The present invention relates to nanofiber nonwovens comprising a network of nanofibers, which are composed of at least one nanofiber material and which enclose pores, to methods for producing nanofiber nonwovens, to the use thereof as well as to artificial tissue comprising these nanofiber nonwovens and methods for producing these artificial tissues.

The present disclosure relates to a nonwoven polyamide structure having antimicrobial properties comprising: nonwoven polyamide fibers comprising less than 4000 ppm zinc dispersed within the nonwoven polyamide fibers; and less than 2000 ppm phosphorus. The fibers have an average fiber diameter of less than 25 microns; and the polyamide structure demonstrates a Staphylococcus aureus reduction of at least 90%, as measured by ISO 20743-13.

The present disclosure relates to a nonwoven polyamide structure having antimicrobial properties comprising: nonwoven polyamide fibers comprising less than 4000 ppm zinc dispersed within the nonwoven polyamide fibers; and less than 2000 ppm phosphorus. The fibers have an average fiber diameter of less than 25 microns; and the polyamide structure demonstrates a Staphylococcus aureus reduction of at least 90%, as measured by ISO 20743-13.

The present invention relates to a protective mask (1) comprising: a mask body (10) which is designed to be worn by a person so as to cover the mouth and the nose of said person, the mask body having a first layer comprising an electrically conductive conductor fabric (20); a current coupling structure (30) through which an electric current is supplied; and the protective mask being configured to generate a current flow through the conductor fabric by means of the electric current.

The present invention relates to a protective mask (1) comprising: a mask body (10) which is designed to be worn by a person so as to cover the mouth and the nose of said person, the mask body having a first layer comprising an electrically conductive conductor fabric (20); a current coupling structure (30) through which an electric current is supplied; and the protective mask being configured to generate a current flow through the conductor fabric by means of the electric current.

A problem to be solved by the present invention is to provide a resin composition suitable for spinning, particularly electrospinning, and in addition, to provide a heat-resistant non-woven fabric having excellent strength and a method of producing the same. A main object of the present invention is: to provide a resin composition including: (a) at least one heat-resistant resin or a precursor thereof, the heat-resistant resin being selected from the group consisting of a heat-resistant resin containing a nitrogen atom and a heat-resistant resin containing, in the main chain, a group selected from the group consisting of ether group, ketone group, sulfone group, and sulfide group; (b) a solvent; and (c) a surfactant having a fluoroalkyl group; and to form a non-woven fabric using the resin composition by an electrospinning method.

A problem to be solved by the present invention is to provide a resin composition suitable for spinning, particularly electrospinning, and in addition, to provide a heat-resistant non-woven fabric having excellent strength and a method of producing the same. A main object of the present invention is: to provide a resin composition including: (a) at least one heat-resistant resin or a precursor thereof, the heat-resistant resin being selected from the group consisting of a heat-resistant resin containing a nitrogen atom and a heat-resistant resin containing, in the main chain, a group selected from the group consisting of ether group, ketone group, sulfone group, and sulfide group; (b) a solvent; and (c) a surfactant having a fluoroalkyl group; and to form a non-woven fabric using the resin composition by an electrospinning method.

A bonded and entangled non-woven structure made of at least 50% staple fibers by weight of the bonded and entangled non-woven structure, and at least a partial bonding of the fibers of the non-woven structure. The at least partial bonding including thermally activated bonds between a first polyolefin material produced with a catalyst including at least one metallocene catalyst and having a melting point in the range 130-170 C. and a second material having a melting point which is at least 10 C. higher than the melting point of the first material, the weight of the first material in the non-woven structure being at least 3% of the weight of the nonwoven structure.

A bonded and entangled non-woven structure made of at least 50% staple fibers by weight of the bonded and entangled non-woven structure, and at least a partial bonding of the fibers of the non-woven structure. The at least partial bonding including thermally activated bonds between a first polyolefin material produced with a catalyst including at least one metallocene catalyst and having a melting point in the range 130-170 C. and a second material having a melting point which is at least 10 C. higher than the melting point of the first material, the weight of the first material in the non-woven structure being at least 3% of the weight of the nonwoven structure.

The present invention provides a laminated nonwoven fabric achieving both handling properties during manufacturing and use and adherence to a skin surface at a high level particularly when used for a face mask. The laminated nonwoven fabric includes a nonwoven fabric layer (A) and a nonwoven fabric layer (B). The nonwoven fabric layer (A) is formed from a fiber A having a single fiber diameter of 50 nm or more and 800 nm or less, and the nonwoven fabric layer (B) is formed from a fiber B having a single fiber diameter of 3 m or more and 30 m or less. The nonwoven fabric layer (B) includes 15 to 40% by mass of a fiber B1 to all of the fibers constituting the nonwoven fabric layer (B), the fiber having tensile strength of 2.0 cN/dtex or less as measured based on JIS L 1015: 2010 8.7.2. The nonwoven fabric layer (B) Includes a fiber B2 having tensile strength exceeding 2.0 cN/dtex as measured based on JIS L 1015: 2010 8.7.2. The nonwoven fabric layer (A) is disposed as an outermost layer of at least one surface.