Patent classifications
F27B9/40
APPARATUS AND METHOD FOR CONTROLLING A SINTERING PROCESS
An apparatus (150) for controlling a sintering process in a sintering furnace (100), includes a preheating zone (120) and a high heat zone (130), further comprising at least two measuring devices (151, 152, 153, 154), wherein the at least two measuring devices comprise at least one measuring device in the preheating zone (120) and at least one measuring device in the high heat zone (130) for analyzing a furnace atmosphere at the respective zone, and adjusting means (155, 156) for adjusting a composition of the furnace atmosphere based on measurement values acquired by the at least two measuring devices (151, 152, 153, 154) in the respective zones (110, 120, 130, 140).
KILN FIRING WITH DIFFERENTIAL TEMPERATURE GRADIENTS
A method for heating ware in a kiln. The ware space of the kiln includes a plurality of temperature control zones oriented in a first direction, and a plurality of temperature control zones oriented in a second direction. The method includes heating the ware space in a first heating stage, a second heating stage, and a third heating stage. At least one of the following conditions is satisfied: (i) in one of the heating stages, a temperature control zone oriented in the first direction has a setpoint temperature that is different from a setpoint temperature of one other temperature control zone oriented in the first direction; and (ii) in one of the heating stages, one temperature control zone oriented in the second direction has a setpoint temperature that is different from a set point temperature of one other temperature control zone oriented in the second direction, wherein the first direction is a vertical direction and the second direction is a horizontal direction.
KILN FIRING WITH DIFFERENTIAL TEMPERATURE GRADIENTS
A method for heating ware in a kiln. The ware space of the kiln includes a plurality of temperature control zones oriented in a first direction, and a plurality of temperature control zones oriented in a second direction. The method includes heating the ware space in a first heating stage, a second heating stage, and a third heating stage. At least one of the following conditions is satisfied: (i) in one of the heating stages, a temperature control zone oriented in the first direction has a setpoint temperature that is different from a setpoint temperature of one other temperature control zone oriented in the first direction; and (ii) in one of the heating stages, one temperature control zone oriented in the second direction has a setpoint temperature that is different from a set point temperature of one other temperature control zone oriented in the second direction, wherein the first direction is a vertical direction and the second direction is a horizontal direction.
OVEN WITH IMPROVED DRAG
The present invention relates to an oven comprising: a first chamber and a second chambers, which are separated by separation means conveyor means for guiding products from the inlet through these chambers to the outlet, temperature control means for controlling the temperature and/or humidity in each chamber individually using a fluid, respectively, and a passage in the separation means through which the conveyor means are directed from the first chamber to the second chamber.
OVEN WITH IMPROVED DRAG
The present invention relates to an oven comprising: a first chamber and a second chambers, which are separated by separation means conveyor means for guiding products from the inlet through these chambers to the outlet, temperature control means for controlling the temperature and/or humidity in each chamber individually using a fluid, respectively, and a passage in the separation means through which the conveyor means are directed from the first chamber to the second chamber.
PROCESSING APPARATUS AND PROCESSING METHOD
In a processing apparatus, a processing furnace includes a supply port configured to receive a processing target and a discharge port configured to discharge a residue. A temperature control region controls a temperature of an intermediate part between the supply port and the discharge port. A screw rotates to be able to convey the processing target supplied from the supply port toward the discharge port. A first decomposition region includes a first recovery port configured to recover a first fluid obtained by decomposing the processing target in a predetermined region in the intermediate part from the processing furnace. A second decomposition region includes a second recovery port configured to recover, from the processing furnace, a second fluid obtained by decomposing the processing target on the downstream side of the first decomposition region.
PROCESSING APPARATUS AND PROCESSING METHOD
In a processing apparatus, a processing furnace includes a supply port configured to receive a processing target and a discharge port configured to discharge a residue. A temperature control region controls a temperature of an intermediate part between the supply port and the discharge port. A screw rotates to be able to convey the processing target supplied from the supply port toward the discharge port. A first decomposition region includes a first recovery port configured to recover a first fluid obtained by decomposing the processing target in a predetermined region in the intermediate part from the processing furnace. A second decomposition region includes a second recovery port configured to recover, from the processing furnace, a second fluid obtained by decomposing the processing target on the downstream side of the first decomposition region.
MONITORING A FLAME TREATMENT DEVICE
The present invention relates very generally to the monitoring of a flame treatment device and in particular to a substrate treatment system having a flame treatment device and first and second substrate monitoring units.
MONITORING A FLAME TREATMENT DEVICE
The present invention relates very generally to the monitoring of a flame treatment device and in particular to a substrate treatment system having a flame treatment device and first and second substrate monitoring units.
Operation support apparatus and operation support method for heat-treatment furnace, and a heat-treatment facility and operation method therefor
An operation support apparatus for a heat-treatment furnace for heat-treating a metal plate continuously includes a required time calculation unit configured to calculate, based on a current furnace temperature which is a current temperature of the heat-treatment furnace, a current line speed which is a current conveyance speed of the metal plate, and a target line speed which is a conveyance speed of the metal plate to be changed from the current line speed, an estimated required time until a temperature of the heat-treatment furnace reaches, from the current furnace temperature, a target furnace temperature which is a temperature of the heat-treatment furnace corresponding to the target line speed, and a first output unit configured to output the estimated required time calculated by the required time calculation unit.