A high-temperature forming device for imperfect single-crystal wafers used for a neutron monochromator includes a heating electric furnace, a temperature control system, a die system, a loading system, a vacuum protection system, and an auxiliary system. Where a furnace mouth of the heating electric furnace faces downwards, the heating electric furnace can be lifted vertically or a hearth of the heating electric furnace can be opened and closed. A vacuum protection cavity is formed by a glass cover and a blocking flange, a through hole is formed in one end of the glass cover, and the other end of the glass cover is closed. An operation opening is formed in the glass cover, the die system includes an upper die, a middle die, and a lower die, the middle die is a composite die.

A high-temperature forming device for imperfect single-crystal wafers used for a neutron monochromator includes a heating electric furnace, a temperature control system, a die system, a loading system, a vacuum protection system, and an auxiliary system. Where a furnace mouth of the heating electric furnace faces downwards, the heating electric furnace can be lifted vertically or a hearth of the heating electric furnace can be opened and closed. A vacuum protection cavity is formed by a glass cover and a blocking flange, a through hole is formed in one end of the glass cover, and the other end of the glass cover is closed. An operation opening is formed in the glass cover, the die system includes an upper die, a middle die, and a lower die, the middle die is a composite die.

The invention relates to a dental furnace, in particular a high-temperature dental furnace for oxide ceramics such as zirconium dioxide with sintering temperatures of between 1350° C. and 1650° C., having heating elements (14, 16) which are intended to give off heating energy to a firing chamber (12) in the dental furnace (10). The heating elements (14, 16) are configured as electrical resistance heating elements and supported below the firing chamber (12) each by means of at least one heating element support foot (18). The heating elements (14, 16) extend vertically to the top starting from the heating element support feet (18) and at the top, end in an arch (46), in particular in a semicircular arch or possibly in a pointed arch, without an upper lateral support, in particular not in the region of the arch (46).

The invention relates to a dental furnace, in particular a high-temperature dental furnace for oxide ceramics such as zirconium dioxide with sintering temperatures of between 1350° C. and 1650° C., having heating elements (14, 16) which are intended to give off heating energy to a firing chamber (12) in the dental furnace (10). The heating elements (14, 16) are configured as electrical resistance heating elements and supported below the firing chamber (12) each by means of at least one heating element support foot (18). The heating elements (14, 16) extend vertically to the top starting from the heating element support feet (18) and at the top, end in an arch (46), in particular in a semicircular arch or possibly in a pointed arch, without an upper lateral support, in particular not in the region of the arch (46).

A high-temperature forming device for imperfect single-crystal wafers used for a neutron monochromator includes a heating electric furnace, a temperature control system, a die system, a loading system, a vacuum protection system, and an auxiliary system. Where a furnace mouth of the heating electric furnace faces downwards, the heating electric furnace can be lifted vertically or a hearth of the heating electric furnace can be opened and closed. A vacuum protection cavity is formed by a glass cover and a blocking flange, a through hole is formed in one end of the glass cover, and the other end of the glass cover is closed. An operation opening is formed in the glass cover, the die system includes an upper die, a middle die, and a lower die, the middle die is a composite die.

A high-temperature forming device for imperfect single-crystal wafers used for a neutron monochromator includes a heating electric furnace, a temperature control system, a die system, a loading system, a vacuum protection system, and an auxiliary system. Where a furnace mouth of the heating electric furnace faces downwards, the heating electric furnace can be lifted vertically or a hearth of the heating electric furnace can be opened and closed. A vacuum protection cavity is formed by a glass cover and a blocking flange, a through hole is formed in one end of the glass cover, and the other end of the glass cover is closed. An operation opening is formed in the glass cover, the die system includes an upper die, a middle die, and a lower die, the middle die is a composite die.

A dental cooling device is provided, comprising a muffle (12) and a medium (30) as cooling source. The medium (30), in particular a liquid medium (30), is stored at least in the outer region of the muffle (12) and has an evaporation temperature higher than the room temperature. The quantity of medium (30) is calculated in advance such that the enthalpy of evaporation of the medium is substantially destroyed or consumed when cooling the muffle (12) to the evaporation temperature.

A dental cooling device is provided, comprising a muffle (12) and a medium (30) as cooling source. The medium (30), in particular a liquid medium (30), is stored at least in the outer region of the muffle (12) and has an evaporation temperature higher than the room temperature. The quantity of medium (30) is calculated in advance such that the enthalpy of evaporation of the medium is substantially destroyed or consumed when cooling the muffle (12) to the evaporation temperature.

A furnace may include a furnace muffle that can accommodate relatively larger workpieces than other furnaces. The furnace muffle may include a cover that includes one or more sets of plates. The plates may be configured to prevent sag during extended runtimes while still enabling the furnace to reach a temperature (e.g., a temperature between 1590° C. and 1650° C.) for sintering a workpiece. In some examples, the cover may include a first set of plates of a first material (e.g., a first alumina refractory material) and a second set of plates of a second material (e.g., a second alumina refractory material). The second material may have greater thermal conductivity than the first material. Accordingly, plates of the second set may be located in higher temperature zones of the furnace to enable efficient heat transfer from heater elements through the furnace muffle to a contact plate where a workpiece is heated.

A furnace may include a furnace muffle that can accommodate relatively larger workpieces than other furnaces. The furnace muffle may include a cover that includes one or more sets of plates. The plates may be configured to prevent sag during extended runtimes while still enabling the furnace to reach a temperature (e.g., a temperature between 1590° C. and 1650° C.) for sintering a workpiece. In some examples, the cover may include a first set of plates of a first material (e.g., a first alumina refractory material) and a second set of plates of a second material (e.g., a second alumina refractory material). The second material may have greater thermal conductivity than the first material. Accordingly, plates of the second set may be located in higher temperature zones of the furnace to enable efficient heat transfer from heater elements through the furnace muffle to a contact plate where a workpiece is heated.