C08G18/3814

POLYURETHANE MICROCELLULAR ELASTOMER, NON-PNEUMATIC TIRE AND PREPARATION PROCESS THEREOF
20220025102 · 2022-01-27 ·

The present invention relates to a polyurethane microcellular elastomer, a non-pneumatic tire and a preparation process and use thereof. The polyurethane microcellular elastomer of the present invention is obtained by reaction of a reaction system comprising components such as isocyanate, ethylene diamine-started polyoxypropylene ether tetraol, a catalyst and a foaming agent. The non-pneumatic tire of the present invention has very strong fatigue resistance and can be used for non-motor vehicles running at high speed.

ADHESIVE FOR CASTABLE URETHANES
20220025227 · 2022-01-27 ·

Provided are adhesives containing a phenoxy resin grafted with methyl methacrylate (MMA) and/or methacrylic acid (MAA), and including a uretdione or a silane. The adhesive compositions are completely or substantially absent free isocyanate. The grafted phenoxy resin forms crosslinking which allows the adhesive to chemisorb to a metal surface, diffuse and entangle in a urethane elastomer and/or provide crossbridging and/or crosslinking across an interface of the adhesive and a cast urethane. Methods of adhering a castable urethane to a substrate, using the provided adhesives, are also provided.

ADHESIVE FOR CASTABLE URETHANES
20220025227 · 2022-01-27 ·

Provided are adhesives containing a phenoxy resin grafted with methyl methacrylate (MMA) and/or methacrylic acid (MAA), and including a uretdione or a silane. The adhesive compositions are completely or substantially absent free isocyanate. The grafted phenoxy resin forms crosslinking which allows the adhesive to chemisorb to a metal surface, diffuse and entangle in a urethane elastomer and/or provide crossbridging and/or crosslinking across an interface of the adhesive and a cast urethane. Methods of adhering a castable urethane to a substrate, using the provided adhesives, are also provided.

Polyurethane polishing layer, polishing pad comprising polishing layer, method for preparing polishing layer and method for planarizing material

A polishing pad, a polyurethane polishing layer and a preparation method thereof are provided, belonging to the technical field of polishing in chemical-mechanical planarization treatment. The polyurethane polishing layer having a coefficient of thermal expansion of 100-200 ppm/° C. comprises a reaction product produced by reacting of multiple components. The multiple components include an isocyanate-terminated prepolymer, a hollow microsphere polymer and a curing agent composition. The curing agent composition includes 5-55 wt % of an aliphatic diamine composition, 0-8 wt % of a polyamine composition and 40-90 wt % of an aromatic bifunctional composition. The polyurethane polishing layer has a density of 0.6-1.1 g/cm.sup.3, a Shore hardness of 45-70D and an elongation at break of 50-450%. The polyurethane polishing layer is prepared by a simple process with low cost and energy consumption. The polyurethane polishing layer prepared by the process has a high hydrolytic stability, a uniform density and a stable removal rate.

Polyurethane polishing layer, polishing pad comprising polishing layer, method for preparing polishing layer and method for planarizing material

A polishing pad, a polyurethane polishing layer and a preparation method thereof are provided, belonging to the technical field of polishing in chemical-mechanical planarization treatment. The polyurethane polishing layer having a coefficient of thermal expansion of 100-200 ppm/° C. comprises a reaction product produced by reacting of multiple components. The multiple components include an isocyanate-terminated prepolymer, a hollow microsphere polymer and a curing agent composition. The curing agent composition includes 5-55 wt % of an aliphatic diamine composition, 0-8 wt % of a polyamine composition and 40-90 wt % of an aromatic bifunctional composition. The polyurethane polishing layer has a density of 0.6-1.1 g/cm.sup.3, a Shore hardness of 45-70D and an elongation at break of 50-450%. The polyurethane polishing layer is prepared by a simple process with low cost and energy consumption. The polyurethane polishing layer prepared by the process has a high hydrolytic stability, a uniform density and a stable removal rate.

Process for Forming a Laminate
20230142982 · 2023-05-11 ·

The present disclosure provides a process for forming a laminate. The process includes (A) uniformly applying an isocyanate component to a first substrate, the isocyanate component containing an isocyanate compound; (B) uniformly applying an isocyanate-reactive component to a second substrate, the isocyanate-reactive component containing an amine-terminated compound; (C) bringing the first substrate and the second substrate together, thereby mixing and reacting the isocyanate component and the isocyanate-reactive component to form an adhesive composition between the first substrate and the second substrate; (D) curing the adhesive composition to bond the first substrate and the second substrate; and (E) forming the laminate.

Polishing pad and method for manufacturing same

A polishing pad includes: a polishing layer having a polyurethane sheet containing substantially spherical cells, wherein E′(90%)/E′(30%) falls within a range of 0.4 to 0.7, where E′(90%) represents a storage modulus of the polyurethane sheet that has been exposed to an environment with a temperature of 23° C. and a relative humidity of 90%, as measured in a tension mode at 40° C. with an initial load of 148 g, a strain range of 0.1%, and a measurement frequency of 1.6 Hz, and E′(30%) represents a storage modulus of the polyurethane sheet that has been exposed to an environment with a temperature of 23° C. and a relative humidity of 30%, as measured in a tension mode at 40° C. with an initial load of 148 g, a strain range of 0.1%, and a measurement frequency of 1.6 Hz. Also provided is a method for manufacturing the polishing pad.

Protective material and wireless communication device
11817622 · 2023-11-14 ·

Provided is a protective material that protects a wireless communication portion for wireless communication, comprising a substrate formed of a foam synthetic resin and a coating layer of a polyurea resin covering at least a front side surface of the substrate. The wireless communication device includes a wireless communication portion for wireless communication and a protective material.

Polymer and method for producing the same, gas separation membrane, gas separation module, and gas separation apparatus using the polymer, and m-phenylenediamine compound
11806661 · 2023-11-07 · ·

Provided are a polymer having a constituent component represented by formula (I) below, a method for producing the polymer, a diamine compound suitable as a raw material for the polymer, a gas separation membrane haying a gas separation layer including the polymer, and a gas separation module and a gas separation apparatus that have the gas separation membrane. ##STR00001## In the formula (I), R.sup.A, R.sup.B, and R.sup.C represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or a halogen atom. Herein, at least one of R.sup.A, R.sup.B, or R.sup.C represents an alkyl group having 1 to 4 carbon atoms or a halogen atom. The alkyl group having 1 to 4 carbon atoms is not trifluoromethyl and ** represents linking sites.

METHODS FOR CROSS-LINKING THERMOPLASTIC POLYURETHANE COVERS FOR GOLF BALLS
20230381594 · 2023-11-30 · ·

Golf balls having covers made of thermoplastic polyurethane compositions are provided. Multi-piece golf balls can be made. The outer cover layer is formed from a composition comprising a thermoplastic polyurethane, a multi-functional hydroxyl compound, and a multi-functional compound selected from multi-functional amines and imines, and multi-functional isocyanates, and mixtures of two or more thereof. The cover composition can further include catalysts, ultraviolet (UV)-light stabilizers, and other additives.