A multi-chamber heat treatment device according to the present disclosure in which heating chambers are disposed with an intermediate transport chamber interposed therebetween in a top view, and a treatment object is stored in a heating chamber via the intermediate transport chamber, wherein the multi-chamber heat treatment device includes a gas cooling chamber which cools the treatment object using a cooling gas; and a cooling gas circulation device which includes an gas inlet and a gas outlet.

A multi-chamber heat treatment device according to the present disclosure in which heating chambers are disposed with an intermediate transport chamber interposed therebetween in a top view, and a treatment object is stored in a heating chamber via the intermediate transport chamber, wherein the multi-chamber heat treatment device includes a gas cooling chamber which cools the treatment object using a cooling gas; and a cooling gas circulation device which includes an gas inlet and a gas outlet.

In some examples, a multilevel retort assembly. The assembly includes a base defining a base perimeter; and a plurality of shells. Each shell has a diffuser plate support and a perimeter with a substantially similar shape as the base perimeter. The plurality of shells are stacked on each other, mechanically supported by the base, and surround an inner retort volume. The at least one shell of the plurality of shells defines a removable window. The assembly also includes a plurality of diffuser plates, each diffuser plate supported by a corresponding diffuser plate support of the plurality of diffuser plate supports.

In some examples, a multilevel retort assembly. The assembly includes a base defining a base perimeter; and a plurality of shells. Each shell has a diffuser plate support and a perimeter with a substantially similar shape as the base perimeter. The plurality of shells are stacked on each other, mechanically supported by the base, and surround an inner retort volume. The at least one shell of the plurality of shells defines a removable window. The assembly also includes a plurality of diffuser plates, each diffuser plate supported by a corresponding diffuser plate support of the plurality of diffuser plate supports.

Provided are a brazing furnace (1) and a brazing method in which brazing-joint quality can be easily stabilized in brazing with a reduced applied-amount of flux or in brazing without using flux. The brazing furnace (1) is configured to be used for brazing an object to be processed (100) composed of an aluminum material. The brazing furnace (1) includes a brazing chamber (2) equipped with heating apparatuses (21) that heat the object to be processed (100) to the brazing temperature, an inert gas supply apparatus (3) that supplies an inert gas in to the brazing chamber (2), and a dehumidifying apparatus (4) that is interposed between the inert gas supply apparatus (3) and the brazing chamber (2) and performs dehumidification of the inert gas.

A substrate heating device includes: heating modules each having a processing vessel within which a heating plate is disposed, an gas inlet port for introducing a purge gas into a processing atmosphere, and an exhaust port for exhausting the processing atmosphere; individual exhaust paths each connected to the exhaust port of the heating modules; a common exhaust path connected to downstream ends of the individual exhaust paths of the heating modules; a branch path branched from the individual exhaust paths and opened to the outside of the processing vessel; and an exhaust flow rate adjusting unit configured to adjust a flow rate ratio of an exhaust flow rate of a gas exhausted from the exhaust port into the common exhaust path and an introduction flow rate of a gas introduced from the outside of the processing vessel into the common exhaust path through the branch path.

A vertical dual-chamber annealing device is provided. The vertical dual-chamber annealing device includes an outer chamber unit, an inner chamber body, a temperature control unit, a supporting structure, and a gas-tight seal structure. The inner chamber body can be moved upward, such that the inner chamber body can be located in the outer chamber unit and supported by the supporting structure. After the supporting of the supporting structure is removed, the inner chamber body is moved downward and separated from the outer chamber unit. Therefore, an arrangement of the inner chamber body and the outer chamber unit can increase the convenience of cleaning and replacing the inner chamber body. The structure of the inner chamber body can enhance the uniformity of a reaction temperature. The gas-tight seal structure isolates an inert gas and a reactive gas, which is beneficial to the recovery and the reuse of the reactive gas.

A vertical dual-chamber annealing device is provided. The vertical dual-chamber annealing device includes an outer chamber unit, an inner chamber body, a temperature control unit, a supporting structure, and a gas-tight seal structure. The inner chamber body can be moved upward, such that the inner chamber body can be located in the outer chamber unit and supported by the supporting structure. After the supporting of the supporting structure is removed, the inner chamber body is moved downward and separated from the outer chamber unit. Therefore, an arrangement of the inner chamber body and the outer chamber unit can increase the convenience of cleaning and replacing the inner chamber body. The structure of the inner chamber body can enhance the uniformity of a reaction temperature. The gas-tight seal structure isolates an inert gas and a reactive gas, which is beneficial to the recovery and the reuse of the reactive gas.

The present invention relates to a device for heat treating an object, in particular a coated substrate, with an in particular gas-tightly sealable housing that encloses a hollow space, wherein the hollow space has a separating wall, by which the hollow space is divided into a process space for accommodating the object and an intermediate space, wherein the separating wall has one or a plurality of openings, which are implemented such that the separating wall acts as a barrier for the diffusion out of the process space into the intermediate space of a gaseous substance generated in the process space by the heat treatment of the object. The housing has at least one housing section coupled to a cooling device for its active cooling, wherein the separating wall is arranged between the object and the coolable housing section. The invention further relates to the use of a separating wall as a diffusion barrier in a device for heat treating an object as well as a corresponding method for heat treating an object.

A substrate heating device includes: heating modules each having a processing vessel within which a heating plate is disposed, an gas inlet port for introducing a purge gas into a processing atmosphere, and an exhaust port for exhausting the processing atmosphere; individual exhaust paths each connected to the exhaust port of the heating modules; a common exhaust path connected to downstream ends of the individual exhaust paths of the heating modules; a branch path branched from the individual exhaust paths and opened to the outside of the processing vessel; and an exhaust flow rate adjusting unit configured to adjust a flow rate ratio of an exhaust flow rate of a gas exhausted from the exhaust port into the common exhaust path and an introduction flow rate of a gas introduced from the outside of the processing vessel into the common exhaust path through the branch path.