Embodiments of the present invention comprise a refractory delta made from a refractory material having a cold-face side and a hot-face side. One or more electrode apertures are located in the refractory delta for receiving one or more electrodes. One or more cooling apertures extend from the cold-face side of the refractory material to adjacent the hot-face side of the refractory material. The one or more cooling apertures may further comprise a copper tube. A cooling system delivers a cooling liquid to the one or more cooling apertures, and the cooling liquid draws heat from the adjacent refractory material, including the hot-face side, and evaporates to allow replacement cooling liquid to further draw heat from the adjacent refractory material.

Embodiments of the present invention comprise a refractory delta made from a refractory material having a cold-face side and a hot-face side. One or more electrode apertures are located in the refractory delta for receiving one or more electrodes. One or more cooling apertures extend from the cold-face side of the refractory material to adjacent the hot-face side of the refractory material. The one or more cooling apertures may further comprise a copper tube. A cooling system delivers a cooling liquid to the one or more cooling apertures, and the cooling liquid draws heat from the adjacent refractory material, including the hot-face side, and evaporates to allow replacement cooling liquid to further draw heat from the adjacent refractory material.

A semiconductor high pressure annealing device is described. The semiconductor high pressure annealing device includes a chamber body, a cover, a lifting mechanism, and a floating sealing structure. Air tightness between the chamber body and the cover is achieved by the floating sealing structure. A first sealing ring and a second sealing ring of the floating sealing structure are arranged on the top and the bottom for reducing the damage to the first sealing ring and the second sealing ring when the cover moves up and down. A preload spring assembly of the floating sealing structure can provide tension to assist in improving the air tightness between the chamber body and the cover.

A semiconductor high pressure annealing device is described. The semiconductor high pressure annealing device includes a chamber body, a cover, a lifting mechanism, and a floating sealing structure. Air tightness between the chamber body and the cover is achieved by the floating sealing structure. A first sealing ring and a second sealing ring of the floating sealing structure are arranged on the top and the bottom for reducing the damage to the first sealing ring and the second sealing ring when the cover moves up and down. A preload spring assembly of the floating sealing structure can provide tension to assist in improving the air tightness between the chamber body and the cover.

An apparatus is disclosed for a split spray-cooled roof for a tilting metallurgical furnace. The split spray-cooled roof has a center, a first hollow metal roof section and a second hollow metal roof section. The first and second hollow roof sections are attached together along a prescription split line. The prescription split line having a first split line and a second split line, wherein the first split line is not aligned with the second split line and wherein the first and second split line are not aligned with the center.

In a door structure of a heat treatment furnace performing a heat treatment of a workpiece, there are provided: a first opening member and a second opening member in which workpiece passing ports where the transferred workpiece passes are formed; and a sheet shutter, the sheet shutter is provided with a winding portion and a shutter portion, the shutter portion is disposed between the first opening member and the second opening member, the shutter portion is provided with a first sheet portion which covers the workpiece passing port of the first opening member and a second sheet portion which covers the workpiece passing port of the second opening member at a time that the shutter portion is closed, and it is configured that a gas storage portion is formed between the first opening member and the second opening member at the time that the shutter portion is closed.

A duct system of an electric arc furnace includes a plurality of walls each including sinuously winding piping having an inlet and an outlet, and a portion of a first wall of the plurality of walls forming a working platform. The platform is movable between a raised position and a lowered position. In the raised position, the portion of the first wall is disposed in proximate vertical alignment with the remainder of the first wall. In the lowered position, the portion of the first wall is disposed substantially perpendicularly to the remainder of the first wall. The portion of the first wall is sized to occupy a cross-sectional area formed by the plurality of walls such that the portion of the first wall is disposed in close proximity to the other of the plurality of walls.

A furnace door sealing device for a low-pressure diffusion furnace is provided. The furnace door sealing device includes a furnace door, a fixed shaft and a fixed base which are coaxially arranged in sequence from front to back. A bearing pedestal is fixed at the center of the rear end surface of the furnace door. A centripetal knuckle bearing is arranged in the bearing pedestal. An outer ring of the centripetal knuckle bearing is fixed in the bearing pedestal. An inner ring of the centripetal knuckle bearing fixedly sleeves the front end of the fixed shaft. The rear end of the fixed shaft is fixed in the fixed base. A supporting plate is also fixed on the front end surface of the fixed base. Multiple spring adjusting assemblies are arranged on the supporting plate at an interval.

A furnace door sealing device for a low-pressure diffusion furnace is provided. The furnace door sealing device includes a furnace door, a fixed shaft and a fixed base which are coaxially arranged in sequence from front to back. A bearing pedestal is fixed at the center of the rear end surface of the furnace door. A centripetal knuckle bearing is arranged in the bearing pedestal. An outer ring of the centripetal knuckle bearing is fixed in the bearing pedestal. An inner ring of the centripetal knuckle bearing fixedly sleeves the front end of the fixed shaft. The rear end of the fixed shaft is fixed in the fixed base. A supporting plate is also fixed on the front end surface of the fixed base. Multiple spring adjusting assemblies are arranged on the supporting plate at an interval.

Disclosed herein is a roof for an electric furnace. The roof includes: a small-ceiling seating port (120) which has a small-ceiling seating surface (122) and a small-ceiling support surface (124) that extends from the small-ceiling seating surface inwards and downwards; and a large ceiling (130) which has an upper roof panel (132) that radially extends from the small-ceiling seating port at a downward inclination angle, a lower roof panel (134) disposed below the upper roof panel at a position spaced apart from the upper roof panel, and a side roof panel (136) connected to the upper roof panel and the lower roof panel. The upper roof panel is connected to the outer circumferential surface of the small-ceiling seating port, and the lower roof panel is connected to a lower end of the small-ceiling support surface so that the inclination angle of the lower roof panel can be increased.