A cleaning wipe having a nonwoven substrate impregnated with a dispersal composition including at least one of a polar solvent and a water-in-oil emulsion is disclosed. The dispersal composition provides an enhancement to the dispersion of the nonwoven substrate including a binder when placed within a waste water stream after use, thereby more effectively disposing of the wipe after use.

A cleaning wipe having a nonwoven substrate impregnated with a dispersal composition including at least one of a polar solvent and a water-in-oil emulsion is disclosed. The dispersal composition provides an enhancement to the dispersion of the nonwoven substrate including a binder when placed within a waste water stream after use, thereby more effectively disposing of the wipe after use.

An antimicrobial detergent composition includes the following components by mass percent: 0.1-10% of a polyester-polyether polymer, 0.01-2% of an antimicrobial agent with a halogenated phenol structure, 10-50% of a surfactant and a solvent. A 1% deionized water solution of the detergent composition has a pH value of 7.0-9.0. In the present invention, by introducing the polyester-polyether polymer into the composition, the deposition efficiency of the antimicrobial agent with the halogenated phenol structure on a fabric can be improved, a solubilization effect of the surfactant in a detergent can be reduced, and therefore, a antimicrobial effect is achieved.

A composition that includes of detersive surfactant, external structurant or thickener, and C4-C10 alkyl branched alcohol.

A laundry detergent composition containing an ethylene oxide-propylene oxide-ethylene oxide (EO/PO/EO) triblock copolymer and a lipase enzyme and use of an ethylene oxide-propylene oxide-ethylene oxide (EO/PO/EO) triblock copolymer and lipase enzyme in the laundry detergent composition.

Disclosed herein are cleaning compositions, e.g., dishwashing compositions, comprising one or more anionic surfactants comprising sodium laureth sulfate (SLES), one or more amphoteric surfactants, and an additive selected from caprylyl glycol, ethanol, and a combination thereof, wherein the composition contains less than 1 ppm. The cleaning compositions may further comprise a linear alkylbenzene sulfonate (LAS). Methods of making and cleaning a hard surface using such compositions are also provided.

An aqueous rinse aid solution for use in a dishwashing machine wherein the solution is substantially free of poloxamer type surfactants and wherein the solution produces water sheeting and spot-free dishware drying, the solution consists of food additives permitted for direct addition to food for human consumption and water.

Amides of an aliphatic polyamine with two or three molecules of 12-hydroxyoctadecanoic acid, wherein the polyamine comprises at least one primary amino group for each molecule of 12-hydroxyoctadecanoic acid and additionally at least one secondary and/or tertiary amino group, can be used in a lipase stable thickener composition comprising from 50 to 95% by weight of one or more of the amides, from 5 to 50% by weight of one or more diluents and from 0 to 10% by weight water, and such thickener compositions can be prepared by a step of heating a starting mixture comprising hydrogenated castor oil and one or more aliphatic polyamines and adding one or more diluents before or after the heating step.

There is provided a cleaning fluid that effectively removes metal impurities and the like existing on a portion through which a chemical solution for lithography passes, before causing the chemical solution to pass through a semiconductor manufacturing equipment in a lithography process, in order to prevent defects caused by the metal impurities and the like found on a semiconductor substrate after forming a resist pattern or after processing a semiconductor substrate in a process for manufacturing semiconductor device. A cleaning fluid to clean a portion through which a chemical solution for lithography passes in a semiconductor manufacturing equipment used in a lithography process for manufacturing semiconductors, including: an inorganic acid; water; and a hydrophilic organic solvent. In the cleaning fluid, the concentration of the inorganic acid is preferably 0.0001% by mass to 60% by mass based on a total mass of the cleaning fluid.

A water-soluble unit dose article including a water-soluble film and a first compartment and a second compartment, where the first compartment includes a powder composition, where the powder composition includes an acyl hydrazone bleach catalyst; and where the second compartment includes a liquid composition, where the liquid composition includes between about 10% and about 25% by weight of the liquid composition of a non-aqueous solvent system; where the non-aqueous solvent system includes a polyol and a monoalcohol.