Patent classifications
C
C03
C03B
37/00
C03B37/01
C03B37/012
C03B37/014
C03B37/018
C03B37/01861
C03B37/01869
C03B37/01869
Plasma chemical vapor deposition process
12398063
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2025-08-26
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A method for manufacturing a primary preform for optical fibers via an internal plasma chemical vapor deposition (PCVD) process in a hollow silica substrate tube having a supply side and a discharge side includes depositing doped or non-doped silica layers on the inner surface of the hollow substrate tube by supplying glass-forming gasses to the interior of the hollow substrate tube via the supply side thereof, and by creating a plasma reaction zone in the interior of the hollow substrate tube via microwave radiation having a microwave power, wherein the microwave power is decreased during the depositing.