A nano-organosilicon film-forming and hydrophobic shale surface hydration inhibitor is obtained by performing hydrophobic modification for nano-particles through long-chain organosilicon together with a surface-active agent. A preparation method of the said hydrophobic shale surface hydration inhibitor comprises steps as follows: nano-particles are added to the solvent under stirring conditions, and then an ultrasonic dispersion is performed; upon the end of the ultrasonic dispersion, the reaction system is adjusted to a pH of 9-11 to obtain mixed solution A; a long-chain organosilicon solution is then dropwise added to the mixed solution A for reaction under stirring conditions to obtain mixed solution B; a surface-active agent is added to the mixed solution B for reaction under stirring conditions; upon the reaction is finished, part of the solvent is removed to obtain the inhibitor.

A nano-organosilicon film-forming and hydrophobic shale surface hydration inhibitor is obtained by performing hydrophobic modification for nano-particles through long-chain organosilicon together with a surface-active agent. A preparation method of the said hydrophobic shale surface hydration inhibitor comprises steps as follows: nano-particles are added to the solvent under stirring conditions, and then an ultrasonic dispersion is performed; upon the end of the ultrasonic dispersion, the reaction system is adjusted to a pH of 9-11 to obtain mixed solution A; a long-chain organosilicon solution is then dropwise added to the mixed solution A for reaction under stirring conditions to obtain mixed solution B; a surface-active agent is added to the mixed solution B for reaction under stirring conditions; upon the reaction is finished, part of the solvent is removed to obtain the inhibitor.

A nano-organosilicon film-forming and hydrophobic shale surface hydration inhibitor is obtained by performing hydrophobic modification for nano-particles through long-chain organosilicon together with a surface-active agent. A preparation method of the said hydrophobic shale surface hydration inhibitor comprises steps as follows: nano-particles are added to the solvent under stirring conditions, and then an ultrasonic dispersion is performed; upon the end of the ultrasonic dispersion, the reaction system is adjusted to a pH of 9-11 to obtain mixed solution A; a long-chain organosilicon solution is then dropwise added to the mixed solution A for reaction under stirring conditions to obtain mixed solution B; a surface-active agent is added to the mixed solution B for reaction under stirring conditions; upon the reaction is finished, part of the solvent is removed to obtain the inhibitor.

One or more embodiments presently described are directed to drilling fluid compositions that include lubricants, methods for making drilling fluids, and methods for drilling subterranean wells utilizing the drilling fluids. According to one embodiment, a drilling fluid composition may include a base fluid including water, a weighting agent in an amount of from 0.1 weight percent (wt. %) to 75 wt. % relative to the total weight of the water-based drilling fluid, and a lubricant in an amount of from 1 wt. % to 10 wt. % relative to the total weight of the water-based drilling fluid. The lubricant may include one or more alkyl esters and a fatty acid blend including at least palmitic acid and stearic acid. The sum of the weight percent of the palmitic acid and stearic acid may be at least 50 wt. % of the fatty acid blend.

One or more embodiments presently described are directed to drilling fluid compositions that include lubricants, methods for making drilling fluids, and methods for drilling subterranean wells utilizing the drilling fluids. According to one embodiment, a drilling fluid composition may include a base fluid including water, a weighting agent in an amount of from 0.1 weight percent (wt. %) to 75 wt. % relative to the total weight of the water-based drilling fluid, and a lubricant in an amount of from 1 wt. % to 10 wt. % relative to the total weight of the water-based drilling fluid. The lubricant may include one or more alkyl esters and a fatty acid blend including at least palmitic acid and stearic acid. The sum of the weight percent of the palmitic acid and stearic acid may be at least 50 wt. % of the fatty acid blend.

Amidoamine-based gemini surfactants having dual chains connected via an arylene or heteroarylene linker. Each chain contains a quaternary ammonium head group and an ethoxylated alkyl tail. A water-based drilling fluid containing the gemini surfactant is also provided. As examined by linear swelling and free swelling tests, the gemini surfactant is effective in reducing clay swelling.

A well bore cementing system may comprise a spacer fluid and a cement slurry. The spacer fluid may be positioned within a well bore, and the spacer fluid may comprise a first surfactant package comprising one or more surfactants. The cement slurry may be positioned within the well bore, and the cement slurry may comprise a second surfactant package comprising one or more surfactants.

A well bore cementing system may comprise a spacer fluid and a cement slurry. The spacer fluid may be positioned within a well bore, and the spacer fluid may comprise a first surfactant package comprising one or more surfactants. The cement slurry may be positioned within the well bore, and the cement slurry may comprise a second surfactant package comprising one or more surfactants.

A water-based wellbore fluid may include an aqueous base fluid and a modified graphene shale inhibitor that comprises one or more substituents that are covalently bonded to graphene via a linking group. One of the one or more substituents may be a hydrocarbon group that has a number of carbon atoms in the range from 8 to 14.

A water-based wellbore fluid may include an aqueous base fluid and a modified graphene shale inhibitor that comprises one or more substituents that are covalently bonded to graphene via a linking group. One of the one or more substituents may be a hydrocarbon group that has a number of carbon atoms in the range from 8 to 14.