Disclosed is a liquid composition containing a solvent selected from the group consisting of mono aliphatic alcohols having two to six carbon atoms, mono-, di-, tri- or tetraalkylene glycols having two, three or four carbon atoms in the alkylene moiety, cyclohexanol, benzyl alcohol or glycerol, whereby each OH group may be optionally, and independently, substituted by a OR group, whereby R is alkyl with 1 to 4 carbon atoms, and whereby the solvent optionally contains 0.01-10 wt-% of an inorganic or organic acid, and dissolved therein a mononuclear or dinuclear Mn(III) and/or Mn(IV) complex salt having a selected non-coordinating counter ion, having a water-solubility of at least 30 g/L at 20 C., and wherein the mononuclear or dinuclear Mn(III) and/or Mn(IV) complex comprises at least one cyclic triamine ligand

The liquid compositions and formulations comprising it are suitable for use in catalysing oxidation, for example as a component of a dishwasher bleaching composition. The invention further relates to cleaning agents comprising the liquid compositions described herein.

The present invention relates to specific acylhydrazone compounds, their use as oxidation catalysts and to a process for removing stains and soil on textiles and hard surfaces. The compounds are substituted with a specific cyclic ammonium group adjacent to the acyl group. Further aspects of the invention are compositions or formulations comprising such compounds.

The present invention provides a composition comprising the reaction product of a) itaconic anhydride; and b) an amino compound comprising at least one free amino group, wherein the amino compound is selected from hydrolysed proteins; wherein the composition comprises itaconic modified amino compound, wherein the itaconic modified amino compound is the reaction product of a) and b). In another embodiment, the amino compound is selected from the group consisting of amino acids, peptides and hydrolysed proteins. The invention further provides a home care formulation comprising the composition of the invention, a fabric conditioner or softener, a method of treating fibres and a use of the composition.

An object of the invention is to provide a method of cleaning semiconductor substrates that is excellent in abrasive particle removing performance with respect to semiconductor substrates having undergone CMP, as well as a cleaning liquid for semiconductor substrates having undergone CMP. The invention provides a method of cleaning semiconductor substrates, the method comprising a cleaning step of cleaning, by use of a cleaning liquid, a semiconductor substrate having undergone CMP using a polishing liquid containing abrasive particles. The semiconductor substrate contains metal, and the cleaning liquid has a pH of more than 7 at 25 C. The cleaning liquid comprises: a chelating agent; a specific component A; and an anticorrosive. The method satisfies Condition 1 that a product of a contact angle ratio obtained by a specific test method 1 and a specific degree of agglomeration obtained by a specific test method 2 is not more than 15.