Patent classifications
F27B17/0083
AUTOCLAVE
The invention relates to an industrial autoclave used for curing rubber. The autoclave includes a hollow outer body for receiving a product. It also includes a pair of oil-based heat exchangers which are disposed in passageways defined by a pair of ducts. The heat exchangers are connected in parallel to one another in fluid flow communication to a supply of heated oil. Each heat exchanger includes a plurality of serially interconnected, parallel finned radiators which allow passage of the oil therethrough facilitating heat transfer to air passing over the radiators. A fan ensures air circulation. This autoclave is a non-pressurized system with very little wear properties, no risk of fire, no need for a condensate tank and no water treatment is required. In addition, a considerable saving in terms of power consumption is made when compared to electrical autoclaves.
Systems and method for the production of submicron sized particles
In a system and method for producing submicron sized particles from a substance, the system may comprise a constant current power supply, a furnace for vaporizing the substance having a chamber for containing the substance, and a condensation unit for rapid cooling of the vaporized substance. The furnace may comprise an insulating outer section, a chamber wall, and two electrodes.
Hot Air Flow Direction Control Mechanism of Base Board Baking Machine
A hot air flow direction control mechanism of a base board baking machine includes a stand, a controller, a housing, a hot air device, an air suction unit, and a top cover. Thus, the hot air device blows the hot air into the housing, and the air suction unit sucks the hot air so that the hot air is circulated evenly in the housing and around the periphery of the housing.
HIGH-PRESSURE TANK PRODUCING APPARATUS
A high-pressure tank producing apparatus capable of reducing time for increasing temperature of a tank body. The apparatus that heats the tank body with fibers impregnated with a thermosetting resin wound around its surface includes a heating chamber for housing the tank body and a retaining mechanism for retaining the tank body within the heating chamber, in which the heating chamber has an injection port for injecting heated gas onto the surface of the tank body and an exhaust port for discharging the gas to the outside of the heating chamber, the exhaust port being disposed in a position where the injection port is projected in a gas injecting direction, and the retaining mechanism retains the tank body in a region where the injection and exhaust ports overlap with each other as viewed from the gas injecting direction and in a position between the injection and exhaust ports.
RESIN CURING DEVICE AND RESIN CURING METHOD
Provided is a resin curing device capable of improving work efficiency when curing a liquid resin. A controller (2) of a resin curing device (1) controls opening degrees of three valves (51 to 53) so that a gas flow passage becomes a circulation passage (40) when an execution condition of an operation of feeding air to a curing furnace (10) is satisfied, and controls the opening degrees of the three valves (51 to 53) so that the gas flow passage becomes a bypass passage (41) when the execution condition is not satisfied (STEPS 30 to 41).
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM
A substrate processing apparatus includes: a heat processing unit configured to perform a heat process on a substrate having a film formed on the substrate; and a control unit configured to control the heat processing unit, wherein the heat processing unit comprises: a heater configured to support and heat the substrate; a chamber configured to cover the substrate supported on the heater; a gas ejector having a head in which ejection holes are formed, and configured to eject a gas from the ejection holes toward a surface of the substrate; an outer peripheral exhauster configured to evacuate a processing space inside the chamber from an outer peripheral region located further outward than a peripheral edge of the substrate supported on the heater; and a central exhauster configured to evacuate the processing space from a central region located further inward than the peripheral edge of the substrate supported on the heater.
APPARATUS AND METHOD FOR TREATING SUBSTRATE
An apparatus for treating a substrate includes a process chamber having a process space inside, a support unit that supports the substrate in the process space, a heating unit that is provided inside the support unit and that heats the substrate, an exhaust unit that evacuates the process space, and a gas supply unit that supplies a gas into the process space, and the gas supply unit supplies the gas at a temperature selected from a first temperature and a second temperature.
Space Oven
A space oven operates in microgravity environments by forcing convection towards the center through a unique heating element and airflow design. The space oven includes a tubular chamber, a heating rack, a heating system, a cooling system, a hatch, a user interface, a microcontroller, an enclosure, at least one first vent, at least one second vent and at least one temperature sensor. The tubular chamber is the cooking area. The heating rack holds consumables in place. The heating system heats up consumables. The cooling system prevents any overheating. The hatch closes off and allows access to the inside of the tubular chamber. The user interface allows a user to input commands. The microcontroller manages the electronic components. The enclosure protects the tubular chamber. The at least one first vent and the at least one second vent reduce pressure buildup. The at least one temperature sensor monitors the internal temperature.
Diffusion furnace
The present application discloses a diffusion furnace, including: a furnace tube structure including a furnace tube body and a furnace bottom, a bottom of the furnace tube body being connected to the furnace bottom to form a reaction chamber; and a carrying structure including a pedestal and a plurality of cassettes disposed on the pedestal, the pedestal being disposed on the furnace bottom. By disposing the plurality of the cassettes, a height of the furnace tube body can be decreased and a width of the furnace tube body can be increased, thus enlarging a space of equipment repair and maintenance, which is favorable for the repair and maintenance of the equipment.
DEVICE COMPRISING A FURNACE AND METHOD FOR THE USE THEREOF
A furnace (2) has at least one furnace chamber (20) delimited by a wall (25); at least one opening (5) is provided in the wall (25). The opening is provided with at least one nozzle (50), configured to generate a sealing air flow. A glass semi-finished product (4) can be introduced into the furnace chamber.