A device (10) for pasteurizing and/or sterilizing particulate material. The device (10) includes: an outer housing (40); a material inlet (43); a material outlet (44); a material guide channel (41) for guiding the material through the device (10) to the material outlet (44); at least one electron source (20) for generating an electron beam; and a treatment zone (19), located in the material guide channel (41), for pasteurizing and/or sterilizing while the material is free falling. The device (10) has at least one inner shielding section (51, 52) disposed within the outer housing (40) and enclosing the material guide channel (41) for shielding off radiation produced during treatment. A method for pasteurizing and/or sterilizing particulate material using such a device (10) is also disclosed which includes: a) generating an electron beam, and b) pasteurizing and/or sterilizing the material, while the material is free falling in the treatment zone (19).

A device (10) for pasteurizing and/or sterilizing particulate material. The device (10) includes: an outer housing (40); a material inlet (43); a material outlet (44); a material guide channel (41) for guiding the material through the device (10) to the material outlet (44); at least one electron source (20) for generating an electron beam; and a treatment zone (19), located in the material guide channel (41), for pasteurizing and/or sterilizing while the material is free falling. The device (10) has at least one inner shielding section (51, 52) disposed within the outer housing (40) and enclosing the material guide channel (41) for shielding off radiation produced during treatment. A method for pasteurizing and/or sterilizing particulate material using such a device (10) is also disclosed which includes: a) generating an electron beam, and b) pasteurizing and/or sterilizing the material, while the material is free falling in the treatment zone (19).

A method for pasteurizing/sanitizing/sterilizing a food product to reduce the microbial load thereof, including the steps of: (1) providing a food product, wherein the food product comprises a plant seed and/or an aqueous plant seed medium; (2) optionally fermenting the food product; (3) controllably exposing the food product to ultra-high-temperature processing for a period of time; and (4) at least one of pasteurizing, sanitizing, and sterilizing the food product without materially altering the flavor profile and/or the nutritional profile of the food product.

A method for pasteurizing/sanitizing/sterilizing a food product to reduce the microbial load thereof, including the steps of: (1) providing a food product, wherein the food product comprises a plant seed and/or an aqueous plant seed medium; (2) optionally fermenting the food product; (3) controllably exposing the food product to ultra-high-temperature processing for a period of time; and (4) at least one of pasteurizing, sanitizing, and sterilizing the food product without materially altering the flavor profile and/or the nutritional profile of the food product.

Methods for pasteurizing and/or sterilizing particulate goods (1), containing the following steps: a) producing an electron beam (5), b) pasteurizing and/or sterilizing the goods (1) by the electron beam (5) in a treatment zone (3), wherein the electrons of the electron beam (5) have an energy that lies in the range of 80 keV to 300 keV, preferably from 140 keV to 280 keV, more preferably from 180 keV to 260 keV, the goods (1) being exposed to the electron beam (5) for a treatment time which lies in the range from 5 ms to 25 ms, and the electron beam (5) has a mean electron current density in the treatment zone (3) which lies in the range of 10.sup.15 s.sup.1.Math.cm.sup.2 to 2.77.Math.10.sup.15 s.sup.1.Math.cm.sup.2.

Methods for pasteurizing and/or sterilizing particulate goods (1), containing the following steps: a) producing an electron beam (5), b) pasteurizing and/or sterilizing the goods (1) by the electron beam (5) in a treatment zone (3), wherein the electrons of the electron beam (5) have an energy that lies in the range of 80 keV to 300 keV, preferably from 140 keV to 280 keV, more preferably from 180 keV to 260 keV, the goods (1) being exposed to the electron beam (5) for a treatment time which lies in the range from 5 ms to 25 ms, and the electron beam (5) has a mean electron current density in the treatment zone (3) which lies in the range of 10.sup.15 s.sup.1.Math.cm.sup.2 to 2.77.Math.10.sup.15 s.sup.1.Math.cm.sup.2.

Devices (10) and methods for pasteurizing and/or sterilizing particulate material. The devices contain at least one electron source (20) for generating an electron beam and a treatment zone (19) in which the material is pasteurized and/or sterilized by the electron beam. The device (10) comprises a vibration surface (11) which vibrates to convey and individualize the material. The first vibration surface (11) has a plurality of grooves (12) into which the material is conveyed and individualized. The device (10) has a material channel (21) in which the material is pasteurized and/or sterilized by the electron beam in the region of the treatment zone (19). The device (10) has at least one auxiliary channel (22) through which a fluid flows between the electron source (20) and the material channel (21) and is separated from the material channel (21). A cartridge (24) for pasteurizing and/or sterilizing particulate material is also disclosed.

Devices (10) and methods for pasteurizing and/or sterilizing particulate material. The devices contain at least one electron source (20) for generating an electron beam and a treatment zone (19) in which the material is pasteurized and/or sterilized by the electron beam. The device (10) comprises a vibration surface (11) which vibrates to convey and individualize the material. The first vibration surface (11) has a plurality of grooves (12) into which the material is conveyed and individualized. The device (10) has a material channel (21) in which the material is pasteurized and/or sterilized by the electron beam in the region of the treatment zone (19). The device (10) has at least one auxiliary channel (22) through which a fluid flows between the electron source (20) and the material channel (21) and is separated from the material channel (21). A cartridge (24) for pasteurizing and/or sterilizing particulate material is also disclosed.

The disclosure provides a method of reducing aflatoxin contamination in one or more nuts and/or reducing the amount of Aspergillus flavus and/or Aspergillus parasiticus resulting in the presence of aflatoxin contamination in one or more nuts. In an embodiment, nuts are treated with ultraviolet (UV) light, ozone, and peroxide, or combinations thereof. In an embodiment, nuts are treated with UV light and ozone. In an embodiment, nuts are treated with UV light and peroxide. In an embodiment, nuts are treated with ozone and peroxide.

The disclosure provides a method of reducing aflatoxin contamination in one or more nuts and/or reducing the amount of Aspergillus flavus and/or Aspergillus parasiticus resulting in the presence of aflatoxin contamination in one or more nuts. In an embodiment, nuts are treated with ultraviolet (UV) light, ozone, and peroxide, or combinations thereof. In an embodiment, nuts are treated with UV light and ozone. In an embodiment, nuts are treated with UV light and peroxide. In an embodiment, nuts are treated with ozone and peroxide.