Liquid ring pumps are used to pump a variety of fluid types. Corrosive fluids are easily handled by the work fluid but can cause corrosion of pumping mechanisms. The present invention provides a magnetically driven liquid ring pump with corrosion resistant pumping mechanisms which achieves a longer time between service intervals.

A pumping line arrangement includes a chamber connecting line which is fluidly connectable to a process chamber that forms part of a semiconductor fabrication tool. The pumping line arrangement also includes a valve module which is fluidly connected to the chamber connecting line. The valve module splits the chamber connecting line into respective first and second pumping lines. The first pumping line is intended to carry a first process flow and the second pumping line is intended to carry a second process flow which is incompatible with the first process flow. At least one of the first pumping line or the second pumping line includes fluidly connected therewithin a pre-abatement module that is configured to remove one or more incompatible constituents from the process flow intended to be carried by the other pumping line.

The present invention relates to a two-stage liquid ring vacuum pump in which two-stage impellers are attached to an axial end portion of a main shaft (rotating shaft) of a motor. The two-stage liquid ring vacuum pump includes a first-stage impeller (4) provided in a first-stage pump chamber (1), a second-stage impeller (5) provided in a second-stage pump chamber (2), a single rotating shaft (7) to which the first-stage impeller (4) and the second-stage impeller (5) are fixed, and an exhaust port (Pd) of the first-stage pump chamber (1) and an intake port (Ps) of the second-stage pump chamber (2) which communicate with each other. An outer diameter of the first-stage impeller (4) is larger than an outer diameter of the second-stage impeller (5).

Dry pumps are used to pump a variety of gas mixtures from the semiconductor industry. The present invention provides a liquid ring pump located between the dry pump and an abatement device to remove soluble corrosive materials prior to the exhaust gases entry to the abatement device, the work fluid exhausted from the liquid ring pump being separated from the gas prior to entry to the abatement device.

An abatement system with liquid-ring pump maintains an exhaust line at a negative pressure during operation of a vacuum pump. The vacuum pump operates to exhaust process gas and by-products from a process chamber through a foreline. The vacuum pump exhausts the process gas to the abatement system with liquid-ring pump through the exhaust line. The overall life of the vacuum pump is increased significantly because the exhaust line is maintained at a negative pressure which reduces precipitation of gases in the vacuum pump thereby reducing by-product accumulation and damage to the vacuum pump. The liquid-ring pump receives the exhaust process gas from the vacuum pump and outputs gas to a burn chamber and liquid to a recirculation tank. Liquid is recycled through the liquid-ring pump thereby reducing accumulation of precipitated gas and by-product. The overall life of the liquid-ring pump and vacuum pump are increased.

A liquid ring pump includes an external housing enclosing a volume including a lower fluid reservoir. A rotatable inner housing is within the volume of the external housing, the inner housing enclosing an inner fluid chamber. A pitot tube provides fluid communication between the lower fluid reservoir and the inner fluid chamber. The housings and pitot tube are adapted so that when the inner housing rotates, fluid flows from the lower fluid reservoir through the pitot tube into the inner fluid chamber to develop a liquid ring within the inner fluid chamber such that an inner radial wall of the liquid ring is just radially outward from a point where the pitot tube enters the inner fluid chamber.

Liquid ring systems are known for compressing gasses. However, known systems include seals on moving surfaces that require high precision manufacturing. A liquid ring rotor is provided and methods of operating the same. A liquid ring rotor for a liquid ring system is provided and comprises a shaft, and one or more fluid diverting members. The shaft includes a hollow interior portion, the hollow interior portion having a first opening and a second opening, the second opening disposed in a surface that extends along a length of the shaft and spaced apart from the first opening in the length of the shaft, wherein the shaft is configured to enable a working fluid to pass along the shaft through the hollow interior portion between the openings.

A liquid ring pump includes an external housing enclosing a volume including a lower fluid reservoir. A rotatable inner housing is within the volume of the external housing, the inner housing enclosing an inner fluid chamber. A pitot tube provides fluid communication between the lower fluid reservoir and the inner fluid chamber. The housings and pitot tube are adapted so that when the inner housing rotates, fluid flows from the lower fluid reservoir through the pitot tube into the inner fluid chamber to develop a liquid ring within the inner fluid chamber such that an inner radial wall of the liquid ring is just radially outward from a point where the pitot tube enters the inner fluid chamber.

An exhaust bearing seat, a screw compressor and an air-conditioning unit are provided. The exhaust bearing seat is provided with a discharge port, wherein an opening of the discharge port is orientated in such a way that, if the exhaust bearing seat is sheathed in a housing, gas exhausted from the discharge port has a component which rotates along an inner wall of the housing and around an axial direction of the housing. The discharge port is able to guide the gas flow to rotationally flow along the inner wall of the housing body and around the axial direction of the housing, which extends the flow path of the gas flow inside the housing, and facilitates the reduction of noise of the gas flow pulsation.

A system comprising: a liquid ring pump (10) comprising: a chamber (102); a suction inlet; an exhaust outlet; and an operating liquid inlet; a gas line (36) coupled to the liquid ring pump (10); a valve (8) disposed on the gas line (36); a first sensor (81) configured to measure a first parameter of the inlet fluid; a second sensor (82) configured to measure a second parameter of either the operating liquid, the exhaust fluid, or a fluid within the chamber; and a controller (20) configured to: determine a vapour pressure of the operating liquid using the second parameter; and control operation of the valve (8) based on the first parameter and the vapour pressure.