Patent classifications
C08G18/3868
Formulations for high porosity chemical mechanical polishing pads with high hardness and CMP pads made therewith
The present invention provides CMP polishing pads or layers having a unfilled Shore D (2 second) hardness of from 57-77 or a filled Shore D (2 second) hardness of from 18-50, made from a two-component reaction mixture of (i) a liquid aromatic isocyanate component comprising one or more aromatic diisocyanates or a linear aromatic isocyanate-terminated urethane prepolymer having an unreacted isocyanate (NCO) concentration of from 18 to 47 wt. %, based on the total solids weight of the aromatic isocyanate component, and (ii) a liquid polyol component including one or more curatives selected from the group of amines defined by Formulas (I) and (II).
Three-dimensional printing
A materials kit for three-dimensional (3D) printing can include a powder bed material comprising thermoplastic polyurethane particles and a fusing agent including a radiation absorber to selectively apply to the powder bed material. The thermoplastic polyurethane particles can have an average particle size from about 20 μm to about 120 μm and a melting temperature of from about 100° C. to about 250° C., wherein the thermoplastic polyurethane particles include polyurethane polymer strands having an average of about 10 wt % to about 30 wt % hard segments based on a total weight of the thermoplastic polyurethane particles. The hard segments can include a symmetrical aliphatic diisocyanate and a symmetrical aliphatic chain extender that are polymerized into the thermoplastic polyurethane particles.
Three-dimensional printing
A materials kit for three-dimensional (3D) printing can include a powder bed material comprising thermoplastic polyurethane particles and a fusing agent including a radiation absorber to selectively apply to the powder bed material. The thermoplastic polyurethane particles can have an average particle size from about 20 μm to about 120 μm and a melting temperature of from about 100° C. to about 250° C., wherein the thermoplastic polyurethane particles include polyurethane polymer strands having an average of about 10 wt % to about 30 wt % hard segments based on a total weight of the thermoplastic polyurethane particles. The hard segments can include a symmetrical aliphatic diisocyanate and a symmetrical aliphatic chain extender that are polymerized into the thermoplastic polyurethane particles.
POLYTHIOL COMPOSITION AND OPTICAL COMPOSITION COMPRISING SAME
A polythiol composition according to exemplary embodiments includes at least two different polythiol-based compounds, wherein a peak area (%) of the polythiol compound represented by C8H18S6, which is measured through a high performance liquid chromatographic (HPLC) analysis graph obtained at a wavelength of 230 nm, ranges from 0.90% to 1.30%. By controlling the sub-polythiol compound, an optical product having excellent transmittance and optical properties can be manufactured.
Hard-phase-modified thermoplastic polyurethane
A thermoplastic polyurethane can be obtained by a process involving a reaction of a thermoplastic polyester (PE-1) with a diamine (D1), to obtain a composition (Z1) containing an amide (PA-1), and a reaction of the obtained composition (Z1) with an isocyanate composition (I1), containing at least one polyisocyanate, and a polyol composition (P1). The diamine (D1) has a molecular weight in the range from 50 g/mol to 700 g/mol. A process can produce such a thermoplastic polyurethane, and shaped articles can be made containing the thermoplastic polyurethane.
HYDROLYTICALLY STABLE SELF-HEALING ELASTOMER
The present invention provides a solution-processable self-healing hydrolytically stable elastomer, a method for the preparation thereof, and articles of manufacture comprising the elastomer. The elastomer comprises polymeric chains comprising units of formula (A1), wherein R is a polybutadiene-containing polyurethane; R.sub.1 and R.sub.1′ are independently selected from the group consisting of: —H, (C.sub.1-C.sub.20)alkyl, (C.sub.5-C.sub.14)aryl, —OR.sub.4, —(CO)R.sub.5, —O(CO)R.sub.6, —(SO)R.sub.7, CO—R.sub.8, —COOR.sub.9, —NO.sub.2, and halogen; R.sub.2, R.sub.2′, R.sub.3 and R.sub.3′ are independently selected from the group consisting of: —H, (C.sub.1-C.sub.20)alkyl, and (C.sub.5-C.sub.14)aryl; R.sub.4 to R.sub.9 are the same or different, and are independently selected from the group consisting of: —H, (C.sub.1-C.sub.20)alkyl, and (C.sub.5-C.sub.14)aryl; m is 4; wherein the elastomer is dynamically crosslinked by aromatic disulfide metathesis, and wherein the elastomer has a water contact angle of above 100 #.
##STR00001##
HYDROLYTICALLY STABLE SELF-HEALING ELASTOMER
The present invention provides a solution-processable self-healing hydrolytically stable elastomer, a method for the preparation thereof, and articles of manufacture comprising the elastomer. The elastomer comprises polymeric chains comprising units of formula (A1), wherein R is a polybutadiene-containing polyurethane; R.sub.1 and R.sub.1′ are independently selected from the group consisting of: —H, (C.sub.1-C.sub.20)alkyl, (C.sub.5-C.sub.14)aryl, —OR.sub.4, —(CO)R.sub.5, —O(CO)R.sub.6, —(SO)R.sub.7, CO—R.sub.8, —COOR.sub.9, —NO.sub.2, and halogen; R.sub.2, R.sub.2′, R.sub.3 and R.sub.3′ are independently selected from the group consisting of: —H, (C.sub.1-C.sub.20)alkyl, and (C.sub.5-C.sub.14)aryl; R.sub.4 to R.sub.9 are the same or different, and are independently selected from the group consisting of: —H, (C.sub.1-C.sub.20)alkyl, and (C.sub.5-C.sub.14)aryl; m is 4; wherein the elastomer is dynamically crosslinked by aromatic disulfide metathesis, and wherein the elastomer has a water contact angle of above 100 #.
##STR00001##
FORMULATIONS FOR HIGH POROSITY CHEMICAL MECHANICAL POLISHING PADS WITH HIGH HARDNESS AND CMP PADS MADE THEREWITH
The present invention provides CMP polishing pads or layers having a unfilled Shore D (2 second) hardness of from 57-77 or a filled Shore D (2 second) hardness of from 18-50, made from a two-component reaction mixture of (i) a liquid aromatic isocyanate component comprising one or more aromatic diisocyanates or a linear aromatic isocyanate-terminated urethane prepolymer having an unreacted isocyanate (NCO) concentration of from 18 to 47 wt. %, based on the total solids weight of the aromatic isocyanate component, and (ii) a liquid polyol component including one or more curatives selected from the group of amines defined by Formulas (I) and (II).
FORMULATIONS FOR HIGH POROSITY CHEMICAL MECHANICAL POLISHING PADS WITH HIGH HARDNESS AND CMP PADS MADE THEREWITH
The present invention provides CMP polishing pads or layers having a unfilled Shore D (2 second) hardness of from 57-77 or a filled Shore D (2 second) hardness of from 18-50, made from a two-component reaction mixture of (i) a liquid aromatic isocyanate component comprising one or more aromatic diisocyanates or a linear aromatic isocyanate-terminated urethane prepolymer having an unreacted isocyanate (NCO) concentration of from 18 to 47 wt. %, based on the total solids weight of the aromatic isocyanate component, and (ii) a liquid polyol component including one or more curatives selected from the group of amines defined by Formulas (I) and (II).
Self-restoring polyurethane-based polymer and preparation method therefor
A self-restoring polyurethane-based polymer obtained by polymerization of a composition containing an aromatic disulfide diol represented by Chemical Formula, HO—Ar.sub.1—S—S—Ar.sub.2—OH, an alicyclic polyisocyanate, and a polyol. Ar.sub.1 and Ar.sub.2 each are independently a substituted or unsubstituted C.sub.6-C.sub.30 arylene group. The composition satisfies Equation, 0.1≤M.sub.[disulfide]/M.sub.[OH]. M.sub.[disulfide] is a total mole number of the aromatic disulfide diol in the composition, and M.sub.[OH] is a total mole number of the aromatic disulfide diol and the polyol in the composition.