Patent classifications
C08F220/303
POLYMERIZABLE LIQUID CRYSTAL COMPOSITION, AND OPTICALLY ANISOTROPIC BODY, PHASE DIFFERENCE FILM, ANTIREFLECTION FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT PRODUCED USING COMPOSITION
The present invention provides a polymerizable liquid crystal composition including a specific polymerizable compound and a fluorosurfactant having specific polyoxyalkylene skeleton and molecular weight. Also, an optically anisotropic body, a phase difference film, an antireflection film, and a liquid crystal display device, which are produced by using the polymerizable liquid crystal composition according to the present invention, are provided. The present invention is useful because three properties, that is, leveling properties of the surface of an optically anisotropic body, offset to a base material, and alignment properties of a liquid crystal can be improved at the same time in the case where the optically anisotropic body is produced by photopolymerizing the polymerizable liquid crystal composition.
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Provided are an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a resin (B) having a group that decomposes by the action of an alkali developer to increase the solubility in the alkali developer and having at least one of a fluorine atom or a silicon atom, and a resin (C) having a phenolic hydroxyl group, different from the resin (B), an actinic ray-sensitive or radiation-sensitive film and a mask blank, each formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device.
Resist underlayer film-forming composition
A resist underlayer film-forming composition for lithography including a copolymer having a structural unit of the following Formula (1) to Formula (3), a crosslinking agent, an organic acid catalyst, and a solvent: ##STR00001##
(wherein R.sup.1s are independently a hydrogen atom or a methyl group, R.sup.2 is a C.sub.1-3 alkylene group, A is a protective group, R.sup.3 is an organic group having a 4-membered ring to 7-membered ring lactone framework, adamantane framework, tricyclodecane framework or norbornane framework, R.sup.4 is a linear, branched or cyclic organic group having a carbon atom number of 1 to 12 in which at least one hydrogen atom is substituted with a fluoro group and which optionally has at least one hydroxy group as a substituent).
Polymerizable liquid crystal compound, liquid crystal composition for optical element, polymer, optically anisotropic body, and optical element for display device
A polymerizable liquid crystal compound represented by Chemical Formula 1, a liquid crystal composition for an optical element comprising the same, a polymer polymerized from the same, an optically anisotropic body comprising a cured material or polymerized reactant of the liquid crystal composition or the polymer, and an optical element for a display device comprising the optical anisotropic body are disclosed herein: ##STR00001## wherein, in Chemical Formula 1, A1 to A3, B1 to B3, R1 to R3, P1 to P3, R4 to R8, l, m, n, p, q r, k, and L1 to L3 are disclosed herein.
Polymerisable Liquid Crystal Material and Polymerised Liquid Crystal Film
A polymerisable LC material comprising at least one di- or multireactive mesogenic compound selected from the group of compounds of formula I,
##STR00001##
at least one monoreactive mesogenic compound selected from the group of compounds of formula II,
##STR00002##
wherein the parameter A.sup.11 to A.sup.21, L.sup.21, p, P.sup.11 to P.sup.22, R.sup.21, Sp.sup.11 to Sp.sup.21, X.sup.11 to X.sup.21, and Z.sup.11 to Z.sup.21 have one of the meanings as given in claim 1, and at least one carbazole oxime ester photoinitiator. Furthermore, a method for preparation of the polymerisable LC material, a polymer film with improved thermal durability obtainable from the corresponding polymerisable LC material, a method of preparation of such polymer film, and the use of such polymer film and said polymerisable LC material for optical, electro-optical, decorative or security devices.
Polymerizable compound and optically anisotropic object
The present invention aims to provide a polymerizable compound that has high storage stability without causing crystal precipitation when added to a polymerizable composition and to provide a polymerizable composition containing the polymerizable compound. A polymer film produced by polymerization of the polymerizable composition has a low haze, high thickness uniformity, low occurrence of nonuniform orientation, high surface hardness, high adhesiveness, and good appearances and fewer orientation defects even after ultraviolet irradiation. The present invention also aims to provide a polymer produced by polymerization of the polymerizable composition and an optically anisotropic body produced from the polymer.
PHOTO-ALIGNMENT POLYMER, BINDER COMPOSITION, BINDER LAYER, OPTICAL LAMINATE, OPTICAL LAMINATE MANUFACTURING METHOD, AND IMAGE DISPLAY DEVICE
A photo-alignment polymer has a repeating unit represented by Formula (1), in Formula (1), R.sup.1 represents a hydrogen atom or a substituent, X represents —O—, —S—, or —NR.sup.2—, in which R.sup.2 represents a hydrogen atom or a substituent, L.sup.1 represents a single bond or a divalent linking group, P represents a photo-aligned group, and A represents an acid-cleavage group which is decomposed by an action of acid to produce a polar group
##STR00001##
Resin, resist composition and method for producing resist pattern
Disclosed is a resin comprising a structural unit derived from a compound represented by formula (I′) and a structural unit having an acid-labile group: ##STR00001## ##STR00002##
wherein R.sup.1 and R.sup.2 each independently represent an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom,
Ar represents an aromatic hydrocarbon group which may have a substituent,
L.sup.1 represents a group represented by formula (X.sup.1-1), etc.,
L.sup.11, L.sup.13, L.sup.15 and L.sup.17 each independently represent an alkanediyl group,
L.sup.12, L.sup.14, L.sup.16 and L.sup.18 each independently represent —O—, —CO—, —CO—O—, —O—CO— or —O—CO—O—, and
* and ** are bonds, and ** represents a bond to an iodine atom.
Salt, resin, resist composition and method for producing resist pattern
A salt represented by formula (I): ##STR00001##
wherein Q.sup.1 and Q.sup.2 independently represent a fluorine atom or a C.sub.1 to C.sub.6 perfluoroalkyl group, R.sup.1 and R.sup.2 each independently represent a hydrogen atom, a fluorine atom or a C.sub.1 to C.sub.6 perfluoroalkyl group, z represents an integer of 0 to 6, R.sup.3 represents a hydrogen atom, a fluorine atom, a C.sub.1 to C.sub.12 alkyl group or a C.sub.1 to C.sub.12 fluorinated alkyl group, R.sup.4 represents a C.sub.1 to C.sub.12 fluorinated alkyl group, L.sup.2 represents a single bond, a C.sub.1 to C.sub.12 divalent saturated hydrocarbon group, etc., R.sup.5 represents a hydrogen atom, a halogen atom or a C.sub.1 to C.sub.6 alkyl group that may have a halogen atom, L.sup.1 represents a group represented by formula (b1-1), etc., * represents a bonding site to —CR.sup.3R.sup.4; L.sup.b2 and L.sup.b3 each independently represent a single bond or a C.sub.1 to C.sub.22 divalent saturated hydrocarbon group; Z.sup.+ represents an organic cation.
OPTICAL FILM
Provided is an optical film which has a maximum absorption at a wavelength in the range of 600 to 680 nm, has a high dichroic ratio, and is excellent in light resistance. The optical film includes: a polymer of a polymerizable liquid crystal compound; and a compound represented by the following general formula (1).
##STR00001##