A sewing machine that sews an embroidery pattern on a sewing object includes an embroidery frame horizontally moving along a direction which a frame surface extends, a needle bar supporting a needle for inserting a thread, and reciprocally moving toward an internal space of the embroidery frame, a memory unit storing image data of the embroidery frame, and embroidery data of the embroidery pattern, and a display unit displaying an image of the embroidery frame, an image of the embroidery pattern within the image of the embroidery frame, and a feature point with a positional relation between the embroidery pattern, and the embroidery frame when actually sewn in accordance with the embroidery data.

A sewing machine acquires a selected pattern that is selected from among a plurality of embroidery patterns. The sewing machine displays a pattern image representing the selected pattern. The sewing machine identifies a specified position indicated by the instruction. The sewing machine determines, when the selected pattern is acquired a plurality of times, whether one of a plurality of the pattern images is displayed at the identified specified position. When it is determined that the pattern image is displayed at the identified specified position, the sewing machine identifies the selected pattern for which the pattern image is displayed at the specified position as the editing target. When it is not determined that the pattern image is displayed at the identified specified position, the sewing machine identifies the selected pattern for which a mask region encompassing the selected pattern is set at the specified position as the editing target.

A textile production monitoring system includes an electronic device connected with a sewing machine, and with sensors connected with the knife, the pedal, the motor tach of the sewing machine, and with the needle, the sensors transmitting signals to the electronic device. A microprocessor evaluates the four signals received from the sensors in a coordinated way. A software possessing a four-signal algorithm generates information about the products, information on which operator works on which machines for how long, how much product they produce, failure status, and machine efficiency. An Rfid module is connected with the electronic device for monitoring the information and working status of the personnel working on the sewing machine. At least one barcode reader allows for entering information on which order the product sewn in the sewing machine belongs to. A wireless connection module facilitates transfer of the information from the electronic device and the microprocessor wirelessly.

A sewing machine determines a pattern from multiple patterns, as a first pattern. The sewing machine generates a projection image including a first image representing a sewing image of the first pattern in a sewing expected size thereof. The sewing machine projects the generated projection image onto a projection area. The sewing machine sews the first pattern on a workpiece in the sewing expected size based on pattern data for the first pattern.

By a program executed by a CPU, a determination is made as to whether a direction in which a next stitch is to be formed belongs to a predetermined area corresponding to a hitch stitch, and upon determination that the direction in which the next stitch is to be formed belongs to the predetermined area, detour control is performed which includes moving a holding member, holding a sewing workpiece, so as to detour an upper thread, extending downward from a sewing needle, in a direction corresponding to a perfect stitch and then further moving the holding member to a target position corresponding to the next stitch. Various conditions for the detour control are variably set via an operation panel and a program executed by the CPU. Such variable setting can be done by user's operations via the operation panel, by setting detour-controlling data, and/or the like.

A sewing machine determines a pattern from multiple patterns, as a first pattern. The sewing machine generates a projection image including a first image representing a sewing image of the first pattern in a sewing expected size thereof. The sewing machine projects the generated projection image onto a projection area. The sewing machine sews the first pattern on a workpiece in the sewing expected size based on pattern data for the first pattern.

By a program executed by a CPU, a determination is made as to whether a direction in which a next stitch is to be formed belongs to a predetermined area corresponding to a hitch stitch, and upon determination that the direction in which the next stitch is to be formed belongs to the predetermined area, detour control is performed which includes moving a holding member, holding a sewing workpiece, so as to detour an upper thread, extending downward from a sewing needle, in a direction corresponding to a perfect stitch and then further moving the holding member to a target position corresponding to the next stitch. Various conditions for the detour control are variably set via an operation panel and a program executed by the CPU. Such variable setting can be done by user's operations via the operation panel, by setting detour-controlling data, and/or the like.

The industrial sewing machine includes: a web server, based on a request from a web browser installed on an information terminal, providing the web browser with an operation screen simulating an operation panel, and receiving operation data generated by operating the operation screen; and a sewing machine control part, controlling a sewing machine operating part based on the operation data.

A sewing machine determines a pattern from multiple patterns, as a first pattern. The sewing machine generates a projection image including a first image representing a sewing image of the first pattern in a sewing expected size thereof. The sewing machine projects the generated projection image onto a projection area. The sewing machine sews the first pattern on a workpiece in the sewing expected size based on pattern data for the first pattern.