New Te-salt compounds, including photoactive tellurium compounds useful for Extreme Ultraviolet Lithography.

New Te-salt compounds, including photoactive tellurium compounds useful for Extreme Ultraviolet Lithography.

Oxathiazin-like compounds, processes for making new oxathiazin-like compounds, compounds useful for making oxathiazin-like compounds, and their uses are disclosed. Processes for efficient and safe manufacture of compounds useful for making oxathiazin-like compounds useful for treating patients suffering from cancers, bacterial infections, fungal infections and/or viral infections by administering oxathiazin-like compounds are also disclosed.

Oxathiazin-like compounds, processes for making new oxathiazin-like compounds, compounds useful for making oxathiazin-like compounds, and their uses are disclosed. Processes for efficient and safe manufacture of compounds useful for making oxathiazin-like compounds useful for treating patients suffering from cancers, bacterial infections, fungal infections and/or viral infections by administering oxathiazin-like compounds are also disclosed.

A sulfonic acid or carboxylic acid containing a carbonyl group, or a salt thereof represented by the following formula:

R.sup.1C(O)(CR.sup.2.sub.2)(OR.sup.3).sub.p(CR.sup.4.sub.2).sub.q-L-A

wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, n, p, q, A and L are as defined herein.

A sulfonic acid or carboxylic acid containing a carbonyl group, or a salt thereof represented by the following formula:

R.sup.1C(O)(CR.sup.2.sub.2)(OR.sup.3).sub.p(CR.sup.4.sub.2).sub.q-L-A

wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, n, p, q, A and L are as defined herein.

Novel photoacid generator compounds are provided. Compositions that include the novel photoacid generator compounds are also provided. The present disclosure further provides methods of making and using the photoacid generator compounds and compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.

Novel photoacid generator compounds are provided. Compositions that include the novel photoacid generator compounds are also provided. The present disclosure further provides methods of making and using the photoacid generator compounds and compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.

Methods of enhanced oil recovery are disclosed that use compositions including an alkyl polyether anionic surfactant having the general structure R.sup.1JA, wherein R.sup.1 is a C.sub.8-C.sub.18 primary or secondary radical group, J is a random, block, alternating, or alternating block polyether segment having the structure [(PO).sub.x(EO).sub.y(BO).sub.z], wherein x is 4 to 18, y is 0 to 20, and z is 0 to 5, and A is an anionic group; a co-surfactant having the general structure (R.sup.2).sub.q(B)Ph-L-Ph(D)(R.sup.3).sub.r, wherein R.sup.2 and R.sup.3 are each, independently in each instance, a C.sub.8-C.sub.24 linear or branched, primary or secondary alkyl group, B and D are anionic groups, q is 1 to 3, r is 1 to 3, and L is O or CH.sub.2; and an alkoxy alcohol.

Methods of enhanced oil recovery are disclosed that use compositions including an alkyl polyether anionic surfactant having the general structure R.sup.1JA, wherein R.sup.1 is a C.sub.8-C.sub.18 primary or secondary radical group, J is a random, block, alternating, or alternating block polyether segment having the structure [(PO).sub.x(EO).sub.y(BO).sub.z], wherein x is 4 to 18, y is 0 to 20, and z is 0 to 5, and A is an anionic group; a co-surfactant having the general structure (R.sup.2).sub.q(B)Ph-L-Ph(D)(R.sup.3).sub.r, wherein R.sup.2 and R.sup.3 are each, independently in each instance, a C.sub.8-C.sub.24 linear or branched, primary or secondary alkyl group, B and D are anionic groups, q is 1 to 3, r is 1 to 3, and L is O or CH.sub.2; and an alkoxy alcohol.