The present disclosure provides a substrate support structure, a vacuum drying device and a vacuum drying method. The substrate support structure includes a support platform and a plurality of pins in the support platform. The plurality of pins is divided into at least two groups, and the at least two groups of pins are in the support platform in such a manner as to be liftable in the support platform, so that a substrate is supported by the at least two groups of pins alternately.

A method for drying panels in a drying device includes first and second stages. Each stage has levels, and each panel is placed on surfaces formed at different levels and guided through the drying device in each level. In the first stage, the panels are brought into contact with drying air with a high temperature and are dried, and in the second stage, the panels are dried using drying air with a lower temperature. The support surface in the levels of the first stage for placing the panels is smaller than the support surface in the second stage, and the panels are guided in the second stage at a second speed which is lower than the first speed in the first stage, wherein the product of the first support surface and the first speed is equal to the product of the second support surface and the second speed.

Proposed is a substrate processing apparatus for processing a substrate, substrate processing apparatus including: a liquid processing chamber performing liquid processing on a substrate by supplying processing liquid to the substrate; a drying chamber drying the substrate; a transferring robot transferring the substrate from the liquid processing chamber to the drying chamber; and an inspection unit inspecting a state of the drying chamber.