C07F7/1892

Method for Producing Organosilicon Compound Having Ketimine Structure

A method for producing an organosilicon compound having the formula (1) and having a ketimine structure, the method including reacting an amino group-containing organosilicon compound having the formula (2) and having a chlorine atom content of less than 0.1 ppm by weight with a carbonyl compound having the formula (3).

##STR00001##

R.sup.1 independently represents an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms, R.sup.2 independently represents an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms, R.sup.3 and R.sup.4 each independently represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or an aryl group having 6 to 10 carbon atoms, n represents an integer of 1 to 3, and m represents an integer of 1 to 12.

##STR00002##

R.sup.1, R.sup.2, R.sup.3, R.sup.4, n, and m are as described above.

MACROLIDES AND METHODS OF THEIR PREPARATION AND USE

Provided herein are methods of preparing macrolides by the coupling of an eastern and western half, followed by macrocyclization, to provide macrolides, including both known and novel macrolides. Intermediates in the synthesis of macrolides including the eastern and western halves are also provided. Pharmaceutical compositions and methods of treating infectious diseases and inflammatory conditions using the inventive macrolides are also provided. A general diastereoselective aldol methodology used in the synthesis of the western half is further provided.

Azole silane compound

The present invention relates to a specific azole silane compound, an oligomer thereof, a mixture comprising said compound and/or said oligomer, as well as a respective storage and working solution. Furthermore, the present invention relates to a synthesis method for said specific azole silane compound, and the use of said working solution as a surface treatment solution.

PROCESSES FOR MAKING POLYSILOXAZANES AND USING SAME FOR PRODUCING AMINO-FUNCTIONAL POLYORGANOSILOXANES

A process for preparing a cyclic polysiloxazane is disclosed. The cyclic polysiloxazane may optionally be converted to an a-alkoxy-ou-amino-functional polysiloxane. The cyclic polysiloxazane or the a-alkoxy-oo-amino-functional polysiloxane, may be used as a capping agent for a silanol-functional polyorganosiloxane in a process to make an amino-functional polyorganosiloxane.

Tetrazole silane compound, method for synthesizing said compound and use thereof

The objectives of the present invention are: to provide a novel tetrazole silane compound, a method for synthesizing the same, and a silane coupling agent containing the tetrazole silane compound as a component; and to provide a surface treatment solution using the tetrazole silane compound, a method for surface treatment, and a method for adhering two different materials. The tetrazole silane compound according to the present invention is a compound represented by chemical formula (I). (In formula (I), X, R, and n are respectively the same as defined in the specification.) ##STR00001##

Macrolides and methods of their preparation and use

Provided herein are methods of preparing macrolides by the coupling of an eastern and western half, followed by macrocyclization, to provide macrolides, including both known and novel macrolides. Intermediates in the synthesis of macrolides including the eastern and western halves are also provided. Pharmaceutical compositions and methods of treating infectious diseases and inflammatory conditions using the inventive macrolides are also provided. A general diastereoselective aldol methodology used in the synthesis of the western half is further provided.

Silicon Compounds And Methods For Depositing Films Using Same

A composition, and chemical vapor deposition method, is provided for producing a dielectric film. A gaseous reagent including the composition is introduced into the reaction chamber in which a substrate is provided. The gaseous reagent includes a silicon precursor that includes a silicon compound according to Formula I as defined herein. Energy is applied to the gaseous reagents in the reaction chamber to induce reaction of the gaseous reagents and to thereby deposit a film on the substrate. The film as deposited is suitable for its intended use without an optional additional cure step applied to the as-deposited film. A method for making the composition is also disclosed.

METHOD FOR PRODUCING MAXACALCITOL, AND INTERMEDIATE THEREFOR

A new and improved method for preparing maxacalcitol and an intermediate therefor is provided. The method is an efficient and cost-effective process for preparing maxacalcitol and an intermediate therefor.

METHOD OF SURFACE CHEMICAL FUNCTIONALIZATION FOR DEVELOPING OF FUNCTIONAL HYDROPHOBIC SURFACES
20230063903 · 2023-03-02 ·

A photochemical method for chemical modification of a hydrophilic material to provide the surface of the material with hydrophobic properties. The method comprises functionalizing the surface to provide an amine group thereon, and then functionalizing the surface photo-catalytically to provide perfluoroalkanamide thereon. Alternatively, the method comprises reacting a silane moiety functional group on the surface of the material with a perfluoroalkylhalide in the presence of a photo-catalyst and light.

METHOD FOR PRODUCING ORGANIC SILICON COMPOUND HAVING KETIMINE STRUCTURE

An organic silicon compound having a ketimine structure can be recovered at a high yield through a method for producing an organic silicon compound having a ketimine structure represented by formula (1), the method having a step for reacting an amino-group-containing organic silicon compound represented by formula (2) and a carbonyl compound represented by formula (3) in the presence of an inorganic adsorbent.

##STR00001##

(In the formulas, R.sup.1 each independently represent a C1-10 alkyl group or a C6-10 aryl group, R.sup.2 each independently represent a C1-10 alkyl group or a C6-10 aryl group, R.sup.3 and R.sup.4 each independently represent a hydrogen atom, a C1-10 alkyl group, or a C6-10 aryl group, n represents an integer of 1-3, and m represents an integer of 1-12.)

##STR00002##

(In the formulas, R.sup.1-R.sup.4, n, and m are the same as above.)