A negative resist composition is provided comprising a base polymer and an acid generator in the form of a sulfonium salt consisting of a sulfonate anion having a maleimide group and a cation having a polymerizable double bond. The resist composition adapted for organic solvent development exhibits a high resolution and improved LWR or CDU.

A radiation-sensitive resin composition includes: a resin including a structural unit represented by formula (1); at least one onium salt each including an organic acid anion moiety and an onium cation moiety; and a solvent. At least part of the organic acid anion moiety in the at least one onium salt includes an iodine-substituted aromatic ring structure. R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Y.sup.1 is a divalent linking group, and X.sup.1 is an acid-dissociable group, and n is 0 or 1. When n is 0, X.sup.1 is represented by formula (s1) or (s2).

##STR00001##

A radiation-sensitive resin composition includes: a resin including a structural unit represented by formula (1); at least one onium salt each including an organic acid anion moiety and an onium cation moiety; and a solvent. At least part of the organic acid anion moiety in the at least one onium salt includes an iodine-substituted aromatic ring structure. R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Y.sup.1 is a divalent linking group, and X.sup.1 is an acid-dissociable group, and n is 0 or 1. When n is 0, X.sup.1 is represented by formula (s1) or (s2).

##STR00001##

The present invention relates to novel compounds of polyfunctionalized polyethylene and polypropylene glycols, their synthesis and their use, in particular as tracers in applications related to oil and gas production, and especially as specific markers of various target fluids.

The present invention relates to novel compounds of polyfunctionalized polyethylene and polypropylene glycols, their synthesis and their use, in particular as tracers in applications related to oil and gas production, and especially as specific markers of various target fluids.

A compound of formula (I): R.sub.1O(CH.sub.2CH.sub.2O).sub.x(CH.sub.2CH(R.sub.2)O).sub.ySO.sub.3M, wherein R.sub.1, R.sub.2, x, y and M are defined herein. A composition comprising the compound of formula (I) and the use thereof.

A compound of formula (I): R.sub.1O(CH.sub.2CH.sub.2O).sub.x(CH.sub.2CH(R.sub.2)O).sub.ySO.sub.3M, wherein R.sub.1, R.sub.2, x, y and M are defined herein. A composition comprising the compound of formula (I) and the use thereof.

New Te-salt compounds are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.

New Te-salt compounds are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.

Disclosed are a salt represented by formula (I), an acid generator and a resist composition: ##STR00001## wherein Q.sup.1 and Q.sup.2 each represent a fluorine atom or a perfluoroalkyl group; R.sup.11 and R.sup.12 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; X.sup.0 represents *COO, *OCO, etc.; L.sup.1 represents a single bond or a hydrocarbon group which may have a substituent; Ar represents an aromatic hydrocarbon group which may have a substituent; X.sup.1 represents an oxygen atom or a sulfur atom; R.sup.1 represents a halogen atom or a haloalkyl group; R.sup.2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m1 represents an integer of 1 to 6; m2 represents an integer of 0 to 4; and Z.sup.+ represents an organic cation.