A system and method to generate steam from a feed water stream does so in a liquid pool zone of a vessel as the stream comes into contact with a heating medium that is less volatile than the feed water stream. To keep the pool hot, the heating medium can be recirculated through a heater of a pump-around loop or a heater can be placed in the liquid pool. As the feed water stream is vaporized or partially vaporized, any solids or unvaporized water present in the feed water stream come out of the stream and move into the heating medium. These solids and the unvaporized water may be further removed from the heating medium in the pool or in the pump-around loop. The heat exchange surface does not contact the feed water to generate steam.

A cooling tower with a hot water distribution system includes a distribution lateral disposed above a hot water basin. The distribution lateral discharges fluid into the hot water basin, which in turn, releases the fluid through a plurality of orifices. As the fluid is released, it falls on heat-exchanging fill material that assists in increasing the cooling rate of the fluid. The distribution lateral is configured structurally to discharge the fluid through a plurality of outlets at one or more angles (as compared to the horizontal) into the hot water basins. In one embodiment, the outlets are arranged into one or more rows that extend along a substantial length of the distribution lateral. Discharging the fluid in this manner enhances and promotes a more even fluid flow within the hot water basin, which results in a more even fluid flow over and onto the fill material, thereby increasing thermal efficiency.

A cooling tower with a hot water distribution system includes a distribution lateral disposed above a hot water basin. The distribution lateral discharges fluid into the hot water basin, which in turn, releases the fluid through a plurality of orifices. As the fluid is released, it falls on heat-exchanging fill material that assists in increasing the cooling rate of the fluid. The distribution lateral is configured structurally to discharge the fluid through a plurality of outlets at one or more angles (as compared to the horizontal) into the hot water basins. In one embodiment, the outlets are arranged into one or more rows that extend along a substantial length of the distribution lateral. Discharging the fluid in this manner enhances and promotes a more even fluid flow within the hot water basin, which results in a more even fluid flow over and onto the fill material, thereby increasing thermal efficiency.

Heat exchange devices (30) and methods of using same are provided. In a general embodiment, the present disclosure provides for heat exchange devices (30) that are cooling devices having a double helical coil (32) in a phase-mixing-cooling section, a helical coil (36) in a phase-separation-cooling section, and a back-pressure valve (34) intermediate the two coils (32,36). The cooling devices provide maximum extraction of the heat content from a heated food product using a direct-injected liquid cryogen, and complete separation of the gaseous cryogen phase from the cooled product, while avoiding the formation of a stable foam. Hybrid direct-indirect cooling devices are also provided, as well as methods for using same.

Heat exchange devices (30) and methods of using same are provided. In a general embodiment, the present disclosure provides for heat exchange devices (30) that are cooling devices having a double helical coil (32) in a phase-mixing-cooling section, a helical coil (36) in a phase-separation-cooling section, and a back-pressure valve (34) intermediate the two coils (32,36). The cooling devices provide maximum extraction of the heat content from a heated food product using a direct-injected liquid cryogen, and complete separation of the gaseous cryogen phase from the cooled product, while avoiding the formation of a stable foam. Hybrid direct-indirect cooling devices are also provided, as well as methods for using same.

An absorption vacuum dehumidification system includes a vacuum section, an absorber, a desorber, a photovoltaic energy supply, a heat exchanger, a condenser, and a desiccant solution. The vacuum section has a feed side and a permeate side and comprising a hydrophilic membrane that separates the feed side than the permeate side. The absorber is connected to the permeate side of the vacuum section. The desorber is connected to the absorber to form a desiccant solution cycle path between the absorber and the desorber. The photovoltaic energy supply configured to power a heat source that provides hot liquid into the desorber. The heat exchanger is connected to the desiccant solution cycle path. The condenser is connected to the desorber. The desiccant solution flows along the desiccant solution cycle path.

An absorption vacuum dehumidification system includes a vacuum section, an absorber, a desorber, a photovoltaic energy supply, a heat exchanger, a condenser, and a desiccant solution. The vacuum section has a feed side and a permeate side and comprising a hydrophilic membrane that separates the feed side than the permeate side. The absorber is connected to the permeate side of the vacuum section. The desorber is connected to the absorber to form a desiccant solution cycle path between the absorber and the desorber. The photovoltaic energy supply configured to power a heat source that provides hot liquid into the desorber. The heat exchanger is connected to the desiccant solution cycle path. The condenser is connected to the desorber. The desiccant solution flows along the desiccant solution cycle path.

In some embodiments, the present disclosure relates to a process tool that includes a lithography apparatus arranged over a wafer chuck and an immersion hood apparatus laterally around the lithography apparatus. The lithography apparatus includes a photomask arranged between a light source and a lens. The immersion hood apparatus comprises input piping, output piping, and extractor piping. The input piping is arranged on a lower surface of the immersion hood apparatus and configured to distribute a liquid between the lens and the wafer chuck. The output piping is arranged on the lower surface of the immersion hood apparatus and configured to contain the liquid arranged between the lens and the wafer chuck. The extractor piping is arranged on an outer sidewall of the immersion hood apparatus and configured to remove any liquid above the wafer chuck that is outside of the immersion hood apparatus.

In some embodiments, the present disclosure relates to a process tool that includes a lithography apparatus arranged over a wafer chuck and an immersion hood apparatus laterally around the lithography apparatus. The lithography apparatus includes a photomask arranged between a light source and a lens. The immersion hood apparatus comprises input piping, output piping, and extractor piping. The input piping is arranged on a lower surface of the immersion hood apparatus and configured to distribute a liquid between the lens and the wafer chuck. The output piping is arranged on the lower surface of the immersion hood apparatus and configured to contain the liquid arranged between the lens and the wafer chuck. The extractor piping is arranged on an outer sidewall of the immersion hood apparatus and configured to remove any liquid above the wafer chuck that is outside of the immersion hood apparatus.

In some embodiments, the present disclosure relates to a process tool that includes a lithography apparatus arranged over a wafer chuck and an immersion hood apparatus laterally around the lithography apparatus. The lithography apparatus includes a photomask arranged between a light source and a lens. The immersion hood apparatus comprises input piping, output piping, and extractor piping. The input piping is arranged on a lower surface of the immersion hood apparatus and configured to distribute a liquid between the lens and the wafer chuck. The output piping is arranged on the lower surface of the immersion hood apparatus and configured to contain the liquid arranged between the lens and the wafer chuck. The extractor piping is arranged on an outer sidewall of the immersion hood apparatus and configured to remove any liquid above the wafer chuck that is outside of the immersion hood apparatus.