Patent classifications
C08G18/775
PHOTOSENSITIVE RESIN COMPOSITION AND DRY FILM PHOTORESIST CONTAINING THE SAME
The present invention provides a photosensitive resin composition, comprising: (a) photo-polymerizable unsaturated compound, (b) hydroxyurethane compound, and (c) photoinitiator. The photosensitive resin composition can be used as photoresist coating for dry film photoresist to manufacture the electronic components, such as print circuit board and so on. Further, the (b) hydroxyurethane compound having [CC]/[NH.sub.2] between 0.5 and 0.9, which increases the resolution, adhesion, and stripping ability of photosensitive resin composition for dry film photoresist, and improves the effectiveness and the quality of dry film photoresist for manufacturing printed circuit board and other electric component.
FLUORINE-FREE FIBROUS TREATING COMPOSITIONS INCLUDING ISOCYANATE-DERIVED ETHYLENICALLY UNSATURATED MONOMER-CONTAINING OLIGOMERS, AND TREATING METHODS
A fluorine-free composition includes one or more compounds derived from a reaction mixture that includes: (i) at least one isocyanate-reactive (i.e., functionalized) oligomer comprising 2 to 20 repeating units; (ii) at least one polyisocyanate; (iii) optionally at least one additional isocyanate-reactive compound; and (iv) optionally at least one isocyanate blocking agent; wherein the isocyanate-reactive oligomer is made by the radical-initiated reaction of a reaction mixture comprising at least one mercaptan and Sat least one (meth)acrylate monomer, wherein the at least one (meth)acrylate monomer comprises at least one isocyanate-derived group (e.g., a urethane group or a urea group) and at least one hydrocarbon group having at least 16 carbon atoms (and in some embodiments, up to 60 carbon atoms). Such compositions are useful for treating fibrous substrates to enhance their water-repellency.
Network polymers and methods of making and using same
The present invention relates to covalent adaptable networks (CANs) having exchangeable crosslinks which are able to undergo repeated covalent bond reshuffling through photo-activation at ambient temperatures. The invention provides covalent adaptable network forming compositions as well as methods of forming, remolding and recycling the CANs of the invention.
Sulfonic acid-modified polyisocyanate and preparation method therefor
Disclosed are a sulfonic acid-modified polyisocyanate and a preparation method thereof. By controlling a content of cyclohexylamine component in the raw material, the reaction rate of sulfamic acid and polyisocyanate is accelerated, so that the prepared product has advantages of light color and low turbidity as well as good storage stability.