A textile material is described herein that is manufactured with antimicrobial compounds in such a manner to chemically bind or attach the compounds to the textile material, and a treated textile material is also described herein which performs as a disinfectant or sterilizer on its own. The treated textile material exhibits wash-durability and non-leaching properties. The process includes an exhaust process cycle including the steps of treating the textile material using an exhaust process, where the liquor includes one or more antimicrobial agents, and subjecting the treated textile material to a heat treatment. A device for purifying water is also described, which can operate based on gravity and without electricity.

A textile material is described herein that is manufactured with antimicrobial compounds in such a manner to chemically bind or attach the compounds to the textile material, and a treated textile material is also described herein which performs as a disinfectant or sterilizer on its own. The treated textile material exhibits wash-durability and non-leaching properties. The process includes an exhaust process cycle including the steps of treating the textile material using an exhaust process, where the liquor includes one or more antimicrobial agents, and subjecting the treated textile material to a heat treatment. A device for purifying water is also described, which can operate based on gravity and without electricity.

A coating composition for fabrics, wherein the coating composition comprises a pollen denaturing agent, an anti-microbial agent and a polymeric carrier, wherein the pollen denaturing agent is different to the anti-microbial agent.

A Schiff base compound configured to detoxify a toxic chemical agent. The toxic chemical agent includes at least one leaving group and the Schiff base compound includes an imine having at least one Lewis base and an alkyl substituent or an aryl substituent having an electron acceptor. The at least one Schiff base nitrogen is spaced way from the electron acceptor by a distance that ranges from about 200 pm to about 1000 pm.

A Schiff base compound configured to detoxify a toxic chemical agent. The toxic chemical agent includes at least one leaving group and the Schiff base compound includes an imine having at least one Lewis base and an alkyl substituent or an aryl substituent having an electron acceptor. The at least one Schiff base nitrogen is spaced way from the electron acceptor by a distance that ranges from about 200 pm to about 1000 pm.

An apparatus for processing yarns includes a first roller set for extending yarn bean; a node generator installed after the first roller set for forming node section of the yarn beam; a first cleaning chamber installed after the node generator for cleaning the yarn beams; a material chamber for adding additive to the yarn beam; a second roller set installed after the material chamber for extending the yarn beam; a first heating chamber installed after the second roller set for thermally setting additives to the yarn beam so that the additives are firmly secured to the yarn of the yarn beam; a third roller set installed after the heating chamber for controlling the heating time of the yarn beam in the first heating chamber; and a fourth roller set installed after the third roller set for winding the yarn beam to a desired shape.

A method of using select Schiff base compounds for chemical agent detoxification. The method including applying a compound to the contaminated substrate. The compound includes an imine having at least one Schiff base nitrogen and an alkyl substituent or an aryl substituent having an electron acceptor. The at least one Schiff base nitrogen is spaced away from the electron acceptor by a distance ranging from about 200 pm to about 1000 pm. The substrate and the compound are dried. The at least one Schiff base nitrogen of the compound promotes a nucleophilic attack on an electrophilic site of the toxic chemical agent.

A method of using select Schiff base compounds for chemical agent detoxification. The method including applying a compound to the contaminated substrate. The compound includes an imine having at least one Schiff base nitrogen and an alkyl substituent or an aryl substituent having an electron acceptor. The at least one Schiff base nitrogen is spaced away from the electron acceptor by a distance ranging from about 200 pm to about 1000 pm. The substrate and the compound are dried. The at least one Schiff base nitrogen of the compound promotes a nucleophilic attack on an electrophilic site of the toxic chemical agent.

Through use of this water-/oil-repellent agent including a modified heterocyclic compound having a heterocycle and a C1-40 hydrocarbon group, adequate oil-resistance can be imparted to a substrate. The heterocycle is preferably a nitrogen-containing heterocycle. The hydrocarbon group is preferably an octyl group, a decyl group, an undecyl group, a lauryl group, a tridecyl group, a myristyl group, a palmityl group, a cetyl group, an isopalmityl group, a stearyl group, or a behenyl group. The heterocycle is preferably pyrimidine, pyridazine, pyridine, diazine, triazine, oxazole, or oxadiazole.

Through use of this water-/oil-repellent agent including a modified heterocyclic compound having a heterocycle and a C1-40 hydrocarbon group, adequate oil-resistance can be imparted to a substrate. The heterocycle is preferably a nitrogen-containing heterocycle. The hydrocarbon group is preferably an octyl group, a decyl group, an undecyl group, a lauryl group, a tridecyl group, a myristyl group, a palmityl group, a cetyl group, an isopalmityl group, a stearyl group, or a behenyl group. The heterocycle is preferably pyrimidine, pyridazine, pyridine, diazine, triazine, oxazole, or oxadiazole.