A water dispersing system (WDS) that allows a selectable quantity of water to be dispersed into an environment. The WDS utilizes a fan and a water supply assembly. The fan has a frame inside of which are two rotating blades, and preferably a stand. The water supply assembly includes a reservoir, a water tube, and a water dispersing head. Water is gravity fed from the reservoir, through the water tube and out of the head. Water from the head is directed into the first fan's rotating blades. Once the water hits the blades, the water is re-directed back out through a front grill on the fan. The second fan blades project air outward. The amount of water that comes from the WDS can be selectably chosen, from a light mist to a heavier spray, and the temperature of the water can be lowered by placing ice into the reservoir with the water. An excess water basin catches any water that drips downward from the blades.

The present invention provides a weir quench, an apparatus utilizing the weir quench and processes incorporating the same. The weir quench incorporates an inlet having an inner diameter (Di) and an upper chamber having an inner diameter (Duc), wherein the inlet inner diameter (Di) is at least 90% of the upper chamber inner diameter (Duc). The apparatus constitutes a reactor having an outlet with an inner diameter fluidly coupled with the weir quench inlet, wherein the ratio of the reactor oulet inner diameter (Dr) to the weir quench inlet diameter (Di) is greater than one. The weir quench, and apparatus are advantageously utilized in processes utilizing a limiting reagent.

The present invention provides a weir quench, an apparatus utilizing the weir quench and processes incorporating the same. The weir quench incorporates an inlet having an inner diameter (Di) and an upper chamber having an inner diameter (Duc), wherein the inlet inner diameter (Di) is at least 90% of the upper chamber inner diameter (Duc). The apparatus constitutes a reactor having an outlet with an inner diameter fluidly coupled with the weir quench inlet, wherein the ratio of the reactor oulet inner diameter (Dr) to the weir quench inlet diameter (Di) is greater than one. The weir quench, and apparatus are advantageously utilized in processes utilizing a limiting reagent.

An apparatus and method for controlling fluid discharge temperature on a semiconductor manufacturing tool. In this technique, the temperature is controlled via the use of refrigerative exhaust. This embodiment includes the hardware and controls to perform and monitor the described operation.

An apparatus and method for controlling fluid discharge temperature on a semiconductor manufacturing tool. In this technique, the temperature is controlled via the use of refrigerative exhaust. This embodiment includes the hardware and controls to perform and monitor the described operation.

A double wall panel member for use in a panel wall is provided which includes a tongue-configured end and a groove-configured end. The panel member includes a first outer wall spaced laterally from a second outer wall, and the groove-configured end has a first groove wall portion extending from the first outer wall and a second groove wall portion extending from the second outer wall, where the first groove wall portion extends further outward than the second groove wall portion. When connected, the wall panel members are assembled with the groove end pointing or oriented upward (not downward) and the tongue end pointing or oriented downward (not upward).

A device for producing and treating a gas stream is provided that includes an enclosure, of which the lower part is submerged in a liquid supply open at the top and includes at least one liquid intake opening. The submerged lower part of the enclosure contains a volume of this liquid and at least one opening for discharging a gas stream, positioned above the surface of the volume of liquid contained in the enclosure. The device further provides for injecting a gas stream including at least one injection conduit and extends in the upper part inside the enclosure outside the volume of liquid. During operation of the device an incoming gas stream is introduced to create an outgoing gas stream, treated by direct contact with said volume of liquid that is discharged outside the enclosure. A facility inclusive of the device and method of operation are also provided.

A device for producing and treating a gas stream is provided that includes an enclosure, of which the lower part is submerged in a liquid supply open at the top and includes at least one liquid intake opening. The submerged lower part of the enclosure contains a volume of this liquid and at least one opening for discharging a gas stream, positioned above the surface of the volume of liquid contained in the enclosure. The device further provides for injecting a gas stream including at least one injection conduit and extends in the upper part inside the enclosure outside the volume of liquid. During operation of the device an incoming gas stream is introduced to create an outgoing gas stream, treated by direct contact with said volume of liquid that is discharged outside the enclosure. A facility inclusive of the device and method of operation are also provided.

A heat exchanger cooling system includes: a passage extending from a water tank and branching off into a first passage and a second passage at a branch portion provided in the middle of extension of the passage, the passage including a water discharge portion provided on a distal end side of the first passage so as to face a radiator; a pump configured to send water into the passage from the water tank; a first opening-closing valve provided in the first passage and configured to open and close the first passage; a second opening-closing valve provided in the second passage and configured to open and close the second passage; and a controlling portion configured to control an operation of the pump and to control opening and closing of the first opening-closing valve and the second opening-closing valve.

A device for producing and treating a gas stream is provided that includes an enclosure, of which the lower part is submerged in a liquid supply open at the top and includes at least one liquid intake opening. The submerged lower part of the enclosure contains a volume of this liquid and at least one opening for discharging a gas stream, positioned above the surface of the volume of liquid contained in the enclosure. The device further provides for injecting a gas stream including at least one injection conduit and extends in the upper part inside the enclosure outside the volume of liquid. During operation of the device an incoming gas stream is introduced to create an outgoing gas stream, treated by direct contact with said volume of liquid that is discharged outside the enclosure. A facility inclusive of the device and method of operation are also provided.