An embodiment includes an apparatus for controlling temperature of a substrate, an apparatus for treating a substrate comprising the same, and a method of controlling the same, which may control the temperature of the substrate by each area and not increasing the volume of the apparatus. The substrate temperature control apparatus comprises: a support plate for supporting a substrate; a plurality of heating units placed in different area of the substrate and controlling a temperature of the substrate by each area; a power supply unit for providing a power to control the temperature of the substrate; a switch unit connected between the plurality of heating units and the power supply unit, and obtaining one or more of a transistor device; and a controller for controlling a power which is supplied to each heating units by controlling unit.

A control system for heat treatment of a stainless steel part in a furnace having an internal heat treatment chamber with a treatment atmosphere therein arranged in a plurality of zones, the system including at least one analysis apparatus for each one of the plurality of zones, each analysis apparatus in communication with a respective one of the zones for providing a gas to said zone, analyzing an atmosphere of said zone, and sensing a temperature of said zone for determining commencement of nitriding in the treatment atmosphere. A related furnace is also provided.

A control system for heat treatment of a stainless steel part in a furnace having an internal heat treatment chamber with a treatment atmosphere therein arranged in a plurality of zones, the system including at least one analysis apparatus for each one of the plurality of zones, each analysis apparatus in communication with a respective one of the zones for providing a gas to said zone, analyzing an atmosphere of said zone, and sensing a temperature of said zone for determining commencement of nitriding in the treatment atmosphere. A related furnace is also provided.

The present invention relates to an arrangement for treatment of articles by hot pressing and in particular by hot isostatic pressing. The pressing arrangement includes a pressure vessel and a furnace chamber adapted to hold articles, which furnace chamber is provided inside the pressure vessel. At least one guiding passage communicating with the furnace chamber forms an outer cooling loop, wherein the pressure medium in a part of the outer cooling loop is guided in proximity to pressure vessel walls and the top end closure before it re-enters into the furnace chamber. Further, a guiding channel element is located in the at least one guiding passage forming the outer cooling loop is arranged with at least one pressure medium channel for guiding the pressure medium from a central opening of the heat insulated casing radially and circumferentially towards a lateral wall of the pressure cylinder. The at least one pressure medium channel has a substantially constant cross-sectional area in a flow direction of the pressure medium.

The present invention relates to an arrangement for treatment of articles by hot pressing and in particular by hot isostatic pressing. The pressing arrangement includes a pressure vessel and a furnace chamber adapted to hold articles, which furnace chamber is provided inside the pressure vessel. At least one guiding passage communicating with the furnace chamber forms an outer cooling loop, wherein the pressure medium in a part of the outer cooling loop is guided in proximity to pressure vessel walls and the top end closure before it re-enters into the furnace chamber. Further, a guiding channel element is located in the at least one guiding passage forming the outer cooling loop is arranged with at least one pressure medium channel for guiding the pressure medium from a central opening of the heat insulated casing radially and circumferentially towards a lateral wall of the pressure cylinder. The at least one pressure medium channel has a substantially constant cross-sectional area in a flow direction of the pressure medium.

A brazing furnace (1) includes a preheating chamber (2) and a brazing chamber (3). The preheating chamber (2) includes: a vacuum pump (21) for reducing the pressure inside the preheating chamber (2) while a material to be processed (100) is housed therein; a preheating apparatus (22), which preheats the material to be processed (100) in a reduced-pressure atmosphere; and a gas introducing apparatus (23), which introduces inert gas into the preheating chamber (2) to restore the pressure inside the preheating chamber (2) after the preheating. The brazing chamber (3) includes: a gas-replacing apparatus (31), which introduces inert gas into the brazing chamber (3); and a main heating apparatus (32), which heats the material to be processed (100) to a brazing temperature while it is housed in the brazing chamber (3).

A brazing furnace (1) includes a preheating chamber (2) and a brazing chamber (3). The preheating chamber (2) includes: a vacuum pump (21) for reducing the pressure inside the preheating chamber (2) while a material to be processed (100) is housed therein; a preheating apparatus (22), which preheats the material to be processed (100) in a reduced-pressure atmosphere; and a gas introducing apparatus (23), which introduces inert gas into the preheating chamber (2) to restore the pressure inside the preheating chamber (2) after the preheating. The brazing chamber (3) includes: a gas-replacing apparatus (31), which introduces inert gas into the brazing chamber (3); and a main heating apparatus (32), which heats the material to be processed (100) to a brazing temperature while it is housed in the brazing chamber (3).

An apparatus includes a thermal chamber, a first reservoir containing a first liquid/vapor two-phase system, a second reservoir containing a second liquid/vapor two-phase system and conduits connecting the first reservoir and second reservoir to the thermal chamber. The first and second liquid/vapor two-phase systems include a liquid phase and a separate vapor phase. The apparatus also includes a conduit connecting the vapor phases of the first and second reservoirs. The apparatus can be used to thermally cycle an object placed in the thermal chamber or the vapor region of the first reservoir. The object can include one or more layers of an electrically or magnetically polarizable material.

The invention provides a shuttle kiln that can fire ceramic porous bodies containing organic binders in a shorter period of time than in conventional methods without occurring breaks due to a temperature difference between the inside and the outside. The shuttle kiln of the invention is suited for firing of ceramic porous bodies containing organic binders. It includes a gas suction path 4 that suctions in-furnace gas and discharges it via an afterburner 5 and a circulation path 7 that suctions the in-furnace gas to the furnace outside to burn organic binder gas and then returns it into the furnace.

The invention provides a shuttle kiln that can fire ceramic porous bodies containing organic binders in a shorter period of time than in conventional methods without occurring breaks due to a temperature difference between the inside and the outside. The shuttle kiln of the invention is suited for firing of ceramic porous bodies containing organic binders. It includes a gas suction path 4 that suctions in-furnace gas and discharges it via an afterburner 5 and a circulation path 7 that suctions the in-furnace gas to the furnace outside to burn organic binder gas and then returns it into the furnace.