Embroidery machines can produce patches without needing overlock machines. An outline definition for the outline of the patch is obtained and used to determine the exterior points of an exterior path. The interior points of an interior path that is inside the exterior path can also be determined. The exterior path and the interior path can be used to produce sewing data that includes an edge stitch pattern definition for an edge stitch pattern that includes a plurality of edge stitches that are arranged as a plurality of stitch bundles. The stitch bundles are fan shaped and extend from the exterior path to the interior path, the exterior points and the interior points indicate a plurality of needle penetrations for sewing the edge stitch pattern, and the sewing data is configured for use by an embroidery machine to sew the edge stitch pattern and thereby produce simulated overlock stitching.

A non-transitory computer-readable medium stores computer-readable instructions, when executed by a computer, causing the computer to execute a process. The process and a method of generating embroidery data each includes: obtaining a pattern to be sewn on a workpiece by a sewing machine; obtaining a size of a sewing area to be set inside an embroidery hoop attachable to the sewing machine; setting a virtual arrangement of a plurality of the sewing areas relative to the workpiece; setting a virtual arrangement of the pattern relative to the workpiece; changing a relative position of the sewing areas; and generating embroidery data including needle drop data, the needle drop data representing a plurality of coordinates of needle drop points to form a plurality of stitches for the pattern located in each of the sewing areas in the relative position changed.

A non-transitory computer-readable medium stores computer-readable instructions, when executed by a computer, causing the computer to execute a process. The process and a method of generating embroidery data each includes: obtaining a pattern to be sewn on a workpiece by a sewing machine; obtaining a size of a sewing area to be set inside an embroidery hoop attachable to the sewing machine; setting a virtual arrangement of a plurality of the sewing areas relative to the workpiece; setting a virtual arrangement of the pattern relative to the workpiece; changing a relative position of the sewing areas; and generating embroidery data including needle drop data, the needle drop data representing a plurality of coordinates of needle drop points to form a plurality of stitches for the pattern located in each of the sewing areas in the relative position changed.

A sewing machine determines a pattern from multiple patterns, as a first pattern. The sewing machine generates a projection image including a first image representing a sewing image of the first pattern in a sewing expected size thereof. The sewing machine projects the generated projection image onto a projection area. The sewing machine sews the first pattern on a workpiece in the sewing expected size based on pattern data for the first pattern.

A sewing machine determines a pattern from multiple patterns, as a first pattern. The sewing machine generates a projection image including a first image representing a sewing image of the first pattern in a sewing expected size thereof. The sewing machine projects the generated projection image onto a projection area. The sewing machine sews the first pattern on a workpiece in the sewing expected size based on pattern data for the first pattern.

A method for calibrating one or more optical sensors on a sewing machine, including collecting data of one or more features of one or more predefined regions associated with the sewing machine, processing the data through one or more neural networks, wherein the one or more neural networks detect and recognize the one or more features of the one or more predetermined regions from the data, calculating one or more accuracy indicators of the one or more features from the data as compared to one or more trained features from the one or more neural networks, comparing the value of the one or more accuracy indicators to one or more indicator thresholds and adjusting one or more parameters of one or more optical sensors based on the comparison between the one or more accuracy indicators and the one or more indicator thresholds.

A method for calibrating one or more optical sensors on a sewing machine, including collecting data of one or more features of one or more predefined regions associated with the sewing machine, processing the data through one or more neural networks, wherein the one or more neural networks detect and recognize the one or more features of the one or more predetermined regions from the data, calculating one or more accuracy indicators of the one or more features from the data as compared to one or more trained features from the one or more neural networks, comparing the value of the one or more accuracy indicators to one or more indicator thresholds and adjusting one or more parameters of one or more optical sensors based on the comparison between the one or more accuracy indicators and the one or more indicator thresholds.

A sewing machine translates a stitchwork frame with which a cloth is fastened along a direction of a plane where the cloth is fastened based on stitchwork data to form a stitchwork pattern. A presser foot located above the cloth has a height changed by an actuator like a stepping motor in accordance with the advancement of a stitchwork formation. Hence, a predetermined clearance between the cloth and the presser foot is maintained.

A sewing machine translates a stitchwork frame with which a cloth is fastened along a direction of a plane where the cloth is fastened based on stitchwork data to form a stitchwork pattern. A presser foot located above the cloth has a height changed by an actuator like a stepping motor in accordance with the advancement of a stitchwork formation. Hence, a predetermined clearance between the cloth and the presser foot is maintained.

Disclosed is a guiding apparatus for use with a machine to facilitate performing an action along a self-guided path on a substrate. The guiding apparatus may include a support member configured to be attached to at least a portion of the machine. Further, the guiding apparatus may include one or more of lighting units, optical sensors, controllers, and user interface components, mounted on the support member, configured to identify an object, obtain position of the object on a substrate and perform an action along a self-guided path in association with that object on the substrate.