Compositions and methods for glass composites suitable for tissue augmentation, biomedical, and cosmetic applications are provided. The glass microsphere component of the composites are biologically inert, non-reactive and act as a nearly permanent tissue filler. One embodiment provides a tissue augmentation composite containing an effective amount of solid glass microspheres, hollow glass microspheres, porous wall hollow glass microspheres, or combinations thereof with a suitable biocompatible matrix to serve as a bulking agent when injected into a patient. The compositions can be used for soft or hard tissue augmentation as well as delivery of cargos on demand.

A method of manufacturing a resorbable, macroporous bioactive glass scaffold comprising approximately 15-45% CaO, 30-70% SiO.sub.2, 0-25% Na.sub.2O, 0-17% P.sub.2O.sub.5, 0-10% MgO and 0-5% CaF.sub.2 by mass percent, produced by mixing with pore forming agents and specified heat treatments.

A method of manufacturing a resorbable, macroporous bioactive glass scaffold comprising approximately 15-45% CaO, 30-70% SiO.sub.2, 0-25% Na.sub.2O, 0-17% P.sub.2O.sub.5, 0-10% MgO and 0-5% CaF.sub.2 by mass percent, produced by mixing with pore forming agents and specified heat treatments.

The invention relates to components for fusing vertebral bodies and to methods for the production and use thereof.

The invention relates to components for fusing vertebral bodies and to methods for the production and use thereof.

Disclosed are compositions, methods and processes for fabricating and using a device or other implement including a surface or surfaces having a nanoscale or microscale layer or coating of Si—O—N—P. These coatings and/or layers may be continuous, on the surface or discontinuous (e.g., patterned, grooved), and may be provided on silica surfaces, metal (e.g., titanium), ceramic, and combination/hybrid materials. Methods of producing an implantable device, such as a load-bearing or non-load-bearing device, such as a bone or other structural implant device (load-bearing), are also presented. Craniofacial, osteogenic and disordered bone regeneration (osteoporosis) uses and applications of devices that include at least one surface that is treated to include a nanoscale or microscale layer or coating of Si—O—N—P are also provided. Methods of using the treated and/or coated devices to enhance enhanced vascularization and healing at a treated surface of a device in vivo, is also presented.

Disclosed are compositions, methods and processes for fabricating and using a device or other implement including a surface or surfaces having a nanoscale or microscale layer or coating of Si—O—N—P. These coatings and/or layers may be continuous, on the surface or discontinuous (e.g., patterned, grooved), and may be provided on silica surfaces, metal (e.g., titanium), ceramic, and combination/hybrid materials. Methods of producing an implantable device, such as a load-bearing or non-load-bearing device, such as a bone or other structural implant device (load-bearing), are also presented. Craniofacial, osteogenic and disordered bone regeneration (osteoporosis) uses and applications of devices that include at least one surface that is treated to include a nanoscale or microscale layer or coating of Si—O—N—P are also provided. Methods of using the treated and/or coated devices to enhance enhanced vascularization and healing at a treated surface of a device in vivo, is also presented.

An implant comprises a substrate and a coating on a surface of the substrate, and the coating comprises silicon nitride and has a thickness of from about 1 to about 15 micrometer. A method of providing the implant comprises coating a surface of the implant substrate with the coating comprising silicon nitride and having a thickness of from about 1 to about 15 micrometer by physical vapour deposition.

An implant comprises a substrate and a coating on a surface of the substrate, and the coating comprises silicon nitride and has a thickness of from about 1 to about 15 micrometer. A method of providing the implant comprises coating a surface of the implant substrate with the coating comprising silicon nitride and having a thickness of from about 1 to about 15 micrometer by physical vapour deposition.

In one aspect, a method includes providing support material within which the structure is fabricated, depositing, into the support material, structure material to form the fabricated structure, and removing the support material to release the fabricated structure from the support material. The provided support material is stationary at an applied stress level below a threshold stress level and flows at an applied stress level at or above the threshold stress level during fabrication of the structure. The provided support material is configured to mechanically support at least a portion of the structure and to prevent deformation of the structure during the fabrication of the structure. The deposited structure material is suspended in the support material at a location where the structure material is deposited. The structure material comprises a fluid that transitions to a solid or semi-solid state after deposition of the structure material.