The present disclosure discloses an arylaminosilane compound, a propylene polymerization catalyst and preparation thereof. The arylaminosilane compound has a structure of

##STR00001##

wherein R.sub.1 is a C.sub.1-C.sub.8 alkyl group or a C.sub.1-C.sub.8 silanyl group; R.sub.2, R.sub.3, R.sub.4, R.sub.5 and R.sub.6 are each independently H or a C.sub.1-C.sub.12 alkyl group; R.sub.7, R.sub.8 and R.sub.9 are each independently a C.sub.1-C.sub.8 alkyl group or a C.sub.1-C.sub.8 alkoxy group. When the arylaminosilane compound is used as an external electron donor of a propylene polymerization catalyst in propylene polymerization reaction, the catalyst has good hydrogen response.

Nanoparticles that can be used as hydrosilylation and dehydrogenative silylation catalysts. The nanoparticles have at least one transition metal with an oxidation state of 0, chosen from the metals of columns 8, 9 and 10 of the periodic table, and at least one carbonyl ligand, preferably a silicide.

Amino-functionalized linear and cyclic oligosiloxanes, which have at least two silicon and two oxygen atoms as well as an organoamino group and methods for making the oligosiloxanes are disclosed. Methods for depositing silicon and oxygen containing films using the organoamino-functionalized linear and cyclic oligosiloxanes are also disclosed.

Amino-functionalized linear and cyclic oligosiloxanes, which have at least two silicon and two oxygen atoms as well as an organoamino group and methods for making the oligosiloxanes are disclosed. Methods for depositing silicon and oxygen containing films using the organoamino-functionalized linear and cyclic oligosiloxanes are also disclosed.

The invention relates to a compound of formula (I), wherein: A represents a binding group comprising at least one nitrogen atom; Q.sub.1 and Q.sub.2 represent, independently of one another, a linkage group; x is an integer between 2 and 6; and Z represents the group of formula (I), wherein each R represents, independently, an alkyl group having between 1 and 4 carbon atoms. The invention also relates to a rubber composition comprising said compound.

##STR00001##

Shown is a method for producing an N-silylaminoalkylsilane compound. The N-silylaminoalkylsilane compound is produced by allowing an aminoalkylsilane compound to react with a monochlorosilane compound in the presence of a tertiary amine compound having an acid dissociation constant (pKa) of 7 or more and a polar surface area (PSA) of 12 .sup.2 or more. The aminoalkylsilane compound is a compound represented by formula (1), for example. In formula (1), R.sup.1 is alkyl having 1 to 5 carbons; R.sup.2 is hydrogen, phenyl or 2-aminoethyl; m is 1, 2, 3, 4 or 5; and n is 0, 1 or 2. A reaction is as described in (ZZ) below, for example. ##STR00001##

Shown is a method for producing an N-silylaminoalkylsilane compound. The N-silylaminoalkylsilane compound is produced by allowing an aminoalkylsilane compound to react with a monochlorosilane compound in the presence of a tertiary amine compound having an acid dissociation constant (pKa) of 7 or more and a polar surface area (PSA) of 12 .sup.2 or more. The aminoalkylsilane compound is a compound represented by formula (1), for example. In formula (1), R.sup.1 is alkyl having 1 to 5 carbons; R.sup.2 is hydrogen, phenyl or 2-aminoethyl; m is 1, 2, 3, 4 or 5; and n is 0, 1 or 2. A reaction is as described in (ZZ) below, for example.

##STR00001##

Polycyclic aminosilane compounds of specific structure are fully effective for use as silane coupling agents, surface treating agents, resin additives, paint additives, and adhesives and evolve little or no low-boiling alcohols during service.

Polycyclic aminosilane compounds of specific structure are fully effective for use as silane coupling agents, surface treating agents, resin additives, paint additives, and adhesives and evolve little or no low-boiling alcohols during service.

Provided are a resist compound for photolithography, a method for forming the same, and a method for manufacturing a semiconductor device using the same. The resist compound is represented by Formula 1.