Patent classifications
F23J2219/20
Lithographic apparatus and method for loading a substrate
A lithographic apparatus includes a support table and a gas extraction system. The gas extraction system is configured to extract gas from a gap between a base surface of the support table and a substrate through at least one gas extraction opening when the substrate is being lowered onto the support table. The lithographic apparatus is configured such that gas is extracted from the gap at a first loading flow rate when the distance between the substrate and the support plane is greater than a threshold distance and gas is extracted from the gap at a second loading flow rate when the distance between the substrate and the support plane is less than the threshold distance, wherein the second loading flow rate is lower than the first loading flow rate.
Method for reducing nitrogen oxides in strip heat treatment furnaces
A method for treating a metal strip, where the metal strip undergoes heat treatment in a directly fired furnace and is subsequently heat-treated further in a radiant tube furnace. At least part of the exhaust gases from the radiant tubes is fed to the directly fired furnace.
INFINITELY VARIABLE INJECTOR FOR IMPROVED SNCR PERFORMANCE
A system for controlling a reagent flow to a furnace in a SCNR process includes at least one injection distribution module (IDM) for supplying water to a plurality of injection lances, metering valves for supplying a NOx reducing agent to the plurality of injection lances, wherein the reagent injection rate of each injection lance is controlled by one metering valve such that a reagent concentration in each injection lance is adjustable and variable from one another. A method for controlling a reagent flow to a furnace includes providing at least one IDM, and for each IDM, providing a plurality of injection lances in communication with the IDM, supplying water to the plurality of injection lances through the IDM and supplying a NOx reducing agent through metering valves, wherein each metering valve controls the reagent injection rate to one injection lance.
Integrated comprehensive adjustment method for pulverized coal boiler based on prevention and control of high-temperature corrosion of water wall
An integrated comprehensive adjustment method for a pulverized coal boiler based on high-temperature corrosion prevention and control of water wall is provided. The method includes: during shutdown period of the boiler, mounting reducing atmosphere sampling pipe on a water-cooled wall region; carrying out a diagnostic test on the boiler; carrying out an optimization and adjustment test of a boiler pulverizing system; carrying out a single-factor adjustment test of boiler-related parameters; determining degrees of influence of different parameters on water wall reducing atmosphere, thermal efficiency of the boiler and NO.sub.x concentration at a denitration inlet; carrying out an optimization test of ammonia spraying of a denitration system; carrying out a maximum safe denitration efficiency test; and finding a balance point among the water wall reducing atmosphere, the thermal efficiency of the boiler and the NO.sub.x concentration at the denitration inlet.
METHOD AND EQUIPMENT FOR COMBUSTION OF AMMONIA
In a method and system for the combustion of ammonia, wherein a first combustion chamber receives ammonia and hydrogen in controlled proportions, and an oxygen-containing gas such as air. Combustion of the ammonia and hydrogen produces nitrogen oxides among other combustion products. A second combustion chamber receives the nitrogen oxides along with further ammonia and hydrogen in further controlled proportions along with further oxygen-containing gas such as air. The nitrogen oxides are combusted into nitrogen and water.
Flue gas treatment system and method
The flue gas treatment system (1) comprises a reactor (2), a pre-separator (3) downstream of the reactor (2), a separator (4) such as a fabric filter downstream of the pre-separator (3), a humidifier (5) downstream of the separator (4), a supply (7) of a pure fresh reagent into the flue gas (FG) downstream of the pre-separator (3) and upstream of or at the separator (4).
Infinitely variable injector for improved SNCR performance
A system for controlling a reagent flow to a furnace in a SCNR process includes at least one injection distribution module (IDM) for supplying water to a plurality of injection lances, metering valves for supplying a NOx reducing agent to the plurality of injection lances, wherein the reagent injection rate of each injection lance is controlled by one metering valve such that a reagent concentration in each injection lance is adjustable and variable from one another. A method for controlling a reagent flow to a furnace includes providing at least one IDM, and for each IDM, providing a plurality of injection lances in communication with the IDM, supplying water to the plurality of injection lances through the IDM and supplying a NOx reducing agent through metering valves, wherein each metering valve controls the reagent injection rate to one injection lance.
SYSTEM AND METHOD FOR REDUCING LIQUID DISCHARGE FROM ONE OR MORE DEVICES
The present invention relates generally to the field of emission control equipment for boilers, heaters, kilns, or other flue gas-, or combustion gas-, generating devices (e.g., those located at power plants, processing plants, etc.) and, in particular to a new and useful method and apparatus for reducing and/or eliminating various liquid discharges from one or more emission control equipment devices (e.g., one or more wet flue gas desulfurization (WFGD) units). In another embodiment, the method and apparatus of the present invention is designed to reduce and/or eliminate the amount of liquid waste that is discharged from a WFGD unit by subjecting the WFGD liquid waste to one or more drying processes, one or more spray dryer (or spray dry) absorber processes, and/or one or more spray dryer (or spray dry) evaporation processes.
LITHOGRAPHIC APPARATUS AND METHOD FOR LOADING A SUBSTRATE
A lithographic apparatus includes a support table and a gas extraction system. The gas extraction system is configured to extract gas from a gap between a base surface of the support table and a substrate through at least one gas extraction opening when the substrate is being lowered onto the support table. The lithographic apparatus is configured such that gas is extracted from the gap at a first loading flow rate when the distance between the substrate and the support plane is greater than a threshold distance and gas is extracted from the gap at a second loading flow rate when the distance between the substrate and the support plane is less than the threshold distance, wherein the second loading flow rate is lower than the first loading flow rate.
Non-catalytic denitration device and non-catalytic denitration method
A denitration device and a denitration method in which denitration is performed efficiently and in a stable manner in a lower-reaction-temperature region without using a catalyst. The denitration device is provided with a combustion chamber, a denitration agent feed means for feeding a denitration agent into the combustion chamber, an exhaust pipe, and an OH-radical-generating substance feed means for feeding an OH radical-generating substance into the exhaust pipe. The denitration agent feed means feeds a denitration agent into the exhaust gas of the combustion chamber to perform a first denitration reaction step, and the OH-radical-generating substance feed means feeds the OH-radical-generating substance into the exhaust gas in the exhaust pipe to perform a second denitration reaction step.