Patent classifications
C08G65/4056
AMORPHOUS POLYMER (P) COMPRISING SEGMENTS (S1), (S2) AND (S3)
The present invention relates to an amorphous polymer (P) comprising segments (S1) containing a sulfone group, segments (S2) containing a ketone group and segments (S3) containing a polyarylene group. Moreover, the present invention relates to a process for the preparation of said amorphous polymer (P), a composition comprising the amorphous polymer (P) and an article comprising the amorphous polymer (P).
FUNCTIONALIZED POLY(ARYL ETHER SULFONES) COPOLYMERS
The invention relates to a side-chain functionalized copolymer (P1) and to the process for preparing the side-chain functionalized copolymer (P1). The present invention also relates to the use of the copolymer (P1) in the preparation of a membrane, a composite material or a coating.
Aromatic polysulfone composition
The present invention relates to an aromatic polysulfone composition including an aromatic polysulfone (P1) and an aromatic polysulfone (P2) different from the aromatic polysulfone (P1), in which the (P1) contains an amino group-containing aromatic polysulfone which has an amino group at a polymer chain terminal and of which a weight-average absolute molecular weight (Mw) is less than 20,000 g/mol, the (P2) substantially consists of a repeating unit represented by General Formula (A) and a glass transition temperature (Tg) of the (P2) is higher than or equal to 222° C., and the weight-average absolute molecular weight (Mw) of the aromatic polysulfone composition is larger than the weight-average absolute molecular weight (Mw) of the amino group-containing aromatic polysulfone.
RESIN COMPOSITION, SELF-FUSING INSULATED ELECTRIC WIRE AND WIRE BUNDLE
A resin composition includes a phenoxy resin as a principal component. The phenoxy resin has a weight-average molecular weight of 40,000 or more. The phenoxy resin has, in the same or different molecules, a first structural unit derived from bisphenol S phenoxy and a second structural unit derived from a bisphenol epoxy other than the bisphenol S phenoxy. A content ratio of the first structural unit in the phenoxy resin is 20 mol% to 80 mol% relative to a total content of the first structural unit and the second structural unit constituting the phenoxy resin.
BLOCKY POLY(ETHER ETHER KETONE) COPOLYMERS AND CORRESPONDING SYNTHESIS METHODS AND ARTICLES
Described here are blocky PEEK copolymers and corresponding synthesis methods. It was surprisingly found that synthesis of blocky PEEK copolymers in a non-solvent environment with respect to PEEK produced blocky PEEK copolymers with high degrees of functionalization and crystallinity. The blocky PEEK copolymers had an increased blocky structure, relative to corresponding PEEK copolymer synthesized with other known methods. Moreover, membranes formed from the blocky PEEK polymers are particularly desirable in fuel cell applications. For example, the membranes formed from the blocky PEEK polymers had surprisingly large ion conductivities as well as significantly improved chemical and thermal resistance, at least in part, to the improved functionalization and crystallinity.
USE OF A SULFONATED POLYARYL ETHER KETONE OR OF A SULFONATED NON-POLYMERIC ARYL ETHER KETONE AS A DISPERSANT
The use of a sulfonated polyaryl ether ketone or of a sulfonated non-polymeric aryl ether ketone as a dispersant for a polyaryl ether ketone resin powder in an aqueous solution, and also to a corresponding composition, and to a process for preparing a semifinished product comprising a polyaryl ether ketone resin and reinforcing fibers.
POLY(BIPHENYL ETHER SULFONE) RESIN AND MOLDED ARTICLE
A poly(biphenyl ether sulfone) resin substantially comprising a repeating structure of the following formula (1), wherein a polystyrene equivalent mass average molecular weight Mw and a melt viscosity μ at a temperature of 350° C. satisfy formulas (6) and (7),
##STR00001## wherein n represents an integer of 1 or more,
60,000≤Mw≤90,000 (6)
0.0906×Mw−4,930≤μ≤3,500 (7).
POLY(BIPHENYL ETHER SULFONE) RESIN, PRODUCTION METHOD THEREFOR, AND MELT-MOLDED ARTICLE
The present invention relates to a poly(biphenyl ether sulfone) resin substantially comprising a repeating structure of the following formula (1), and having a spin-lattice relaxation time T.sub.IL of a long component of 24 s or more, which is calculated from decay of a signal intensity I (τ) corresponding to a chemical shift of 129 ppm by acquiring a .sup.13C-NMR spectrum by a Torchia pulse sequence using an NMR device for solid sample measurement and changing a value of a waiting time τ in the pulse sequence,
##STR00001## wherein n represents an integer of 1 or more.
PHOTOCURABLE POLYMERS, PHOTOCURABLE POLYMER COMPOSITIONS AND LITHOGRAPHIC PROCESSES INCLUDING THE SAME
The present invention relates to relates to a polymer formulation for three-dimensionally (3D) printing an article by stereolithography, the formulation comprising a functionalized polymer. The invention further relates to lithographic methods to form 3D objects that incorporate the aforementioned polymer formulation.
SEMICRYSTALLINE POLYPHENYLSULFONE AND ASSOCIATED METHOD OF MAKING AND METHOD OF ADDITIVE MANUFACTURING
A semicrystalline polyphenylsulfone, has the structure Formula (I) wherein n and R are defined herein. The semicrystalline polyphenylsulfone, which exhibits a crystalline melting point in a range of 215 to 270° C., can be prepared from amorphous polyphenylsulfone using a solvent-induced crystallization method. An additive manufacturing method utilizing particles of the semicrystalline polyphenylsulfone is described.