The present invention generally describes apparatuses and methods used to perform an annealing process on desired regions of a substrate. In one embodiment, pulses of electromagnetic energy are delivered to a substrate using a flash lamp or laser apparatus. The pulses may be from about 1 nsec to about 10 msec long, and each pulse has less energy than that required to melt the substrate material. The interval between pulses is generally long enough to allow the energy imparted by each pulse to dissipate completely. Thus, each pulse completes a micro-anneal cycle. The pulses may be delivered to the entire substrate at once, or to portions of the substrate at a time. Further embodiments provide an apparatus for powering a radiation assembly, and apparatuses for detecting the effect of pulses on a substrate.

A furnace for removing a molybdenum-alloy refractory metal core through sublimation comprising a retort furnace having an interior; a sublimation fixture insertable within the interior of the retort furnace, the sublimation fixture configured to receive at least one turbine blade having the molybdenum-alloy refractory metal core; a flow passage thermally coupled to the retort furnace configured to heat a fluid flowing through the flow passage and deliver the fluid to the molybdenum-alloy refractory metal core causing sublimation of the molybdenum-alloy refractory metal core.

A furnace for removing a molybdenum-alloy refractory metal core through sublimation comprising a retort furnace having an interior; a sublimation fixture insertable within the interior of the retort furnace, the sublimation fixture configured to receive at least one turbine blade having the molybdenum-alloy refractory metal core; a flow passage thermally coupled to the retort furnace configured to heat a fluid flowing through the flow passage and deliver the fluid to the molybdenum-alloy refractory metal core causing sublimation of the molybdenum-alloy refractory metal core.

Embodiments of the disclosure provide a system including: an enclosure having an interior sized to enclose and the workpiece and form a vacuum and pressurized atmosphere within the interior. A plurality of thermal applicators may be in thermal communication with first and second portions of the interior. First and second thermal applicators may independently heat and cool the first and second portions of the interior. The first thermal applicator may apply a first thermal treatment to a first portion of the workpiece in the first portion of the interior. A second thermal applicator may apply a second thermal treatment to a second portion of the workpiece in the second portion of the interior independently of the first thermal treatment.

An electron beam (EB) gun assembly for an EB furnace is provided. The EB gun assembly includes an EB gun-frame assembly including a skeleton frame and at least one EB gun mounted to the skeleton frame, and the EB gun-frame assembly is configured to rigidly mount onto a first EB chamber lid and melt material in a first EB chamber and be removed and rigidly mount onto a second EB chamber lid and melt material in a second EB chamber. In some forms, the EB gun assembly includes at least one mounting frame and the at least one EB gun is mounted to the at least one mounting frame and the at least one mounting frame is mounted to the skeleton frame.

An electron beam (EB) gun assembly for an EB furnace is provided. The EB gun assembly includes an EB gun-frame assembly including a skeleton frame and at least one EB gun mounted to the skeleton frame, and the EB gun-frame assembly is configured to rigidly mount onto a first EB chamber lid and melt material in a first EB chamber and be removed and rigidly mount onto a second EB chamber lid and melt material in a second EB chamber. In some forms, the EB gun assembly includes at least one mounting frame and the at least one EB gun is mounted to the at least one mounting frame and the at least one mounting frame is mounted to the skeleton frame.

A sintering furnace may include a furnace chamber and a retort located within the furnace chamber that receives a part to be heated. The furnace may also include one or more heating elements positioned around the retort and a power controller including power modules connected in series. The power modules may be operably connected to the one or more heating elements and may provide a direct current (DC) power output. A controller may selectively control the power modules to supply power to the one or more heating elements.

A sintering furnace may include a furnace chamber and a retort located within the furnace chamber that receives a part to be heated. The furnace may also include one or more heating elements positioned around the retort and a power controller including power modules connected in series. The power modules may be operably connected to the one or more heating elements and may provide a direct current (DC) power output. A controller may selectively control the power modules to supply power to the one or more heating elements.

A device for producing purified, especially high-purity, magnesium includes a reactor for vacuum distillation that is extended along a longitudinal axis (L). The reactor defines a reactor inner chamber having a heating region for heating magnesium. A crucible forms a crucible inner chamber for receiving purified magnesium vaporized and condensed by the device. A radial projection in the heating region defines a contact surface that extends essentially transverse to the longitudinal axis (L) and forms an essentially sealed connection with an edge of the crucible adjacent to the crucible inner chamber.

The invention relates to a sintering furnace for components made of a sintered material, in particular for dental components, comprising a furnace chamber having a chamber volume (VK) and a chamber inner surface (OK), wherein a heat-up device, a receiving space having a gross volume (VB) located in the chamber volume (VK) and delimited by the heat-up device, and a useful region having a useful volume (VN) located in the gross volume (VB), are disposed in the furnace chamber. The furnace chamber has an outer wall consisting of a plurality of walls having a wall portion to be opened for introduction into the receiving space of a component to be sintered and having an object volume (VO). In the furnace chamber the heat-up device has a thermal radiator having a radiation field which radiator is disposed on at least one side of the receiving space. Said thermal radiator has a specific resistance of 0.1 mm.sup.2/m to 1,000,000 mm.sup.2/m and has a total surface, the maximum of which is three times the chamber inner surface (OK). With this sintering furnace a heat-up temperature of at least 1100 C. can be achieved within 5 minutes at a maximum power input of 1.5 kW.