Patent classifications
C08F220/1818
RELEASE AGENT AND METHOD OF PRODUCING RESIN PRODUCT
A release agent contains a polymer of a polymerizable component containing a (meth)acrylate having a long-chain alkyl group with carbon atoms of 12 to 22 and an acid group-containing ethylenic unsaturated bond-containing monomer, wherein an acid group is neutralized by ammonia and/or amines.
RELEASE AGENT AND METHOD OF PRODUCING RESIN PRODUCT
A release agent contains a polymer of a polymerizable component containing a (meth)acrylate having a long-chain alkyl group with carbon atoms of 12 to 22 and an acid group-containing ethylenic unsaturated bond-containing monomer, wherein an acid group is neutralized by ammonia and/or amines.
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method of manufacturing electronic device, compound, and resin
An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (C) having a repeating unit represented by Formula (1). A pattern forming method includes a step of forming a film with the actinic ray-sensitive or radiation-sensitive resin composition, and a method of manufacturing an electronic device includes the pattern forming method, ##STR00001## in Formula (1), Z represents a halogen atom, a group represented by R.sub.11OCH.sub.2—, or a group represented by R.sub.12OC(═O)CH.sub.2—. R.sub.11 and R.sub.12 each represent a monovalent substituent. X represents an oxygen atom or a sulfur atom. L represents a (n+1)-valent linking group. R represents a group having a group that is decomposed due to the action of an alkali developer to increase solubility in an alkali developer, n represents a positive integer.
High-pressure polymerization process for liquid ethylene copolymers
The present invention relates to a continuous high-pressure polymerization process for the preparation of a liquid ethylene copolymer which comprises in polymerized form 20 to 60 wt % of ethylene; and at least 20 wt % of an acrylate, which is selected from C.sub.1-C.sub.22 alkyl (meth)acrylate, where a monomer feed comprising the ethylene and the acrylate is polymerized in the presence of at least 2 wt % of a chain transfer agent. The invention further relates to the liquid ethylene copolymer obtainable by the polymerization process; and to a lubricant comprising the liquid ethylene copolymer obtainable by the polymerization process; and to a method for reducing friction between moving surfaces comprising the step of contacting the surfaces with the lubricant or with the ethylene copolymer.
High-pressure polymerization process for liquid ethylene copolymers
The present invention relates to a continuous high-pressure polymerization process for the preparation of a liquid ethylene copolymer which comprises in polymerized form 20 to 60 wt % of ethylene; and at least 20 wt % of an acrylate, which is selected from C.sub.1-C.sub.22 alkyl (meth)acrylate, where a monomer feed comprising the ethylene and the acrylate is polymerized in the presence of at least 2 wt % of a chain transfer agent. The invention further relates to the liquid ethylene copolymer obtainable by the polymerization process; and to a lubricant comprising the liquid ethylene copolymer obtainable by the polymerization process; and to a method for reducing friction between moving surfaces comprising the step of contacting the surfaces with the lubricant or with the ethylene copolymer.
Method of preparing terpolymer-doped polyaniline super-hydrophobic composite anticorrosive paint
The present invention discloses a method of preparing a terpolymer-doped polyaniline super-hydrophobic composite anticorrosive paint. The method includes: firstly by adopting solution polymerization, stirring a hydrophilic vinyl monomer, a fluorine-containing acrylate monomer and an oil-soluble initiator in a solvent evenly and carrying out a reaction for a period of time, then adding a functional acrylic monomer or long-chain acrylate monomer as a third monomer for further reaction for a period of time to obtain a fluorine-containing terpolymer surfactant; then mixing the fluorine-containing terpolymer surfactant with an aniline monomer and an oxidant evenly, and carrying out a reaction for a period of time to obtain super-hydrophobic polyaniline; and finally dispersing the prepared super-hydrophobic polyaniline evenly in a resin matrix to prepare the polyaniline super-hydrophobic composite anticorrosive paint with an excellent anticorrosive performance.
Method of preparing terpolymer-doped polyaniline super-hydrophobic composite anticorrosive paint
The present invention discloses a method of preparing a terpolymer-doped polyaniline super-hydrophobic composite anticorrosive paint. The method includes: firstly by adopting solution polymerization, stirring a hydrophilic vinyl monomer, a fluorine-containing acrylate monomer and an oil-soluble initiator in a solvent evenly and carrying out a reaction for a period of time, then adding a functional acrylic monomer or long-chain acrylate monomer as a third monomer for further reaction for a period of time to obtain a fluorine-containing terpolymer surfactant; then mixing the fluorine-containing terpolymer surfactant with an aniline monomer and an oxidant evenly, and carrying out a reaction for a period of time to obtain super-hydrophobic polyaniline; and finally dispersing the prepared super-hydrophobic polyaniline evenly in a resin matrix to prepare the polyaniline super-hydrophobic composite anticorrosive paint with an excellent anticorrosive performance.
Resin, resist composition and method for producing resist pattern
Disclosed is a resin including a structural unit represented by formula (I) and a structural unit represented by formula (a2-A), and a resist composition: ##STR00001## wherein R.sup.1 represents a hydrogen atom or a methyl group; L.sup.1 and L.sup.2 each represent —O— or —S—; s1 represents an integer of 1 to 3; s2 represents an integer of 0 to 3; R.sup.a50 represents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; R.sup.a51 represents a halogen atom, a hydroxy group, an alkyl group, an alkoxy group, an alkylcarbonyl group or the like; A.sup.a50 represents a single bond or *—X.sup.a51-(A.sup.a52-X.sup.a52).sub.nb—; A.sup.a52 represents an alkanediyl group; X.sup.a51 and X.sup.a52 each represent —O—, —CO—O— or —O—CO—; nb represents 0 or 1; and mb represents an integer of 0 to 4.
Resin, resist composition and method for producing resist pattern
Disclosed is a resin including a structural unit represented by formula (I) and a structural unit represented by formula (a2-A), and a resist composition: ##STR00001## wherein R.sup.1 represents a hydrogen atom or a methyl group; L.sup.1 and L.sup.2 each represent —O— or —S—; s1 represents an integer of 1 to 3; s2 represents an integer of 0 to 3; R.sup.a50 represents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; R.sup.a51 represents a halogen atom, a hydroxy group, an alkyl group, an alkoxy group, an alkylcarbonyl group or the like; A.sup.a50 represents a single bond or *—X.sup.a51-(A.sup.a52-X.sup.a52).sub.nb—; A.sup.a52 represents an alkanediyl group; X.sup.a51 and X.sup.a52 each represent —O—, —CO—O— or —O—CO—; nb represents 0 or 1; and mb represents an integer of 0 to 4.
Low dielectric optically clear adhesives for flexible electronic display
The present invention is an assembly layer for a flexible device. The assembly layer is derived from precursors that include about 0 to about 50 wt % C.sub.1-C.sub.9 alkyl(meth)acrylate, about 40 to about 99 wt % C.sub.10-C.sub.24 (meth)acrylate, about 0 to about 30 wt % hydroxyl(meth)acrylate, about 0 to about 10 wt % of a non-hydroxy functional polar monomer, and about 0 to about 5 wt % crosslinker.