F27D21/0014

Temperature measuring instrument for high temperature and pressure furnace

Provided is a temperature measuring instrument 7 for a high temperature and pressure furnace having a structure capable of preventing relative displacement of an insulating tube 10 with respect to a pair of metal bodies 8a and 8b. A distal end engaging portion 22 is provided in an axial direction end portion of the insulating tube 10. The temperature measuring instrument 7 is additionally provided with connecting members 15 and 17 which connect distal end portions of the pair of metal bodies 8a and 8b to one another. The insulating tube 10 is locked to the connecting members 15 and 17 at the distal end engaging portion 22 in such a way as to restrict relative displacement in the circumferential direction with respect to the pair of metal bodies 8a and 8b.

Lance for use in metal production and casting installations
11739391 · 2023-08-29 · ·

The present invention concerns a lance composed of a top lance (1t) and of a sublance (2) coupled to the top lance (1t), which forms a shoulder (1s) between the top lance and the sublance. The sublance (2) of the present invention is provided with a protective device (3) comprising a coupling end (2c) opening to the cavity (2v), wherein, when at rest, the protective device (3) is in an initial configuration characterized by an outer maximum diameter (D3o) which is not more than 10% larger than the diameter (D2) of sublance (2) (D3o≤1.1 D2), when the sublance (2) is coupled to the lance the protective device (3) contacts the shoulder (1s) and is deformed into a deformed configuration, forming a surface impervious to molten metal and slag, which spans over a whole area of the shoulder (1s).

Method for calibrating short temperature measuring device using dry body temperature calibrator

A method for calibrating a short temperature measuring device using a dry body temperature calibrator; wherein a heat soaking block is placed in the furnace of the dry body temperature calibrator, and two temperature measuring holes are in the heat soaking block, the bottom of the furnace includes a temperature control element. This method includes electrically connecting the first standard temperature sensor to the temperature control element through the measuring module and the control module sequentially to form a closed-loop for temperature feedback control, accurately controlling the temperature of the temperature measuring hole, and calculating the temperature difference between the temperature sensor to be calibrated and the standard temperature sensor in the two temperature measuring holes respectively. Thus quick calculation for the actual temperature of the temperature measuring device to be calibrated and quick calibration for the accuracy of the temperature measuring device to be calibrated can be achieved.

MULTI-STATION PARALLEL SYNCHRONOUS AND ASYNCHRONOUS CONTROL METHOD AND SYSTEM FOR DETACHABLE GAS OVEN

A detachable multi-station parallel synchronous and asynchronous control system for a gas oven includes a controller, a plurality of temperature sensors, a solenoid valve, a stepper motor, and a remote control terminal. The plurality of temperature sensors are installed on a plurality of stations, respectively. The controller generates a control signal, and sends the control signal to a driver through a communication network, so that the driver generates a driving signal according to the control signal, and sends the driving signal to a multi-station coordinated control system. The multi-station coordinated control system controls the stepper motor and the solenoid valve of each station according to the drive signal. A sensor is configured to collect position information and speed information of a plurality of target motors and generate a detection signal. A method for using the detachable multi-station parallel synchronous and asynchronous control system is further provided.

TEMPERATURE CONTROLLER FOR A GAS OVEN AND THE GAS OVEN USING THE TEMPERATURE CONTROLLER

A temperature controller for a gas oven includes a control module, a temperature measurement module, a prompt module, and a gas regulating module. The control module is connected to the temperature measurement module, the prompt module, and the gas regulating module, respectively, to transmit a signal. The temperature measurement module is arranged in the oven to measure a temperature in the oven and return the temperature to the control module. The prompt module is configured to receive an excessive temperature or a normal temperature of the control module, and provide a prompt. The gas regulating module is configured to receive a temperature and a control quantity returned by the control module, and control an air intake quantity, to adjust the temperature or turn on or turn off the oven. A micro-switch is provided and an on signal and an off signal of the micro-switch are transmitted to the control module.

RTP SUBSTRATE TEMPERATURE ONE FOR ALL CONTROL ALGORITHM
20220136772 · 2022-05-05 ·

Embodiments disclosed herein include a method of processing a substrate. In an embodiment, the method comprises detecting one or more substrate parameters of a substrate in a processing chamber, and heating the substrate to a first temperature with an open loop tuning (OLT) heating process based on the one or more substrate parameters. In an embodiment, the method may further comprise placing the substrate on an edge ring, and heating the substrate to a second temperature with a low temperature closed loop controller. In an embodiment, the method further comprises heating the substrate to a third temperature with a high temperature closed loop controller.

Control system for furnace

There is provided a control system for a furnace. The control system comprises a thermal imaging camera and a control unit. The thermal imaging camera is configured to receive thermal radiation from a plurality of positions in a furnace and to generate an image which includes temperature information for the plurality of positions in the furnace. The control unit is configured to receive the image from the thermal imaging camera and to generate control signals for the furnace using the image.

APPARATUS AND PROCESS FOR PREDICTING METAL HEAT TREATMENT SYSTEM FAILURES
20230296322 · 2023-09-21 · ·

Apparatuses and processes for evaluating degradation and potential failure of components in an industrial heat treatment system include means and steps for establishing process settings for a baseline process cycle, collecting sensor data for at least one non-process control performance parameter during the baseline process cycle to establish a set of benchmark performance data, performing a calibration process cycle using the established process settings and collecting sensor data for the at least one non-process control performance parameter to establish a set of calibration performance data, and comparing the calibration performance data to the benchmark performance data.

Method for operating an annealing furnace

A method for operating an annealing furnace to anneal a metal strip provides that, initially, at least one target material property (MP.sub.Target) is specified for a point or a section of the metal strip after passing through the annealing furnace. In addition, information (E) on the metal strip is provided before or in the annealing furnace. A calculation of a target temperature distribution (T.sub.Target) and/or a target speed (V.sub.Target) of the metal strip in the annealing furnace is then carried out with the assistance of a computer-aided model as a function of the target material properties and the specified information. The target temperature distribution and/or target speed calculated in this manner is/are subsequently set in the annealing furnace in order to transfer the material property of the metal strip behind the annealing furnace to the desired target material property MP.sub.Target.

TEMPERATURE-CONTROLLABLE PROCESS CHAMBERS, ELECTRONIC DEVICE PROCESSING SYSTEMS, AND MANUFACTURING METHODS
20210358777 · 2021-11-18 ·

A process chamber includes one or more vertical walls at least partially defining a chamber portion of the process chamber, and multiple zones located about a periphery of the one or more vertical walls, wherein one or more of the multiple zones extends from a top to a bottom of the one or more vertical walls. The process chamber further includes a plurality of temperature control devices, each thermally coupled to the one or more vertical walls in one of the multiple zones, and a controller coupled to the plurality of temperature control devices and configured to set temperatures of one or more of the plurality of temperature control devices to obtain temperature uniformity within 2% across a substrate located in the chamber portion.