Patent classifications
C11D3/201
ALCOHOL CONTAINING BIOFIILM-INHIBITING NON-ANTIMICROBIAL CLEANSING COMPOSITION
A biofilm inhibiting, non-antimicrobial cleansing composition is disclosed, comprising from about 10.0 wt. % to less than about 30 wt. % of one or more C.sub.1-C.sub.8 alcohols; about 0.5 wt. % to about 10.0 wt. % of at least one primary surfactant, based on the total weight of the cleansing composition; 0 wt. % to about 10.0 wt. % of at least one secondary surfactant, based on the total weight of the cleansing composition; a pH adjusting agent; and water. The composition does not achieve a microbial kill level greater than 2.0 log and reduces the formation of a biofilm by at least 30%, compared to an otherwise comparable composition that does not include about 10 wt. % to about 30 wt. % of one or more C.sub.1-C.sub.8 alcohols.
UNDERWATER CAVITATION JET CLEANING SYSTEM
An underwater cavitation jet cleaning system provided with an automatic metering feeder for cleaning solution organically integrates a cavitation jet technology with the improvement of cleaning solutions, which can not only increase bubbles can be during jet, but also is beneficial for removing hull dirt. An eddy segment of a nozzle is arranged as a spiral passage, and the eddy segment is gradually reduced from a water inlet to a water outlet, so that a speed of fluid becomes further faster. A volume of an in-pipe chamber of a barrel is different, and the fluid is pulsed while flowing through the barrel, so that the fluid is finally ejected from the nozzle of a cleaning gun, which efficiently improves the cavitation rate, and increases the generation of cavitation nucleus.
PHOTORESIST PATTERN SHRINKING COMPOSITION AND PATTERN SHRINKING METHOD
Provided is a composition for shrinking a photoresist pattern, which is capable of shrinking a photoresist pattern using a photoresist during the fabrication of a semiconductor, and to a method of shrinking a pattern using the composition, whereby a pattern to be formed can be shrunken in a photoresist-patterning process, thus remarkably decreasing the number of steps of a semiconductor fabrication process and reducing the fabrication time and costs.
Methods for making encapsulate-containing product compositions
Methods relating to making product compositions that include encapsulates and borate compounds, where the encapsulates include polyvinyl alcohol polymer. Compositions made from such methods. Encapsulate slurries.
CRACKLING CLEANING COMPOSITION
A cleaning composition comprising: (a) from 20 to 49 wt % propellant; (b) from 25 to 55 wt % water; (c) from 3 to 12 wt % glycol alkyl ether; (d) from 2 to 12 wt % of an alcohol selected from the group consisting of ethanol and isopropanol; (d) from 1.5 to 5 wt % of a nonionic surfactant; and (e) from 0.3 to 1.5 wt % of a thickener.
Mousse composition
The invention relates to a mousse composition comprising: a) a base composition comprising: (i) from 0.0001 to 5 wt. % of a lactam; (ii) from 0.1 to 10 wt. % of an alcohol; and, b) a propellant; and to the use of a combination of a lactam with an alcohol, in a mousse composition to collapse the resulting mousse foam quicker; and to the use of a combination of a lactam with an alcohol, in a mousse composition to make the resulting mousse foam easier to rinse.
HARD SURFACE CLEANING COMPOSITION AND METHOD OF IMPROVING SURFACE SHINE USING THE SAME
A hard surface cleaning composition, methods of cleaning a hard surface with a low hysteresis composition and disposable premoistened pads for cleaning hard surfaces are provided. The hard surface cleaning composition includes from 0.01 wt. % to 7 wt. % of a solvent selected from the group consisting of a propylene glycol phenyl ether, a dipropylene glycol phenyl ethers and mixtures thereof and at least 92% water. The cleaning composition has a pH from about 3.5 to 9.5 and is free of anionic surfactant and alkanolamine.
HARD SURFACE CLEANING COMPOSITION AND METHOD OF IMPROVING SURFACE SHINE USING THE SAME
A hard surface cleaning composition, methods of cleaning a hard surface with a low hysteresis composition and disposable premoistened pads for cleaning hard surfaces are provided. The hard surface cleaning composition includes from 0.01 wt. % to 7 wt. % of a solvent selected from the group consisting of a propylene glycol phenyl ether, a dipropylene glycol phenyl ethers and mixtures thereof and at least 92% water. The cleaning composition has a pH from about 3.5 to 9.5 and is free of anionic surfactant and alkanolamine.
CLEANING COMPOSITION, METHOD FOR PREPARING THE SAME AND USE THEREOF
Provided is a cleaning composition contained in an aerosol spray can, methods of making and using the cleaning composition, which comprises: a liquid cleaning mixture, comprising: a) a solvent selected from the group consisting of isohexane, isoheptane, and n-heptane and mixtures thereof; b) a de-aromatized hydrocarbon solvent having 7 to 8 carbon atoms in its molecule; c) a branched aliphatic alkane having 10 to 11 carbon atoms; d) from 5 to 15 parts by weight of ethanol, e) from 1 to 15 parts by weight of isopropanol, f) from 1 to 10 parts by weight of acetone, and g) from 0.01 to 0.2 parts by weight of iso-tridecanol polyoxyethylene ether having a HLB value of 12 to 13, and a gas propellant.
DISINFECTING-WIPES PACKAGE
A package has a container formed with a dispensing opening and a supply of nonwoven disinfecting wipes in the container. The wipes are made of fibers containing lignin and impregnated with a disinfectant solution having at least two liquid components. A lignin content of the nonwoven wipes is between 0.02 g/m.sup.2 and 1 g/m.sup.2 and/or the disinfectant solution contains a dye. Thus if at least a part of one of the wipes is overexposed to air, it will change color as oxidized lignin and/or dye collects in it.