydride, and a transesterification reaction catalyst, or (2) a copolymer of a vinyl compound having two or more carboxylic acid anhydride groups, an epoxy, and a transesterification reaction catalyst.

WATER-WASHABLE COMPOSITIONS FOR USE IN 3D PRINTING
20230002631 · 2023-01-05 ·

The present invention relates to radiation curable compositions, comprising (A1) at least one water-soluble reactive diluent (A1); (A2) at least one water-soluble reactive oligomer (A2); (B) at least one reactive component selected from the group consisting of a water insoluble reactive diluent (B1a), a slightly water-soluble reactive diluent (B1b) and a water insoluble, or slightly water-soluble reactive oligomer (B2); and (C) optionally a photoinitiator (C), wherein the amount of component (A1) and (A2) is greater than 20% by weight, especially 30% by weight based on the amount of components (A1), (A2), (B1a), (B1b) and (B2) and the amount of components (B1a), (B1b) and (B2) is greater than 10% by weight, especially 20% by weight based on the amount of components (A1), (A2), (B1a), (B1b) and (B2); radiation curable composition, comprising (A1′) at least one slightly water-soluble reactive diluent (B1b); (A2) at least one water-soluble reactive oligomer (A2); (B) at least one reactive component selected from the group consisting of a water insoluble reactive diluent (B1a) and a water insoluble, or slightly water-soluble reactive oligomer (B2); and (C) optionally a photoinitiator (C), wherein the amount of component (B1b) and (A2) is greater than 40% by weight, especially 50% by weight based on the amount of components (A2), (B1a), (B1b) and (B2) and the amount of components (B1a), (B1b) and (B2) is greater than 10% by weight, especially 20% by weight based on the amount of components (A2), (B1a), (B1b) and (B2). The radiation curable compositions can be cleaned by pure water with no assistance of any solvent or detergent. The printed three-dimensional products have clean, smooth, tack-free surface after washing with water and sufficient post-curing. The fully cured three-dimensional products are high-temperature resistant and have excellent mechanical performance above glass transition temperature, e.g. 200° C.

WATER-WASHABLE COMPOSITIONS FOR USE IN 3D PRINTING
20230002631 · 2023-01-05 ·

The present invention relates to radiation curable compositions, comprising (A1) at least one water-soluble reactive diluent (A1); (A2) at least one water-soluble reactive oligomer (A2); (B) at least one reactive component selected from the group consisting of a water insoluble reactive diluent (B1a), a slightly water-soluble reactive diluent (B1b) and a water insoluble, or slightly water-soluble reactive oligomer (B2); and (C) optionally a photoinitiator (C), wherein the amount of component (A1) and (A2) is greater than 20% by weight, especially 30% by weight based on the amount of components (A1), (A2), (B1a), (B1b) and (B2) and the amount of components (B1a), (B1b) and (B2) is greater than 10% by weight, especially 20% by weight based on the amount of components (A1), (A2), (B1a), (B1b) and (B2); radiation curable composition, comprising (A1′) at least one slightly water-soluble reactive diluent (B1b); (A2) at least one water-soluble reactive oligomer (A2); (B) at least one reactive component selected from the group consisting of a water insoluble reactive diluent (B1a) and a water insoluble, or slightly water-soluble reactive oligomer (B2); and (C) optionally a photoinitiator (C), wherein the amount of component (B1b) and (A2) is greater than 40% by weight, especially 50% by weight based on the amount of components (A2), (B1a), (B1b) and (B2) and the amount of components (B1a), (B1b) and (B2) is greater than 10% by weight, especially 20% by weight based on the amount of components (A2), (B1a), (B1b) and (B2). The radiation curable compositions can be cleaned by pure water with no assistance of any solvent or detergent. The printed three-dimensional products have clean, smooth, tack-free surface after washing with water and sufficient post-curing. The fully cured three-dimensional products are high-temperature resistant and have excellent mechanical performance above glass transition temperature, e.g. 200° C.

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED PRODUCT OF FLUORORESIN, FLUORORESIN, FLUORORESIN FILM, BANK AND DISPLAY ELEMENT

An object of the present invention is to provide a photosensitive resin composition having good liquid repellency. The photosensitive resin composition of the present invention at least contains a fluororesin having a crosslinking site, a solvent, and a photopolymerization initiator, and the fluororesin contains a repeating unit derived from a hydrocarbon having a fluorine atom.

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED PRODUCT OF FLUORORESIN, FLUORORESIN, FLUORORESIN FILM, BANK AND DISPLAY ELEMENT

An object of the present invention is to provide a photosensitive resin composition having good liquid repellency. The photosensitive resin composition of the present invention at least contains a fluororesin having a crosslinking site, a solvent, and a photopolymerization initiator, and the fluororesin contains a repeating unit derived from a hydrocarbon having a fluorine atom.

Adhesive composition for foldable display, adhesive film using same, and foldable display comprising same
11708512 · 2023-07-25 · ·

The present application provides an adhesive composition for a foldable display including a thermocurable resin; and a crosslinking agent, wherein the thermocurable resin includes a unit derived from a compound including at least one N or O; and at least one unshared electron pair in the molecule, and the thermocurable resin has a glass transition temperature of −70° C. or lower, an adhesive film using the same, and a foldable display including the same.

Adhesive composition for foldable display, adhesive film using same, and foldable display comprising same
11708512 · 2023-07-25 · ·

The present application provides an adhesive composition for a foldable display including a thermocurable resin; and a crosslinking agent, wherein the thermocurable resin includes a unit derived from a compound including at least one N or O; and at least one unshared electron pair in the molecule, and the thermocurable resin has a glass transition temperature of −70° C. or lower, an adhesive film using the same, and a foldable display including the same.

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

A resist topcoat composition and a method of forming patterns using the resist topcoat composition. The resist topcoat composition includes an acrylic copolymer including a first structural unit represented by Chemical Formula M-1, and a second structural unit represented by Chemical Formula M-2; an acid compound; and a solvent

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RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

A resist topcoat composition and a method of forming patterns using the resist topcoat composition. The resist topcoat composition includes an acrylic copolymer including a first structural unit represented by Chemical Formula M-1, and a second structural unit represented by Chemical Formula M-2; an acid compound; and a solvent

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