Embodiments of the present disclosure generally relate to apparatus and methods for semiconductor processing, more particularly, to a thermal process chamber. In one or more embodiments, a process chamber comprises a first window, a second window, a substrate support disposed between the first window and the second window, and a motorized rotatable radiant spot heating source disposed over the first window and configured to provide radiant energy through the first window.

Numerous examples of a vertical kiln for manufacturing cement are disclosed. In one example, a vertical kiln comprises a housing comprising a top opening to receive unprocessed material and a bottom opening to output processed material; a combustion system to heat the unprocessed material within the housing to generate the processed material; a thermocouple located within the housing to measure temperature; and a control system to control the combustion system in response to temperature data from the thermocouple.

A cooling apparatus for a metal strip is a cooling apparatus for cooling a traveling metal strip, including a plurality of nozzles each of which is configured to spray a cooling medium to a surface of the metal strip. A ratio La/Ln of a length La of an ineffective collision region between a pair of effective collision regions adjacent in a traveling direction of the metal strip among effective collision regions of the plurality of nozzles in the traveling direction to a center-to-center distance Ln of the pair of effective collision regions in the traveling direction is at least 0.2 and at most 0.6. The effective collision regions are regions in which a collision density of a liquid on the surface of the metal strip is at least 50% of a maximum value, the liquid being contained in the cooling medium sprayed from the nozzles to the surface.

A substrate processing apparatus includes a bake chamber, a chamber door that opens and closes an opening of the bake chamber, a first support plate in the bake chamber, a first partition wall, which partitions a space provided on the first support plate into first heat treatment spaces spaced apart from each other in a first horizontal direction, and extends in a second horizontal direction and a vertical direction, first heat treatment modules arranged in the first heat treatment spaces, a first exhaust duct extending in the first horizontal direction across the first heat treatment spaces, a first sealing bracket coupled to the first exhaust duct, a first horizontal packing configured to seal a gap between the first sealing bracket and the chamber door, and a first vertical packing configured to seal a gap between the first partition wall and the chamber door.

A method of producing cement clinker and a second calcined material, wherein the cement clinker is produced in a first production line and the second calcined material is produced from a raw material in a second production line by carrying out the following procedures e) optionally drying the raw material in a dryer, g) calcining the optionally dried raw material in a rotary kiln to obtain the second calcined material, wherein the sensible heat of a hot gas in the first production line is used as a heat source in the calcining step g) for calcining the raw material, and wherein the rotary kiln exhaust gas coming from the calcining step g) is introduced into the first production line for the secondary combustion of the rotary kiln exhaust gas.