C08G18/8019

ISOCYANATE COMPOUNDS AND ADHESIVE COMPOSITIONS COMPRISING THE SAME
20230312806 · 2023-10-05 ·

An isocyanate compound containing a phosphate functional group obtainable or obtained by the reaction of at least one selected from the group consisting of an isocyanate monomer, an isocyanate adduct and combinations thereof, with a phosphate functional polyol is provided. Also provided are an adhesive composition comprising the isocyanate compound, cured adhesive compositions, methods of producing cured laminates, the so produced cured laminates and use of the isocyanate compound in a two-component solvent-based adhesive composition.

Formulations for high porosity chemical mechanical polishing pads with high hardness and CMP pads made therewith

The present invention provides CMP polishing pads or layers having a unfilled Shore D (2 second) hardness of from 57-77 or a filled Shore D (2 second) hardness of from 18-50, made from a two-component reaction mixture of (i) a liquid aromatic isocyanate component comprising one or more aromatic diisocyanates or a linear aromatic isocyanate-terminated urethane prepolymer having an unreacted isocyanate (NCO) concentration of from 18 to 47 wt. %, based on the total solids weight of the aromatic isocyanate component, and (ii) a liquid polyol component including one or more curatives selected from the group of amines defined by Formulas (I) and (II).

REACTION PRODUCTS CONTAINING URETHANE GROUPS AND UREA GROUPS

The present invention relates to reaction products containing urethane groups and urea groups, containing at least one species of general formula (I), to a method for producing said reaction products, to the use of said reaction products as wetting agents, dispersants, dispersion stabilizers, and/or adhesion promoters, and to compositions that contain the reaction products containing urethane groups and urea groups.

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URETHANE RESIN

There is provided a urethane resin that is excellent in adhesive strength, and maintains high adhesive strength even after exposure to high temperature and humidity. A urethane resin obtained by reacting a glycol-modified aromatic hydrocarbon-formaldehyde resin (A) modified with a glycol with a polyisocyanate (B) having two or more free isocyanate groups in a molecule.

THERMOPLASTIC POLYURETHANE FILM AND DENTAL APPLIANCES FORMED THEREFROM

A method includes reactively extruding a polymeric composition to form a film. The polymeric composition includes a polyisocyanate and at least one dimer fatty diol.

FORMULATIONS FOR CHEMICAL MECHANICAL POLISHING PADS WITH HIGH PLANARIZATION EFFICIENCY AND CMP PADS MADE THEREWITH
20220226958 · 2022-07-21 ·

CMP polishing pads or layers made from a polyurethane reaction product of a reaction mixture comprising (i) a liquid aromatic isocyanate component comprising one or more aromatic diisocyanates or a linear aromatic isocyanate-terminated urethane prepolymer, and (ii) a liquid polyol component comprising a) one or more polymeric polyols, b) from 12 to 40 wt. %, based on the total weight of the liquid polyol component, of a curative mixture of one or more small chain difunctional polyols having from 2 to 9 carbon atoms, a liquid aromatic diamine, wherein the mole ratio of liquid aromatic diamine to the total moles of small chain difunctional polyols and liquid aromatic diamine ranges from 15:85 to 40:60, wherein, the reaction mixture comprises 48 to 68 wt. % hard segment materials.

FORMULATIONS FOR HIGH POROSITY CHEMICAL MECHANICAL POLISHING PADS WITH HIGH HARDNESS AND CMP PADS MADE THEREWITH
20220226960 · 2022-07-21 ·

The present invention provides CMP polishing pads or layers having a unfilled Shore D (2 second) hardness of from 57-77 or a filled Shore D (2 second) hardness of from 18-50, made from a two-component reaction mixture of (i) a liquid aromatic isocyanate component comprising one or more aromatic diisocyanates or a linear aromatic isocyanate-terminated urethane prepolymer having an unreacted isocyanate (NCO) concentration of from 18 to 47 wt. %, based on the total solids weight of the aromatic isocyanate component, and (ii) a liquid polyol component including one or more curatives selected from the group of amines defined by Formulas (I) and (II).

PRECURSOR FORMULATIONS FOR A LINER, A ROCKET MOTOR INCLUDING THE LINER, AND RELATED METHODS
20220065197 · 2022-03-03 ·

A precursor formulation of a liner comprising a polymer and at least two curatives is disclosed. One of the at least two curatives comprises a curative formulated to preferentially react with the polymer and the other of the at least two curatives comprises a blocked curative formulated to be substantially unreactive with the polymer. A method of lining a rocket motor is also disclosed, as is a rocket motor including the liner.

PROCESS FOR PREPARING POLYISOCYANATES CONTAINING URETHANE GROUPS

The present invention relates to a process for preparing a polyisocyanate composition containing urethane groups, and to the polyisocyanate compositions containing urethane groups that are obtained or obtainable by this process.

Use of bismuth subnitrate in electro-dipping paints

Cathodically depositable electrocoat materials comprising basic bismuth nitrate, further comprising at least one binder having reactive functional groups and at least one crosslinker containing the complementary reactive functional groups which are able to enter into thermal crosslinking reactions.