The invention is directed to a process to increase pressure and temperature of a feed gas by means of indirect heat exchange against a fluid having a higher temperature to obtain a gas high in pressure and temperature in a system. The system comprises a fluidly interconnected inlet zone, a heat exchange zone, a product gas zone and a low pressure outlet zone.

This sputtering cathode has a sputtering target having a tubular shape in which the cross-sectional shape thereof has a pair of long side sections facing each other, and an erosion surface facing inward. Using the sputtering target, while moving a body to be film-formed, which has a film formation region having a narrower width than the long side sections of the sputtering target, parallel to one end face of the sputtering target and at a constant speed in a direction perpendicular to the long side sections above a space surrounded by the sputtering target, discharge is performed such that a plasma circulating along the inner surface of the sputtering target is generated, and the inner surface of the long side sections of the sputtering target is sputtered by ions in the plasma generated by a sputtering gas to perform film formation in the film formation region of the body to be film-formed.

A uniform temperature roller system for uniform temperature exchange by supercritical fluid is revealed. The system includes a roller body, a pair of rotary shafts, a plurality of heating/cooling modules and a supercritical fluid. The roller body includes a first chamber, a second chamber and a third chamber. The second chamber is a closed space and the two rotary shafts are formed on two lateral plates of a housing of the roller body correspondingly. The heating/cooling modules are mounted in the second chamber and the supercritical fluid is filled in the second chamber for transferring temperature between the heating/cooling modules and the roller shell. Thereby the uniform temperature roller system achieves heating or cooling quickly with uniform heat exchange so as to improve quality and yield rate of the product as well as extend service life of the roller.

This sputtering cathode has a sputtering target having a tubular shape in which the cross-sectional shape thereof has a pair of long side sections facing each other, and an erosion surface facing inward. Using the sputtering target, while moving a body to be film-formed, which has a film formation region having a narrower width than the long side sections of the sputtering target, parallel to one end face of the sputtering target and at a constant speed in a direction perpendicular to the long side sections above a space surrounded by the sputtering target, discharge is performed such that a plasma circulating along the inner surface of the sputtering target is generated, and the inner surface of the long side sections of the sputtering target is sputtered by ions in the plasma generated by a sputtering gas to perform film formation in the film formation region of the body to be film-formed.

The present disclosure provides a heat treatment apparatus (100) for use in a vacuum chamber (101). The heat treatment apparatus (100) includes a transport arrangement configured to apply a tension to a flexible substrate (10) in a longitudinal direction, wherein the transport arrangement comprises a drum (110), and a heating device configured to heat the drum (110) for heating the flexible substrate (10) to a first temperature of 120 C. to 180 C.

The present disclosure provides a heat treatment apparatus (100) for use in a vacuum chamber (101). The heat treatment apparatus (100) includes a transport arrangement configured to apply a tension to a flexible substrate (10) in a longitudinal direction, wherein the transport arrangement comprises a drum (110), and a heating device configured to heat the drum (110) for heating the flexible substrate (10) to a first temperature of 120 C. to 180 C.

Some examples include a fuser assembly to operate with a roller including a fuser housing, and an array of fusers disposed in the fuser housing, each fuser including a heating element exposed along a surface of the fuser housing and adjacent to an outer surface of the roller.

Some examples include a fuser assembly to operate with a roller including a fuser housing, and an array of fusers disposed in the fuser housing, each fuser including a heating element exposed along a surface of the fuser housing and adjacent to an outer surface of the roller.

A heat transport device 1 includes a housing 2 with a hollow structure, working fluid 3 sealed in a sealed space of the housing 2, and a porous structure member 4 having a capillary structure disposed in the sealed space, and the housing 2 is configured to be rotatable around a rotation axis P by a motor as a drive source. The housing 2 includes an evaporation part S1 for vaporizing the working fluid 3 by heat from a heating element 5 and a condensation part S2 for condensing vapor to restore it to the working fluid 3, and the evaporation part S1 is provided on an outer side in the radial direction than the condensation part S2 with respect to the rotation axis P.

A heat exchanger includes a cylindrical stator and a cylindrical rotor that are spaced by a cylindrical gap. The cylindrical rotor is configured to rotate relative to the cylindrical stator about a rotation axis. A flattened tube is positioned within the cylindrical gap and is wrapped on the cylindrical stator. The flattened tube is spaced from a surface of the cylindrical rotor that faces the cylindrical gap.