A method of providing an inerting atmosphere to the surface of molten aluminum in a vortex charge well of a reverberatory melting furnace is provided. The purpose is to improve aluminum recovery (reduce aluminum oxidation melt loss) by displacing the ambient atmosphere above the molten vortex with an inert gas. The method includes introducing a flow of an inerting gas into an inerting region immediately above the surface of the vortex charge well. The inerting gas may be selected from the group consisting of nitrogen, argon, or a mixture thereof. The inerting gas may be introduced into the charge inlet chute, through a diffuser, or a ring manifold. The vortex charge well may include a lid.

A method of providing an inerting atmosphere to the surface of molten aluminum in a vortex charge well of a reverberatory melting furnace is provided. The purpose is to improve aluminum recovery (reduce aluminum oxidation melt loss) by displacing the ambient atmosphere above the molten vortex with an inert gas. The method includes introducing a flow of an inerting gas into an inerting region immediately above the surface of the vortex charge well. The inerting gas may be selected from the group consisting of nitrogen, argon, or a mixture thereof. The inerting gas may be introduced into the charge inlet chute, through a diffuser, or a ring manifold. The vortex charge well may include a lid.

Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber body having a passage, through which substrates are transferred, in one side thereof, the chamber body having opened upper and lower portions, an inner reaction tube disposed above the chamber body to provide a process space in which a process with respect to the substrates is performed, the inner reaction tube having an opened lower portion, a substrate holder disposed in the opened lower portion of the chamber to move between a stacking position at which the substrates transferred through the passage are vertically stacked and a process position at which the substrate holder ascends toward the process space to perform the process with respect to the stacked substrates, a blocking plate connected to a lower portion of the substrate holder to ascend or descend together with the substrate holder, the blocking plate closing the opened lower portion of the inner reaction tube at the process position, a connection cylinder vertically disposed on a lower portion of the blocking plate to ascend or descend together with the blocking plate, and a blocking member connected between the opened lower portion of the chamber body and the connection cylinder to isolate the opened lower portion of the chamber body from the outside.

Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber body having a passage, through which substrates are transferred, in one side thereof, the chamber body having opened upper and lower portions, an inner reaction tube disposed above the chamber body to provide a process space in which a process with respect to the substrates is performed, the inner reaction tube having an opened lower portion, a substrate holder disposed in the opened lower portion of the chamber to move between a stacking position at which the substrates transferred through the passage are vertically stacked and a process position at which the substrate holder ascends toward the process space to perform the process with respect to the stacked substrates, a blocking plate connected to a lower portion of the substrate holder to ascend or descend together with the substrate holder, the blocking plate closing the opened lower portion of the inner reaction tube at the process position, a connection cylinder vertically disposed on a lower portion of the blocking plate to ascend or descend together with the blocking plate, and a blocking member connected between the opened lower portion of the chamber body and the connection cylinder to isolate the opened lower portion of the chamber body from the outside.

Disclosed is a heat treatment apparatus for performing a heat treatment on a coating film formed on a substrate. The apparatus includes a placing unit provided within a processing container, and configured to place the substrate thereon; a heating unit configured to heat the substrate placed on the placing unit; a gas supply port provided along a circumferential direction outside the substrate on the placing unit in a plan view, and configured to supply gas into the processing container; an outer circumferential exhaust port provided along the circumferential direction outside the substrate on the placing unit in a plan view, and configured to exhaust an inside of the processing container; and a central exhaust port provided above a central portion of the substrate on the placing unit, and configured to exhaust the inside of the processing container.

Disclosed is a heat treatment apparatus for performing a heat treatment on a coating film formed on a substrate. The apparatus includes a placing unit provided within a processing container, and configured to place the substrate thereon; a heating unit configured to heat the substrate placed on the placing unit; a gas supply port provided along a circumferential direction outside the substrate on the placing unit in a plan view, and configured to supply gas into the processing container; an outer circumferential exhaust port provided along the circumferential direction outside the substrate on the placing unit in a plan view, and configured to exhaust an inside of the processing container; and a central exhaust port provided above a central portion of the substrate on the placing unit, and configured to exhaust the inside of the processing container.

A method of operating a smelt cyclone, wherein the supply of feed material and/or the supply of oxygen containing gas through an array of tuyeres into the smelt cyclone is controlled in order to control accretions of metalliferous feed material at the inside of the smelt cyclone.

A method of operating a smelt cyclone, wherein the supply of feed material and/or the supply of oxygen containing gas through an array of tuyeres into the smelt cyclone is controlled in order to control accretions of metalliferous feed material at the inside of the smelt cyclone.

A method and device for depleting copper smelting slag. The method comprises mixing copper smelting molten slag (1) with a reductant (2) and an inert gas (3) under pressure, and then depleting same. The device for depletion comprises a furnace body (4), which furnace body (4) is provided with a feed opening (413) and a slag discharge port (416), and gas nozzles (411) disposed on the side wall of the furnace body.

A method and device for depleting copper smelting slag. The method comprises mixing copper smelting molten slag (1) with a reductant (2) and an inert gas (3) under pressure, and then depleting same. The device for depletion comprises a furnace body (4), which furnace body (4) is provided with a feed opening (413) and a slag discharge port (416), and gas nozzles (411) disposed on the side wall of the furnace body.