A method for producing silicon using microwave and a microwave reduction furnace for use therewith are disclosed, with which it is possible to quickly reduce silica to quickly produce silicon. A material of a mixture of a silica powder and a graphite powder of a mixture of a silica powder, a silicon carbide powder and a graphite powder is set in a refractory chamber. Then, the material set in the chamber is irradiated with microwave. The graphite powder absorbs a microwave energy to increase the temperature, after which silica and graphite react with each other to further increase the temperature while producing silicon carbide, and the heated silica and silicon carbide react with each other. SiO produced through this reaction and silicon carbide are allowed to react with each other, thereby producing high-purity silicon.

A vacuum refining furnace, including a furnace body, a graphite heater, an electrode, and a sealed furnace housing. The furnace body includes an evaporation laminate, a graphite condensing casing, and a graphite insulating casing. The evaporation laminate includes a plurality of evaporators. The evaporation laminate is nested within the graphite insulating casing, and the graphite insulating casing includes a plurality of through holes. At least two graphite condensing casings having different diameters are provided. The graphite insulating casing is nested within the graphite condensing casing having a smallest diameter, and the graphite condensing casing having a relatively small diameter is nested within the graphite condensing casing having a relatively large diameter. All the graphite condensing casings except for the graphite condensing casing having the largest diameter include a plurality of through holes.

A vacuum refining furnace, including a furnace body, a graphite heater, an electrode, and a sealed furnace housing. The furnace body includes an evaporation laminate, a graphite condensing casing, and a graphite insulating casing. The evaporation laminate includes a plurality of evaporators. The evaporation laminate is nested within the graphite insulating casing, and the graphite insulating casing includes a plurality of through holes. At least two graphite condensing casings having different diameters are provided. The graphite insulating casing is nested within the graphite condensing casing having a smallest diameter, and the graphite condensing casing having a relatively small diameter is nested within the graphite condensing casing having a relatively large diameter. All the graphite condensing casings except for the graphite condensing casing having the largest diameter include a plurality of through holes.

In accordance with some embodiments, a method and an apparatus for baking photoresist patterns are provided. The method includes putting a wafer over a heating assembly. A photoresist pattern is formed over a top surface of the wafer. The method further includes curing the wafer from the top surface of the wafer by a curing assembly while heating the wafer from a bottom surface of the wafer by a heating assembly.

In accordance with some embodiments, a method and an apparatus for baking photoresist patterns are provided. The method includes putting a wafer over a heating assembly. A photoresist pattern is formed over a top surface of the wafer. The method further includes curing the wafer from the top surface of the wafer by a curing assembly while heating the wafer from a bottom surface of the wafer by a heating assembly.

A method for producing a stabilizing element-containing zirconia sintered body includes heating a zirconia compositional substance containing a stabilizing element from a heating start temperature to a first target temperature of 800 C. or higher and lower than 1400 C. at a heating rate of 150 C./minute or more; elevating the temperature from the first target temperature to a second target temperature of 1400 C. or higher and lower than 1580 C. at a heating rate of more than 30 C./minute and less than 200 C./minute; and retaining the second target temperature.

A method for producing a stabilizing element-containing zirconia sintered body includes heating a zirconia compositional substance containing a stabilizing element from a heating start temperature to a first target temperature of 800 C. or higher and lower than 1400 C. at a heating rate of 150 C./minute or more; elevating the temperature from the first target temperature to a second target temperature of 1400 C. or higher and lower than 1580 C. at a heating rate of more than 30 C./minute and less than 200 C./minute; and retaining the second target temperature.

An apparatus for processing a substrate includes a reaction tube, a side cover, a heater, a first gas supplier, a second gas supplier and a controller. The reaction tube is configured to receive a substrate boat in which a plurality of the substrate is received to process the substrate. The side cover is configured to receive the reaction tube. The heater lines the interior of the side cover. The first gas supplier is provided to an upper portion of the side cover to supply a cooling gas at a first supplying rate to a space between the side cover and the reaction tube. The second gas supplier is provided to a lower portion of the side cover to supply the cooling gas at a second supplying rate different from the first supplying rate to the space between the side cover and the reaction tube. The controller controls the reaction tube.

An apparatus for processing a substrate includes a reaction tube, a side cover, a heater, a first gas supplier, a second gas supplier and a controller. The reaction tube is configured to receive a substrate boat in which a plurality of the substrate is received to process the substrate. The side cover is configured to receive the reaction tube. The heater lines the interior of the side cover. The first gas supplier is provided to an upper portion of the side cover to supply a cooling gas at a first supplying rate to a space between the side cover and the reaction tube. The second gas supplier is provided to a lower portion of the side cover to supply the cooling gas at a second supplying rate different from the first supplying rate to the space between the side cover and the reaction tube. The controller controls the reaction tube.

A furnace system including an outer shell which comprises a top flange, an elongated body portion, and a bottom flange, wherein the outer shell is a pressure vessel, with no penetrations in the elongated body portion; a heater assembly which comprises (i) a single-piece annular shaped insulation layer, and (ii) a plurality of heaters embedded in the insulation layer, wherein the heater assembly is disposed within the elongated body portion of the outer shell; and an innermost layer disposed within the annular-shaped insulation layer, wherein the innermost layer is a baffle tube configured to force a natural convective flow, wherein each of the plurality of heaters is individually controllable and the plurality of heaters are configured to heat different zones within the furnace to different temperatures and/or at different rates. The system may be used to heat treat magnet materials, such as those formed of Bi-2212, therein.