The present invention relates to a flexible waterproofing/impregnation and drying de-vice and a method of drying items that have undergone a solvent-based or water-based waterproofing/impregnation process. The flexible waterproofing/impregnation and dry-ing device is configured with inlets for waterproofing/impregnation fluid for water-proofing/impregnating items and one or more heat generating units for effective drying of items, said items being for example clothes, shoes, bags, purses, blankets and garments.

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a first process treating unit configured to treat a substrate in a single-type method; a second process treating unit configured to treat a substrate in a batch-type method; and a posture changing unit provided between the first process treating unit and the second process treating unit and configured to change a posture of the substrate between a vertical posture and a horizontal posture, and wherein the substrate is loaded to and unloaded from the first process treating unit.

A method for cleaning a substrate includes the following: exposing the substrate to a cleaning agent to remove impurities on a surface of the substrate; exposing the substrate to a dewetting chemical agent in a liquid phase to remove the cleaning agent on the surface of the substrate; solidifying the dewetting chemical agent in the liquid phase remaining on the surface of the substrate to obtain the dewetting chemical agent in a solid phase; and sublimating and removing the dewetting chemical agent in the solid phase.

The present invention provides a method for treating a substrate. The method for treating a substrate comprises: treating the substrate with liquid; and drying the liquid-treated substrate, and the liquid treatment step includes: a first liquid supply step of supplying a first liquid to an upper surface of the rotating substrate; and a second liquid supply step of supplying a second liquid to an upper surface of the rotating substrate, and in the second liquid supply step, a rotation speed of the substrate is adjusted such that the second liquid supplied on the substrate flows from a central region of the substrate to an edge region of the substrate.

A substrate processing method of the invention includes: a first step of introducing a processing fluid in a gas phase into a chamber housing a substrate; a second step of changing the processing fluid in the chamber from the gas phase to a supercritical state without intervention of a liquid phase; a third step of changing the processing fluid in the chamber from the supercritical state to a liquid phase; a fourth step of changing the processing fluid in the chamber from the liquid phase to a supercritical state; and a fifth step of changing the processing fluid in the chamber from the supercritical state to a gas phase without intervention of a liquid phase and discharging the processing fluid from the chamber.

Devices and methods related to drying absorbent articles with water reactive materials are generally described.

There is described here a method of desiccation of aerobic granules.

A substrate processing apparatus includes a process chamber including a first body and a second body that are coupled to each other to form a processing space therein, a clamping member configured to clamp the first body and the second body, and an anti-friction member mounted in a groove formed in a contact region between the first body or the second body and the clamping member.

Terminally sterilized demineralized bone material (DBM) and systems and methods for protecting DBM against damage caused by terminal irradiation are described. A method includes providing the DBM, which includes at least a collagen matrix and natural, non-collagenous protein. The DBM is soaked in a mixture of glycerol and a solvent to remove and replace water in the collagen matrix of the DBM. The DBM is dried, after soaking, to form a protected DBM.

An apparatus for treating the substrate includes a process chamber having a first body and a second body which are combined with each other to have a treating space in which a substrate is treated, and a friction prevention member placed on a contact surface between the first body and the second body. The friction prevention member may have a groove formed at a surface corresponding to the contact surface. An adhesive for adhering the friction prevention member to the first body or adhering the friction prevention member to the second body may be provided in the groove. The groove may form an open-end pattern in which a first end of the open-end pattern is adjacent to a second end of the open-end pattern.