The polymerizable composition of the present invention includes at least one isocyanate compound (A) having a cyclic structure, selected from compounds represented by the following Formulae (1), (2), and (3), and aliphatic isocyanate compound (B) having 4 to 11 carbon atoms, and a thiol compound (C).

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The present disclosure relates to a polyurethane-urea resin composition for synthetic leather and a method of preparing the polyurethane-urea resin composition, the polyurethane-urea resin composition having excellent resin stability, heat resistance and aesthetic properties by including an ionic compound containing a sulfonic acid group, and by not including a neutralizer. In addition, the polyurethane-urea resin composition for synthetic leather may be applicable for various purposes by controlling a polyurethane-urea particle size to a desired size by controlling a content of the ionic compound containing a sulfonic acid group.

The invention relates to aqueous polyurethane-vinyl polymer hybrid dispersions comprising, as building blocks, hydrophobically modified hydroxy-functional polyesters A, acids B that have further groups which react with isocyanates under formation of urethanes, ureas, or thiourethanes, compounds G having only one hydroxyl group, and one or more tertiary amino groups, olefinically unsaturated monomers H2 having a polymerisable ethylenic unsaturation and a further functional group which reacts with an isocyanate group under bond formation, olefinically unsaturated monomers H1 having at least one polymerisable ethylenic unsaturation and no further functional group which reacts with an isocyanate group, and multifunctional isocyanates I having at least two isocyanate groups per molecule, to a process of their preparation, and to a method of use thereof.

The present invention provides an aircraft window including a polyurethane including a reaction product of components including (a) about 1 equivalent of at least one polyisocyanate; and (b) about 1 equivalent of 1,4-cyclohexane dimethanol based upon the about 1 equivalent of the at least one polyisocyanate, and other aircraft window compositions.

In a coating agent obtained by water-dispersing a polyurethane resin, the polyurethane resin is a secondary reaction product of an isocyanate group-terminated prepolymer and a chain extender. The isocyanate group-terminated prepolymer is a primary reaction product of a polyisocyanate component containing a xylylene diisocyanate and/or a hydrogenated xylylene diisocyanate, and an active hydrogen group-containing component containing a short chain diol having 2 to 6 carbon atoms and an active hydrogen compound having a hydrophilic group; and the viscosity at 25° C. of the coating agent is 50 mPa.Math.s or more.

In the composition according to an embodiment, the weight ratio of toluene 2,4-diisocyanate in which one NCO group is reacted and unreacted toluene 2,6-diisocyanate in the urethane-based prepolymer is adjusted, whereby such physical properties as gelation time can be controlled. Thus, the polishing rate and pad cut rate of a polishing pad obtained by curing the composition according to the embodiment may be controlled while it has a hardness suitable for a soft pad, whereby it is possible to efficiently manufacture high-quality semiconductor devices using the polishing pad.

The present invention relates to a process for producing translucent polyurethane and polyisocyanurate foams by reaction of a component A, comprising A1 at least one polyol reactive with component B; A2 optionally at least one amine; A3 water and optionally formic acid or at least one physical blowing agent or mixtures thereof; A4 at least one foam stabilizer; A5 optionally auxiliary and/or additive substances; A6 optionally at least one flame retardant; A7 at least one catalyst; and a component B, comprising B1 at least one aliphatic or cycloaliphatic polyisocyanate component or a combination thereof; and B2 optionally at least one hydrophilized isocyanate; and B3 more than or equal to 10 parts by weight and up to 70 parts by weight of an aromatic polyisocyanate component, wherein the parts by weight of B3 are based on the sum of the parts by weight of B1 to B3 which are normalized to 100 parts by weight. The invention is characterized in that the reaction of component A with component B is carried out at an isocyanate index of at least 150, wherein the obtained translucent polyurethane and polyisocyanurate foams have a light transmission according to EN ISO 13468-2:2006 of at least 10% and a haze of at least 70%, determined according to ASTM D1003-13, in each case measured at a layer thickness of 20 mm. The present invention further relates to the polyurethane and polyisocyanurate foams obtained by the process and to the use thereof as a construction element, as a wall element, as a floor element, in buildings, in vehicles or lamps.

A solvent-based two-component polyurethane-type adhesive composition comprises an —OH component and an —NCO component. The —OH component comprises an amorphous prepolymer including two —OH end groups, with a number-average molar mass M.sub.n of 8000 to 12, 000 g and is chosen from: a) a copolyester (A1) obtained by a polycondensation reaction of at least one aliphatic diol (i) with at least one aromatic diacid (ii) and at least one aliphatic diacid (iii); and b) a polyurethane (A2) obtained by a polyaddition reaction between an aliphatic diisocyanate compound and an amorphous copolyester diol with a number-average molecular weight M.sub.n ranging from 4000 to 11 500 g/mol. The —NCO component comprises a compound (B1) including three —NCO end groups, obtained by the reaction of meta-xylylene diisocyanate (m-XDI) with a triol, said compound (B1) being alone or as a mixture with a compound (B2) derived from an aliphatic diisocyanate.

The present disclosure relates to a polishing pad, a method for manufacturing the polishing pad, and a method for manufacturing a semiconductor device using the polishing pad. The polishing pad increases the area in direct contact with the semiconductor substrate during the polishing process and can prevent defects occurring on the surface of the semiconductor substrate by forming a plurality of uniform pores in the polishing layer, thereby adjusting the surface roughness characteristics of the polishing surface of the polishing layer. Further, the present disclosure may provide a method for manufacturing a semiconductor device to which the polishing pad is applied.

Provided is a water-based coating composition capable of forming a multilayer coating film having an excellent finished appearance and having excellent storage stability. A water-based coating composition to be used as a water-based first colored coating (X) in a 3-coat-1-bake multilayer coating formation method which sequentially applies a water-based first colored coating (X), a water-based second colored coating (Y), and a clear coating (Z) and heats and cures the obtained three-layer multilayer coating film simultaneously, wherein the water-based coating composition contains at least one resin selected from acrylic resins (A) and polyester resins (B), a curing agent (C), and urethane resin particles (D) obtained from structural components including a polyisocyanate component (d1) containing at least one diisocyanate (d1-1) selected from xylylene diisocyanate and hydrogenated xylylene diisocyanate and a polyol component (d2).