F16L55/027

Flow conditioner for a valve assembly

A valve assembly including a valve body defining an inlet, an outlet, a fluid flow path, and a chamber. A control element is disposed in the chamber and in the fluid flow path, and is rotatable by a valve stem about a pivot axis between an open position and a closed position. A flow conditioner coupled to the valve body and including a first end, a second end, and a plurality of channels extending between the first end and the second end. The plurality of channels are in flow communication with the fluid flow path of the valve body when the control element is in the open position. A plurality of walls separate the plurality of channels and include a first thickness and a second thickness different than the first thickness.

Viscosity-Sensitive Throttle, and Liquid Pipe Comprising a Throttle
20230288008 · 2023-09-14 ·

A throttle for a liquid pipe has at least one liquid duct for a liquid flowing through the throttle, the liquid duct extending along the longitudinal axis of the throttle. The liquid duct has at least one duct wall having a curved shape along the longitudinal axis.

Nozzle for water choking
11746625 · 2023-09-05 · ·

A nozzle for controlling the flow of a water and/or gas component of a fluid produced from a hydrocarbon-bearing reservoir, the fluid comprising oil and water and/or gas, the nozzle comprising a fluid passage extending between an inlet and an outlet, wherein the fluid passage comprises an uneven surface for imparting turbulence to the water and/or gas component of the fluid.

Nozzle for water choking
11746625 · 2023-09-05 · ·

A nozzle for controlling the flow of a water and/or gas component of a fluid produced from a hydrocarbon-bearing reservoir, the fluid comprising oil and water and/or gas, the nozzle comprising a fluid passage extending between an inlet and an outlet, wherein the fluid passage comprises an uneven surface for imparting turbulence to the water and/or gas component of the fluid.

Laminar flow restrictor

Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. These apparatuses for controlling gas flow frequently rely on flow restrictors which can provide a known flow impedance of the process gas. In one embodiment, a flow restrictor is disclosed, the flow restrictor constructed of a plurality of layers, one or more of the layers having a flow passage therein that extends from a first aperture at a first end of the flow restrictor to a second aperture at a second end of the flow restrictor.

Multi-purpose fitting

A fitting including a main tube including a central axis, a first end and a second end; a branch tube including a central axis, a first end and a second end, wherein the branch tube extending at the first end of the branch tube from the main tube in a first direction between the first end and the second end of the main tube to the second end of the branch tube; a first sub-tube extending from the main tube between the first end and the second end of the main tube in a second direction.

Method of Manufacturing a Fluid Pressure Reduction Device
20230349488 · 2023-11-02 ·

A method of custom manufacturing a fluid pressure reduction device for use in a process control valve. The method includes creating the fluid pressure reduction device using an additive manufacturing technique, which generally includes forming a body and forming a plurality of flow paths in the body. The body has an inner wall and an outer wall spaced radially outward of the inner wall. The flow paths are formed in the body between the inner wall and the outer wall of the body. Each of the flow paths includes an inlet section formed in one of the inner and outer walls, a curved intermediate section, and an outlet section formed in the other of the inner and outer walls.

Throttling component and conditioning and flowrate measurement device

A throttling component and a conditioning and flowrate measurement device including a throttling component. The throttling component comprises a central throttling element and multiple peripheral throttling elements. The multiple peripheral throttling elements are sequentially sleeved on the exterior of the central throttling element, and are coaxial to the central throttling element; annular fluid channels are respectively formed between the central throttling element and its adjacent peripheral throttling element, and between adjacent peripheral throttling elements. A sensitive and clear differential pressure signal is generated while the throttling component stabilizes the flow, so that the accuracy and reliability of flowrate measurement can be improved.

Throttling component and conditioning and flowrate measurement device

A throttling component and a conditioning and flowrate measurement device including a throttling component. The throttling component comprises a central throttling element and multiple peripheral throttling elements. The multiple peripheral throttling elements are sequentially sleeved on the exterior of the central throttling element, and are coaxial to the central throttling element; annular fluid channels are respectively formed between the central throttling element and its adjacent peripheral throttling element, and between adjacent peripheral throttling elements. A sensitive and clear differential pressure signal is generated while the throttling component stabilizes the flow, so that the accuracy and reliability of flowrate measurement can be improved.

WATER PROCESSOR
20230383887 · 2023-11-30 ·

A water processor is provided for processing or conditioning water to be distributed downstream of the water processor. The water processor includes a housing having an inlet and an outlet opposite the inlet. The water processor includes a conditioning element disposed inside of the housing between the inlet and outlet. The conditioning element includes a plurality of plates having apertures with sharp edges to direct the flow of water and facilitate splitting of small gas bubbles into even smaller nano-bubbles. The plurality of plates include a first plate having a first configuration of apertures and a second plate having a second configuration of apertures. The first and second plates are disposed in alternating spaced arrangement along the longitudinal axis of the housing. The second configuration is different from the first configuration such that the flow path through the water processor is circuitous or substantially indirect.