A cryopump includes a cryopump flange for attachment to the flange on a gate valve, and an annular baffle that axially extends toward the gate valve from the cryopump flange such that the annular baffle forms an annular orifice in association with a valve plate component of the gate valve. The annular orifice may be defined between an upper surface of the annular baffle and the valve plate.

The present invention relates to a vacuum evacuation system used to evacuate a processing gas from one or more process chambers for use in, for example, a semiconductor-device manufacturing apparatus. The vacuum evacuation system is a vacuum apparatus for evacuating a gas from a plurality of process chambers (1). The vacuum evacuation system includes a plurality of first vacuum pumps (5) coupled to the plurality of process chambers (1) respectively, a collecting pipe (7) coupled to the plurality of first vacuum pumps (5), and a second vacuum pump (8) coupled to the collecting pipe (7).

The present invention relates to a vacuum evacuation system used to evacuate a processing gas from one or more process chambers for use in, for example, a semiconductor-device manufacturing apparatus. The vacuum evacuation system is a vacuum apparatus for evacuating a gas from a plurality of process chambers (1). The vacuum evacuation system includes a plurality of first vacuum pumps (5) coupled to the plurality of process chambers (1) respectively, a collecting pipe (7) coupled to the plurality of first vacuum pumps (5), and a second vacuum pump (8) coupled to the collecting pipe (7).

A cartridge assembly for use in a high pressure pump according to an exemplary aspect of the present disclosure includes, among other things, a cartridge housing. A bore extends through the cartridge housing from a valve end to a packing end. A valve assembly is arranged in the valve end of the bore and configured to abut a valve seat. The bore has a constant diameter between the valve assembly and the packing end. The cartridge assembly is designed to be used in a fluid pump at a fluid pressure of at least 30,000 psi.

Provided herein are articles of manufacture, systems, and methods employing a gas-deflector plate in low to ultra-high vacuum systems that use differential pumping (e.g., gas-target particle accelerators, mass spectrometers, and windowless delivery ports). In certain embodiments, the gas-deflector plate is configured to be positioned between higher and lower pressure regions in a pressurized system, wherein the gas-deflector plate has a channel therethrough shaped and/or angled such that jetting gas moving through the channel enters the lower pressure region at an angle offset from the vertical axis of the gas-deflector plate and/or the channel. In other embodiments, a jet-deflector component is employed such that the jetting gas strikes such jet-deflector component and is re-directed in another direction.

Provided herein are articles of manufacture, systems, and methods employing a gas-deflector plate in low to ultra-high vacuum systems that use differential pumping (e.g., gas-target particle accelerators, mass spectrometers, and windowless delivery ports). In certain embodiments, the gas-deflector plate is configured to be positioned between higher and lower pressure regions in a pressurized system, wherein the gas-deflector plate has a channel therethrough shaped and/or angled such that jetting gas moving through the channel enters the lower pressure region at an angle offset from the vertical axis of the gas-deflector plate and/or the channel. In other embodiments, a jet-deflector component is employed such that the jetting gas strikes such jet-deflector component and is re-directed in another direction.

To provide a vacuum pump capable of efficiently cooling electrical equipment. The vacuum pump comprises a pump main body, and an electrical equipment case disposed outside the pump main body, wherein the electrical equipment case includes a cooling jacket in which a cooling medium flow passage is formed, and a power supply circuit portion that has a circuit component and can be cooled by the cooling jacket, the power supply circuit portion being attached to the cooling jacket so that heat from the electrical component portion can be transferred, and the cooling jacket includes a jacket main body and a cooling pipe for circulating cooling water in the jacket main body, and partially exposes the cooling pipe toward the power supply circuit portion.

To provide a vacuum pump capable of efficiently cooling electrical equipment. The vacuum pump includes a pump main body and an electrical equipment case disposed outside the pump main body, wherein the electrical equipment case includes a cooling jacket which has an inner surface and an outer surface in a vertical portion and in which a cooling medium flow passage is formed, and a plurality of electrical equipment that have circuit components and can be cooled by the cooling jacket. The inner surface and the outer surface are formed facing different directions, and the electrical equipment portions are attached respectively to the inner surface and the outer surface so that heat can be transferred.

Provided herein are articles of manufacture, systems, and methods employing a gas-deflector plate in low to ultra-high vacuum systems that use differential pumping (e.g., gas-target particle accelerators, mass spectrometers, and windowless delivery ports). In certain embodiments, the gas-deflector plate is configured to be positioned between higher and lower pressure regions in a pressurized system, wherein the gas-deflector plate has a channel therethrough shaped and/or angled such that jetting gas moving through the channel enters the lower pressure region at an angle offset from the vertical axis of the gas-deflector plate and/or the channel. In other embodiments, a jet-deflector component is employed such that the jetting gas strikes such jet-deflector component and is re-directed in another direction.

Provided herein are articles of manufacture, systems, and methods employing a gas-deflector plate in low to ultra-high vacuum systems that use differential pumping (e.g., gas-target particle accelerators, mass spectrometers, and windowless delivery ports). In certain embodiments, the gas-deflector plate is configured to be positioned between higher and lower pressure regions in a pressurized system, wherein the gas-deflector plate has a channel therethrough shaped and/or angled such that jetting gas moving through the channel enters the lower pressure region at an angle offset from the vertical axis of the gas-deflector plate and/or the channel. In other embodiments, a jet-deflector component is employed such that the jetting gas strikes such jet-deflector component and is re-directed in another direction.